Patents by Inventor Laurie Jane Lauchlan

Laurie Jane Lauchlan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process to form an isolated trench image in photoresist
    Patent number: 7556915
    Abstract: An isolated hole in a photoresist layer is formed by surrounding it with additional, somewhat narrower, dummy hole features. The ratio of feature width to resist thickness is adjusted so that, after development, there is no resist on the floor of the isolated (main) hole whereas a reduced, but finite, thickness of resist remains on the floors of the holes derived from the dummy features. The isolated hole may then be used for etching or electroplating the underlying substrate.
    Type: Grant
    Filed: December 8, 2005
    Date of Patent: July 7, 2009
    Assignee: Headway Technologies, Inc.
    Inventor: Laurie Jane Lauchlan