Patents by Inventor Lawrence D. Matthysse

Lawrence D. Matthysse has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for flexible atomic layer deposition
    Patent number: 6905547
    Abstract: An apparatus with a processing chamber subjects a substrate to atomic layer deposition and deposits a film layer. The processing chamber includes at least a first gas switching port. A gas switching manifold is coupled to the processing chamber and configured to mix reactants with a neutral carrier gas and provide gas switching functionality for ALD processes. An upstream gas source and pressure setting apparatus is coupled to the gas switching manifold. The upstream gas source and pressure setting apparatus includes at least a first reactant source, a second reactant source and a neutral gas source. Additionally, the upstream gas source and pressure setting apparatus is configured to provide a cascade of continuing, decreasing pressures.
    Type: Grant
    Filed: June 17, 2002
    Date of Patent: June 14, 2005
    Assignee: Genus, Inc.
    Inventors: Ana R. Londergan, Thomas E. Seidel, Lawrence D. Matthysse, Ed C. Lee