Patents by Inventor Lawrence E. Carter

Lawrence E. Carter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Organic removal process
    Patent number: 6383724
    Abstract: An improved method of photoresist removal is disclosed in which a treating solution of ozone and bicarbonate or other suitable radical scavengers is used to treat a substrate for use in an electronic device. The method is particularly well suited to photoresist removal where certain metals such as aluminum, copper and oxides thereof are present on the surface of the substrate. The method is also well suited to the removal of other organic materials as well.
    Type: Grant
    Filed: April 18, 2000
    Date of Patent: May 7, 2002
    Assignee: FSI International, Inc.
    Inventors: Lawrence E. Carter, Steven L. Nelson
  • HF/IPA based process for removing undesired oxides form a substrate
    Patent number: 6221168
    Abstract: A method for treating a microelectronics substrate to produce a surface with improved characteristics for subsequent processing. The substrate is treated with HF, IPA, and an inert gas in a narrow range of conditions to remove unwanted oxide layers. The resulting surface is useful for processes like epitaxial deposition which benefit from a clean silicon surface with a low oxygen content.
    Type: Grant
    Filed: June 16, 1998
    Date of Patent: April 24, 2001
    Assignee: FSI International, Inc.
    Inventors: Lawrence E. Carter, Brent Schwab, Robert T. Fayfield
  • Organic removal process
    Patent number: 6080531
    Abstract: An improved method of photoresist removal is disclosed in which a treating solution of ozone and bicarbonate or other suitable radical scavengers is used to treat a substrate for use in an electronic device. The method is particularly well suited to photoresist removal where certain metals such as aluminum, copper and oxides thereof are present on the surface of the substrate. The method is also well suited to the removal of other organic materials as well.
    Type: Grant
    Filed: March 30, 1998
    Date of Patent: June 27, 2000
    Assignee: FSI International, Inc.
    Inventors: Lawrence E. Carter, Steven L. Nelson
  • Non-explosive flawed substrate
    Patent number: 5084693
    Abstract: A resistor configuration is illustrated that has controlled electro-thermal fracture characteristics. Control is achieved by the formation of a geometrical or compositional flaw in the resistor configuration that causes fracture to originate at a lower stress magnitude than any other stress magnitude within the configuration. The flaw is located within the geometry of the resistor configuration to prevent undesirable multiple fragmentation.
    Type: Grant
    Filed: December 14, 1990
    Date of Patent: January 28, 1992
    Assignee: CTS Corporation
    Inventors: Eric B. Taylor, Lawrence E. Carter, Dan Kinsey