Patents by Inventor Lawrence F. Wagner, Jr.
Lawrence F. Wagner, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7863691Abstract: Disclosed are embodiments of an improved integrated circuit switching device that incorporates multiple sets of series connected field effect transistors with each set further connected in parallel between two nodes. The sets are arranged in a linear fashion with each set positioned such that it is in contact with and essentially symmetrical relative to an adjacent set. Arranging the sets in this manner allows adjacent diffusion regions of the same type (i.e., sources or drains) from adjacent sets to be merged. Merging of the diffusion regions provides several benefits, including but not limited to, reducing the device size, reducing the amount of required wiring for the device (i.e., reducing resistance) and reducing side capacitance between the now merged diffusion regions and the substrate. Also disclosed are embodiments of an associated design structure for the device and an associated method of forming the device.Type: GrantFiled: March 10, 2008Date of Patent: January 4, 2011Assignee: International Business Machines CorporationInventors: Lawrence F. Wagner, Jr., Randy L. Wolf
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Publication number: 20090224334Abstract: Disclosed are embodiments of an improved integrated circuit switching device that incorporates multiple sets of series connected field effect transistors with each set further connected in parallel between two nodes. The sets are arranged in a linear fashion with each set positioned such that it is in contact with and essentially symmetrical relative to an adjacent set. Arranging the sets in this manner allows adjacent diffusion regions of the same type (i.e., sources or drains) from adjacent sets to be merged. Merging of the diffusion regions provides several benefits, including but not limited to, reducing the device size, reducing the amount of required wiring for the device (i.e., reducing resistance) and reducing side capacitance between the now merged diffusion regions and the substrate. Also disclosed are embodiments of an associated design structure for the device and an associated method of forming the device.Type: ApplicationFiled: March 10, 2008Publication date: September 10, 2009Inventors: Lawrence F. Wagner, JR., Randy L. Wolf
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Patent number: 7139990Abstract: A sub-circuit based extraction method which extracts a multi-finger MOS transistor directly as a sub-circuit is described. By adding three marking layers, the method provides the layout extracted netlist with a complete list of device geometric parameters corresponding to the device properties as presented in the sub-circuit model based schematic netlist. By performing a layout-versus-schematic comparison based on all geometric parameters extracted, the layout checking is performed in a complete and accurate way where each device parameter is checked against the corresponding design schematic. This complete and accurate geometric parameter comparison enhances the confidence level of the layout physical verification.Type: GrantFiled: March 23, 2004Date of Patent: November 21, 2006Assignee: International Business Machines CorporationInventors: Raminderpal Singh, Yue Tan, Jean-Oliver Plouchart, Lawrence F. Wagner, Jr., Mohamed Talbi, John M. Safran, Kun Wu
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Patent number: 6562666Abstract: Capacitance between source/drain and p-type substrate in SOI CMOS circuits is reduced by implanting an n-type layer below the oxide layer, thereby forming a fully depleted region that adds to the thickness of the oxide layer, while creating a junction capacitance region that reduces the total device to substrate capacitance.Type: GrantFiled: October 31, 2000Date of Patent: May 13, 2003Assignee: International Business Machines CorporationInventors: Heemyong Park, Fariborz Assaderaghi, Jack A. Mandelman, Ghavam G. Shahidi, Lawrence F. Wagner, Jr.
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Patent number: 6490546Abstract: A process for obtaining accurate DC convergence in a DC phase of a circuit simulation program for models of field effect transistors (FETs) on a silicon-on-insulator (SOI) substrate. The process comprises running iterations of the DC phase of the circuit simulation program such that error criteria are satisfied, wherein the pseudo-time step changes at each iteration until it reaches a value such that a desired current value is achieved. DC convergence is also achieved by reducing the magnitude of the capacitive and/or charge elements connected to the floating body regions of the field effect transistors on the silicon-on-insulator substrate model during the DC phase to achieve a desired current value.Type: GrantFiled: May 4, 1999Date of Patent: December 3, 2002Assignee: International Business Machines CorporationInventors: Richard Kimmel, Lawrence F. Wagner, Jr.
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Patent number: 6141632Abstract: A method for use in electronic design models encoded into design software for use in SOI based FET logic design includes simulation of an SOI device by and setting a floating body voltage to any desired value at any time during the simulation, by adding to the model an ideal voltage source, whose value is a desired body voltage, in series with an ideal current source, whose value is a constant times the voltage across itself. When the constant is zero, no current can flow, and any additional components have no effect on the circuit. When the constant is non-zero, said ideal current source appears to be the same as a resistor such that current can flow in to or out from the body node, setting its voltage. The constant is kept zero at all times, except when it is desired to change the body voltage. The body voltage can be reset at any time to solve the problem of successive delays in one simulation run and resetting the voltage before each delay measurement starts.Type: GrantFiled: September 2, 1999Date of Patent: October 31, 2000Assignee: International Business Machines CorporationInventors: George E. Smith, III, Fariborz Assaderaghi, Paul D. Muench, Lawrence F. Wagner, Jr., Timothy L. Walters
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Patent number: 6023577Abstract: A method for use in electronic design models encoded into design software for use in SOI based FET logic design includes simulation of an SOI device and setting a floating body voltage to any desired value at any time during the simulation, by adding to the model an ideal voltage source, whose value is a desired body voltage, in series with an ideal current source, whose value is a constant times the voltage across itself. When the constant is zero no current can flow, and any additional components have no effect on the circuit. When the constant is non-zero, said ideal current source appears to be the same as a resistor such that, current can flow in to or out from the body node, setting its voltage. The constant is kept zero at all times, except when it is desired to change the body voltage. The body voltage can be reset at any time to solve the problem of successive delays in one simulation run and resetting the voltage before each delay measurement starts.Type: GrantFiled: September 26, 1997Date of Patent: February 8, 2000Assignee: International Business Machines CorporationInventors: George E. Smith, III, Lawrence F. Wagner, Jr., Timothy L. Walters, Fariborz Assaderaghi
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Patent number: 5446312Abstract: A transistor with silicon on insulator (SOI) intrinsic base and a collector each formed by a low temperature epitaxial process and each orientated vertically with respect to the (SOI) substrate. The base width can be as narrow as in a conventional vertical transistor. Similarly, the collector width can be precisely controlled.Type: GrantFiled: June 24, 1994Date of Patent: August 29, 1995Assignee: International Business Machines CorporationInventors: Chang-Ming Hsieh, Louis L. G. Hsu, Shaw-Ning Mei, Ronald W. Knepper, Lawrence F. Wagner, Jr.
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Patent number: 5371022Abstract: A transistor with silicon on insulator (SOI) intrinsic base and a collector each formed by a low temperature epitaxial process and each orientated vertically with respect to the (SOI) substrate. The base width can be as narrow as in a conventional vertical transistor. Similarly, the collector width can be precisely controlled.Type: GrantFiled: February 28, 1994Date of Patent: December 6, 1994Assignee: International Business Machines CorporationInventors: Chang-Ming Hsieh, Louis L. G. Hsu, Shaw-Ning Mei, Ronald W. Knepper, Lawrence F. Wagner, Jr.
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Patent number: 5341023Abstract: A lateral bipolar transistor has an extrinsic base layer on either side of a centrally disposed emitter layer and an intrinsic base and a collector oriented perpendicularly to the extrinsic base and collector layers.Type: GrantFiled: June 18, 1992Date of Patent: August 23, 1994Assignee: International Business Machines CorporationInventors: Chang-Ming Hsieh, Louis L. C. Hsu, Shaw-Ning Mei, Ronald W. Knepper, Lawrence F. Wagner, Jr.
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Patent number: 5258640Abstract: An integrated gate and semiconductor barrier layer diode which functions as a regular diode when the gate is turned off and as, a Schottky barrier diode with the gate turned on.Type: GrantFiled: September 2, 1992Date of Patent: November 2, 1993Assignee: International Business Machines CorporationInventors: Chang-Ming Hsieh, Louis L. Hsu, Phung T. Nguyen, Lawrence F. Wagner, Jr.