Patents by Inventor Lawrence Ferreira
Lawrence Ferreira has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11941665Abstract: Systems and methods for providing an advertisement marketplace where buyers and sellers can trade linear mediacast advertisement inventory programmatically at local, national, and/or worldwide levels. The marketplace system may include a seller-controlled marketplace system which connects sellers with buyers and offers revenue management tools for optimizing yields across direct and programmatic channels. The advertisement inventory is bought and sold as canonical inventory units which group similar but discrete advertisement slots together. The marketplace system may include a real-time bidding (RTB) adapter through which digital advertising buyers may place bids for such inventory units using standard protocols utilized in digital RTB systems.Type: GrantFiled: September 28, 2016Date of Patent: March 26, 2024Assignee: WideOrbit LLCInventors: Tyler Wallace Box, David Bridges, Brian M. Burdick, Geoffrey P. Coco, Ian P. Ferreira, Paul Jaffe, Alfred Lawrence Shiels, Brian Thoman, Sean Trigony
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Patent number: 7935665Abstract: A non-corrosive cleaning composition that is aqueous-based, non-hazardous and will not harm the environment and is useful primarily for removing both fresh and aged plasma etch residues from a substrate. The composition comprises (a) water; and (b) a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid. Preferably, the at least one carboxylic acid has a pKa value ranging from 3 to 6. Also, a method for removing etch residues from a substrate. The method includes the steps of (a) providing a substrate with etch residue; and (b) contacting the substrate with a cleaning composition comprising water; and a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid.Type: GrantFiled: April 24, 2003Date of Patent: May 3, 2011Assignee: Fujifilm Electronic Materials U.S.A., Inc.Inventors: Vincent G. Leon, Michelle Elderkin, Lawrence Ferreira
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Patent number: 6855476Abstract: A photoacid compound having the following general structure: R—O(CF2)nSO3X wherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C1-C12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q— wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.Type: GrantFiled: April 5, 2002Date of Patent: February 15, 2005Assignee: Arch Specialty Chemicals, Inc.Inventors: Lawrence Ferreira, Andrew J. Blakeney, Gregory Dominic Spaziano, Ognian Dimov, J. Thomas Kocab, John P. Hatfield
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Publication number: 20040072095Abstract: Radiation sensitive compositions for use in producing a patterned image on a substrate comprise:Type: ApplicationFiled: June 19, 2003Publication date: April 15, 2004Applicant: Arch Speciality Chemical, Inc.Inventors: David Brzozowy, Kocab J. Thomas, John P. Hatfield, Lawrence Ferreira, Andrew Blakeney
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Publication number: 20030235996Abstract: A non-corrosive cleaning composition that is aqueous-based, non-hazardous and will not harm the environment and is useful primarily for removing both fresh and aged plasma etch residues from a substrate. The composition comprises (a) water; and (b) a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid. Preferably, the at least one carboxylic acid has a pKa value ranging from 3 to 6. Also, a method for removing etch residues from a substrate. The method includes the steps of (a) providing a substrate with etch residue; and (b) contacting the substrate with a cleaning composition comprising water; and a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid.Type: ApplicationFiled: April 24, 2003Publication date: December 25, 2003Applicant: ARCH SPECIALTY CHEMICALS, INC.Inventors: Vincent G. Leon, Michelle Elderkin, Lawrence Ferreira
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Publication number: 20020197558Abstract: A photoacid compound having the following general structure:Type: ApplicationFiled: April 5, 2002Publication date: December 26, 2002Applicant: ARCH SPECIALTY CHEMICALS, INC.Inventors: Lawrence Ferreira, Andrew J. Blakeney, Gregory Dominic Spaziano, Ognian Dimov, J. Thomas Kocab, John P. Hatfield
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Patent number: 6380317Abstract: The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.Type: GrantFiled: October 26, 1999Date of Patent: April 30, 2002Assignee: Arch Specialty Chemicals, Inc.Inventors: Sanjay Malik, Andrew J. Blakeney, Lawrence Ferreira, Joseph J. Sizensky, Brian E. Maxwell
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Patent number: 6312870Abstract: A resist composition containing a polymer of t-butyl cinnamate, a photacid generator, and a solvent. Optionally, the resist composition may include a basic compound. The polymer of t-butyl cinnamate has the monomeric units: wherein a=0.3 to 0.9, b=0.1 to 0.7, and c=0 to 0.3; R1=H, methyl, or CH2OR4; R4=H or C1-C4 alkyl group; R2=H, methyl, CH2OR4, CH2CN, or CH2X; X=Cl, I, Br, F, or CH2COOR5; R5=C1-C4 alkyl group; and R3=isobomyl, cyclohexyl methyl, cyclohexyl ethyl, benzyl, or phenethyl.Type: GrantFiled: July 19, 2000Date of Patent: November 6, 2001Assignee: Arch Specialty Chemicals, Inc.Inventors: Sanjay Malik, Lawrence Ferreira, Jeffrey Eisele, Whewell Allyn
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Patent number: 6309793Abstract: The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.Type: GrantFiled: November 1, 2000Date of Patent: October 30, 2001Assignee: Arch Specialty Chemicals, Inc.Inventors: Sanjay Malik, Andrew J. Blakeney, Lawrence Ferreira, Joseph J. Sizensky, Brian E. Maxwell
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Patent number: 6200480Abstract: The present invention is directed to a process of removing trace acidic impurities from an impure solution of photoacid generating compounds in a solvent, comprising contacting an impure solution of at least one photoacid generating compound containing trace amounts of acidic impurities with an amine-containing ion exchange resin for a sufficient amount of time to remove substantially all of the acidic impurities from the impure solution, thereby producing a pure solution of at least one photoacid generating compounds substantially free of trace acidic impurities. The invention is also directed to a solution of at least one photoacid generating compound substantially free of trace acidic impurities made by the above process.Type: GrantFiled: January 13, 1998Date of Patent: March 13, 2001Assignee: Arch Specialty Chemicals, Inc.Inventors: Lawrence Ferreira, Sanjay Malik
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Patent number: 6159653Abstract: The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.Type: GrantFiled: April 14, 1998Date of Patent: December 12, 2000Assignee: Arch Specialty Chemicals, Inc.Inventors: Sanjay Malik, Andrew J. Blakeney, Lawrence Ferreira, Joseph J. Sizensky, Brian E. Maxwell
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Patent number: 6140026Abstract: A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formula (II): ##STR1## wherein the photosensitive compound is used in a radiation sensitive composition and a process for forming a positive patterned image.Type: GrantFiled: December 8, 1999Date of Patent: October 31, 2000Assignee: Arch Specialty Chemicals, Inc.Inventors: Andrew J. Blakeney, Arturo N. Medina, Medhat A. Toukhy, Lawrence Ferreira, Alfred T. Jeffries, III, Ahmad A. Naiini
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Patent number: 6133412Abstract: The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.Type: GrantFiled: October 26, 1999Date of Patent: October 17, 2000Assignee: Arch Chemicals, Inc.Inventors: Sanjay Malik, Andrew J. Blakeney, Lawrence Ferreira, Joseph J. Sizensky, Brian E. Maxwell
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Patent number: 6040107Abstract: A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formula (II): ##STR1## wherein the photosensitive compound is used in a radiation sensitive composition and a process for forming a positive patterned image.Type: GrantFiled: February 6, 1998Date of Patent: March 21, 2000Assignee: Olin Microelectronic Chemicals, Inc.Inventors: Andrew J. Blakeney, Arturo N. Medina, Medhat A. Toukhy, Lawrence Ferreira, Alfred T. Jeffries, III, Ahmad A. Naiini
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Patent number: 5602260Abstract: A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formulae (IB) and (IIB): ##STR1## wherein the variables are as defined in the description.Type: GrantFiled: May 26, 1995Date of Patent: February 11, 1997Assignee: OCG Microelectronic Materials, Inc.Inventors: Andrew J. Blakeney, Arturo N. Medina, Medhat A. Toukhy, Lawrence Ferreira, Sobhy Tadros
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O-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive images
Patent number: 5547814Abstract: A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formulae (IB) and (IIB): ##STR1## wherein the photosensitive compound is used in a radiation sensitive composition and a process for forming a positive patterned image.Type: GrantFiled: May 26, 1995Date of Patent: August 20, 1996Assignee: OCG Microelectronic Materials, Inc.Inventors: Andrew J. Blakeney, Arturo N. Medina, Medhat A. Toukhy, Lawrence Ferreira, Sobhy Tadros -
Patent number: 5541033Abstract: A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formulae (IB) and (IIB): ##STR1## wherein the photosensitive compound is used in a positive photoresist composition and process for forming patterned image. Further the invention is drawn to a positive photoresist composition comprising an alkali-soluble resin and quinone diazide sulfonic acid triesters and diesters characterized by their HPLC peak areas.Type: GrantFiled: February 1, 1995Date of Patent: July 30, 1996Assignee: OCG Microelectronic Materials, Inc.Inventors: Andrew J. Blakeney, Arturo N. Medina, Medhat A. Toukhy, Lawrence Ferreira, Sobhy Tadros
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Patent number: 5446125Abstract: A method of removing metal impurities from a resist component, comprising the steps of:(a) dissolving said resist component in a solvent;(b) contacting said resist component solution with a cation exchange resin and a chelate resin for a sufficient amount of time to absorb at least a portion of said metal impurities onto said cation exchange and chelate resins; and(c) separating said cation exchange and chelate resins bearing said metal impurities from said resist component solution.Type: GrantFiled: September 3, 1991Date of Patent: August 29, 1995Assignee: OCG Microelectronic Materials, Inc.Inventors: Kenji Honda, Edward A. Fitzgerald, Lawrence Ferreira
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Patent number: 5234789Abstract: A radiation-sensitive composition comprising an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective sensitivity enhancing amount of at least one polylactide compound; the amount of said binder resin being about 60 to 95% by weight, the amount of said photoactive component being about 5% to about 40% by weight, based on the total solids content of said radiation-sensitive composition.Type: GrantFiled: March 19, 1992Date of Patent: August 10, 1993Assignee: OCG Microelectronic Materials, Inc.Inventors: James G. Favier, Jr., Lawrence Ferreira, John A. McFarland, Jr.
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Patent number: 4711836Abstract: Disclosed is an aqueous developing solution containing a quaternary ammonium hydroxide developing agent, and as an additive an effective amount of a select compound which is either 1,3,5-trihydroxy benzene, 4-methylesculetin or a novolak-type resin. The aqueous developing solution is particularly useful in developing an imagewise-exposed layer of a positive-working photoresist composition containing a novolak-type resin and a photosensitive agent. In such application, it has been found that the developing solution more effectively removes the exposed portions of the photoresist composition without leaving a residue of exposed photoresist composition at the interface of the edges of the unexposed portions of the photoresist composition and the oxidized silicon substrate.Type: GrantFiled: August 11, 1986Date of Patent: December 8, 1987Assignee: Olin Hunt Specialty Products, Inc.Inventor: Lawrence Ferreira