Patents by Inventor Lawrence J. Myron

Lawrence J. Myron has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Self-aligned process for fabricating imprint templates containing variously etched features
    Patent number: 7547398
    Abstract: A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures have been created, it is possible that the various structures will exist at different planes/elevations relative to the template surface. The elevations of the various structures may be adjusted independently by selectively exposing “higher” structures to an anisotropic etch that reduces the overall elevation of the structures, while preserving the structural topography.
    Type: Grant
    Filed: March 29, 2007
    Date of Patent: June 16, 2009
    Assignee: Molecular Imprints, Inc.
    Inventors: Gerard M. Schmid, Nicholas A Stacey, Douglas J. Resnick, Ronald D. Voisin, Lawrence J. Myron
  • Self-Aligned Process for Fabricating Imprint Templates Containing Variously Etched Features
    Publication number: 20070243655
    Abstract: A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures have been created, it is possible that the various structures will exist at different planes/elevations relative to the template surface. The elevations of the various structures may be adjusted independently by selectively exposing “higher” structures to an anisotropic etch that reduces the overall elevation of the structures, while preserving the structural topography.
    Type: Application
    Filed: March 29, 2007
    Publication date: October 18, 2007
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Gerard M. Schmid, Nicholas A. Stacey, Douglas J. Resnick, Ronald D. Voisin, Lawrence J. Myron