Patents by Inventor Lawrence J. Schoennauer

Lawrence J. Schoennauer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High speed infrared shutter
    Patent number: 4795240
    Abstract: A shutter having no moving parts and intended for use at infrared wavelengths includes a thin film of vanadium dioxide deposited on an insulative layer of silicon oxide that has been grown on a thin substrate of semiconductive silicon. The layers are in good thermal contact, but the vanadium dioxide film is electrically insulated from the silicon substrate. The vanadium dioxide film is heated by passing a heating current through the semiconductive substrate, and is cooled by radiation. The resistance of the vanadium dioxide film is sensed continuously, and is used for turning on and turning off the heating current.
    Type: Grant
    Filed: August 18, 1987
    Date of Patent: January 3, 1989
    Assignee: Hibshman Corporation
    Inventors: Jacob Y. Wong, Lawrence J. Schoennauer