Patents by Inventor Lawrence Lin

Lawrence Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230380038
    Abstract: A system for automatically adjusting the lighting parameters of a space is disclosed herein. The control module sets the target lighting parameters in the space and drive the smart lamp groups to illuminate by using the preset light recipe and to control the smart lamp groups to perform the illumination. The control module compares an ambient light detection value in the actual environment with the target value. When the ambient light detection value is not the same as the target value, the control module drives the ambient light sensor module performs a dimming procedure to the smart lamp groups. Wherein, the dimming procedure includes the step of adjusting an illuminance uniformity of the space according to the actual illuminance detected by the ambient light sensor module. After the calculation of the illuminance uniformity formula, the illuminance uniformity is adjusted to be the same as a target illuminance uniformity.
    Type: Application
    Filed: May 18, 2023
    Publication date: November 23, 2023
    Inventor: Lawrence LIN
  • Publication number: 20230363065
    Abstract: The present invention discloses a method for implementing emotion navigation by using an intelligent human centric lighting system. The emotion navigation method includes the following steps. Step 1 is to confirm an initial emotion of a user. Step 2 is to set a target emotion. Step 3 is to select a relay emotion to set an emotion navigation path. Step 4 is to edit a multispectral recipe corresponding to the relay emotion and the target emotion according to the multispectral recipe. Step 5 is to perform a lighting program of the multispectral recipe of the relay emotion and the target emotion. If the determination is not reaching the target emotion of Step 6, then go to obtain the user's personal physiological data to find out the multispectral recipe of the corresponding emotion that can adjust to the target emotion.
    Type: Application
    Filed: May 3, 2023
    Publication date: November 9, 2023
    Inventor: Lawrence LIN
  • Publication number: 20220408533
    Abstract: A lighting system for establishing a database of multispectral circadian rhythm lighting scenario and psychological stress indicators is configured in space, which is characterized by downloading the multispectral circadian rhythm lighting scenario database from the cloud; the multispectral lighting parameters and circadian rhythm parameters are selected from the multispectral circadian rhythm lighting scenario database to start the light-emitting device for lighting; the ambient light sensor measures and judges whether the circadian rhythm parameters reach the set value; when each circadian rhythm parameter in the circadian rhythm lighting scenario database has reached the set value, the light-emitting device is started for lighting; after the blood or saliva of the light control subjects were tested, the psychological stress index values of the illuminators were obtained; the portable communication device transmits the circadian rhythm parameters and psychological stress index values to the cloud; among the
    Type: Application
    Filed: June 14, 2022
    Publication date: December 22, 2022
    Inventors: Lawrence LIN, Chih Hung CHANG
  • Publication number: 20220401690
    Abstract: A lighting system with a multispectral circadian rhythm lighting scenario, which performs lighting by the following procedures, the procedures include: downloading the multispectral circadian rhythm lighting scenario database from a portable communication device to the cloud through the Internet; the portable communication device selects a multispectral lighting parameter and a circadian rhythm parameter from the multispectral circadian rhythm lighting scenario database to start the light-emitting device to control the illuminator to perform lighting; after the blood or saliva test of the light control subjects, the psychological stress index values of the illuminator were obtained; the portable communication device or the management control module transmits the circadian rhythm parameters and psychological stress index values to the cloud.
    Type: Application
    Filed: June 15, 2022
    Publication date: December 22, 2022
    Inventors: Lawrence LIN, Chih Hung CHANG
  • Publication number: 20220369995
    Abstract: The present invention relates to an editing method of a dynamic spectrum program, which includes the following steps. Downloading the spectral recipe is to download the spectral recipe with multi light scene with specific color temperature or at least one specific color temperature to the editing device through the internet, and connect the editing device with the software as a service system or platform as a service system configured in the cloud. Perform the correlation editing between the specific function and the spectral recipe. The editing device divides the specific function to be achieved into multiple blocks through the software as a service system or the platform as a service system, and the blocks correspond to the spectral recipe of the multi light scene respectively. And forming a functional dynamic spectrum program, which is to configure multiple blocks for corresponding time to form a dynamic spectrum program.
    Type: Application
    Filed: April 5, 2022
    Publication date: November 24, 2022
    Inventors: Lawrence LIN, Chih Hung CHANG
  • Publication number: 20220377867
    Abstract: The present invention is a human centric lighting (HCL) method with adjustable lighting parameters comprises the following steps: 1) User connects with the cloud through the intelligent communication device and selects the specific spectral recipe that the user wants to achieve a specific emotion from the cloud; 2) The light emitting device is configured to emit light in a specific light field according to the lighting parameters in a specific light field to select the light in a specific light field; 3) After the user performs HCL, when the effect of specific emotion is not reached, the user adjusts the lighting parameters in the selected specific spectral recipe through the intelligent communication device; 4) When the user has achieved the effect of specific emotion after performing HCL, store the corresponding lighting parameters of the adjusted spectral recipe to the cloud.
    Type: Application
    Filed: April 4, 2022
    Publication date: November 24, 2022
    Inventors: Lawrence LIN, Chih Hung CHANG
  • Publication number: 20220373985
    Abstract: The present invention is grading method for establishing the response of EEG files to physiological emotions through human factor lighting (HCL) system and EEG includes the following steps: Step 1, enhance spectrum which obtained the specific color temperature with synergistic effect on the specific physiological emotional response identified by fMRI; Step 2, making the user wear an EEG and give the element with specific emotional stimulation to stimulate the user's specific physiological emotion and induced the user's specific physiological emotion; Step 3, carry out the lighting program, after step 2, start the HCL system to lighting the user with different color temperatures, record and store the EEG files after lighting with different color temperatures; Step 4, EEG files that classify specific emotions by similarity through the learning method of AI; Step 5, establish the EEG classification database according to the similarity ranking of EEG files with specific color temperature.
    Type: Application
    Filed: April 4, 2022
    Publication date: November 24, 2022
    Inventors: Lawrence LIN, Chih Hung CHANG
  • Patent number: 10135348
    Abstract: In some embodiments, an inductor-inductor-capacitor (LLC) converter includes a transformer having a primary winding, a secondary winding, and an auxiliary winding. The primary winding is coupled to a primary side circuit and the auxiliary winding has a first winding portion coupled between a first terminal and a middle terminal, and a second winding portion coupled between the middle terminal and a second terminal. The LLC converter further includes a first diode coupled between the first terminal and a first node, a second diode coupled between the second terminal and the first node, and a switch coupled between the first node and a reference voltage terminal. The middle terminal of the auxiliary winding is coupled to the reference voltage terminal.
    Type: Grant
    Filed: May 13, 2016
    Date of Patent: November 20, 2018
    Assignee: INFINEON TECHNOLOGIES AUSTRIA AG
    Inventors: Anderson Hsiao, Gary Chang, Lawrence Lin
  • Publication number: 20170331383
    Abstract: In some embodiments, an inductor-inductor-capacitor (LLC) converter includes a transformer having a primary winding, a secondary winding, and an auxiliary winding. The primary winding is coupled to a primary side circuit and the auxiliary winding has a first winding portion coupled between a first terminal and a middle terminal, and a second winding portion coupled between the middle terminal and a second terminal. The LLC converter further includes a first diode coupled between the first terminal and a first node, a second diode coupled between the second terminal and the first node, and a switch coupled between the first node and a reference voltage terminal. The middle terminal of the auxiliary winding is coupled to the reference voltage terminal.
    Type: Application
    Filed: May 13, 2016
    Publication date: November 16, 2017
    Inventors: Anderson Hsiao, Gary Chang, Lawrence Lin
  • Patent number: 7960821
    Abstract: An integrated circuit device and method of making the integrated circuit device are disclosed. An exemplary apparatus includes: a semiconductor layer; and a dielectric layer on the semiconductor layer, the dielectric layer having conductive vias and dummy vias formed therein, wherein the conductive vias and dummy vias extend varying distances into the dielectric layer, the conductive vias extending through the dielectric layer to the semiconductor layer, and the dummy vias extending through the dielectric layer to a distance above the semiconductor layer.
    Type: Grant
    Filed: March 3, 2010
    Date of Patent: June 14, 2011
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Kuei Shun Chen, Chin-Hsiang Lin, Vencent Chang, Lawrence Lin, Lai Chien Wen, Jhun Hua Chen
  • Patent number: 7767570
    Abstract: A method of making an integrated circuit includes providing a low-k dielectric layer on a substrate, the low-k dielectric layer including or adjacent to a plurality of conductive features; patterning the low-k dielectric layer to form trenches; patterning the low-k dielectric layer to form conductive vias and dummy vias, wherein each of the conductive vias is aligned with at least one of the plurality of the conductive features and at least one of the trenches, and each of the dummy vias is a distance above the plurality of conductive features; filling the trenches, conductive vias, and dummy vias using one or more conductive materials; and planarizing the conductive material(s).
    Type: Grant
    Filed: July 12, 2006
    Date of Patent: August 3, 2010
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Kuei Shun Chen, Chin-Hsiang Lin, Vencent Chang, Lawrence Lin, Lai Chien Wen, Jhun Hua Chen
  • Publication number: 20100155963
    Abstract: An integrated circuit device and method of making the integrated circuit device are disclosed. An exemplary apparatus includes: a semiconductor layer; and a dielectric layer on the semiconductor layer, the dielectric layer having conductive vias and dummy vias formed therein, wherein the conductive vias and dummy vias extend varying distances into the dielectric layer, the conductive vias extending through the dielectric layer to the semiconductor layer, and the dummy vias extending through the dielectric layer to a distance above the semiconductor layer.
    Type: Application
    Filed: March 3, 2010
    Publication date: June 24, 2010
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Kuei Shun Chen, Chin-Hsiang Lin, Vencent Chang, Lawrence Lin, Lai Chien Wen, Jhun Hua Chen
  • Publication number: 20070224795
    Abstract: A method of making an integrated circuit includes providing a low-k dielectric layer on a substrate, the low-k dielectric layer including or adjacent to a plurality of conductive features; patterning the low-k dielectric layer to form trenches; patterning the low-k dielectric layer to form conductive vias and dummy vias, wherein each of the conductive vias is aligned with at least one of the plurality of the conductive features and at least one of the trenches, and each of the dummy vias is a distance above the plurality of conductive features; filling the trenches, conductive vias, and dummy vias using one or more conductive materials; and planarizing the conductive material(s).
    Type: Application
    Filed: July 12, 2006
    Publication date: September 27, 2007
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Kuei Shun CHEN, Chin-Hsiang LIN, Vencent CHANG, Lawrence LIN, Lai Chien WEN, Jhun Hua CHEN
  • Patent number: 7226873
    Abstract: An isotropic-diffusion filling method uses a thermal process on a result structure comprising a photoresist layer and an organic material layer to create a cross-linking layer there between, which minimizes step height differences between isolated and dense via-pattern regions for optimizing a subsequent trench process and simplifying process steps.
    Type: Grant
    Filed: November 22, 2004
    Date of Patent: June 5, 2007
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yung-Sung Yen, Kuei-Shun Chen, Chia-Hsiang Lin, Lawrence Lin, Tsung Hsien Lin
  • Publication number: 20060110941
    Abstract: An isotropic-diffusion filling method uses a thermal process on a result structure comprising a photoresist layer and an organic material layer to create a cross-linking layer there between, which minimizes step height differences between isolated and dense via-pattern regions for optimizing a subsequent trench process and simplifying process steps.
    Type: Application
    Filed: November 22, 2004
    Publication date: May 25, 2006
    Inventors: Yung-Sung Yen, Kuei-Shun Chen, Chia-Hsiang Lin, Lawrence Lin, T. Lin
  • Patent number: 6833318
    Abstract: A gap-filling process is provided. A substrate having a dielectric layer thereon is provided. The dielectric layer has an opening therein. A gap-filling material layer is formed over the dielectric layer and inside the opening. A portion of the gap-filling material is removed from the gap-filling material layer to expose the dielectric layer. A gap-filling material treatment of the surface of the gap-filling material layer and the dielectric layer is carried out to planarize the gap-filling material layer so that a subsequently formed bottom anti-reflection coating or material layer over the gap-filling material layer can have a high degree of planarity.
    Type: Grant
    Filed: November 20, 2002
    Date of Patent: December 21, 2004
    Assignee: United Microelectronics Corp.
    Inventors: Chun-Jen Weng, Juan-Yi Chen, Hong-Tsz Pan, Cedric Lee, Der-Yuan Wu, Jackson Lin, Yeong-Song Yen, Lawrence Lin, Ying-Chung Tseng
  • Publication number: 20040097069
    Abstract: A gap-filling process is provided. A substrate having a dielectric layer thereon is provided. The dielectric layer has an opening therein. A gap-filling material layer is formed over the dielectric layer and inside the opening. A portion of the gap-filling material is removed from the gap-filling material layer to expose the dielectric layer. A gap-filling material treatment of the surface of the gap-filling material layer and the dielectric layer is carried out to planarize the gap-filling material layer so that a subsequently formed bottom anti-reflection coating or material layer over the gap-filling material layer can have a high degree of planarity.
    Type: Application
    Filed: November 20, 2002
    Publication date: May 20, 2004
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Chun-Jen Weng, Juan-Yi Chen, Hong-Tsz Pan, Cedric Lee, Der-Yuan Wu, Jackson Lin, Yeong-Song Yen, Lawrence Lin, Ying-Chung Tseng
  • Patent number: 6684426
    Abstract: A folding collapsible massage bed constructed to include a bedstead formed of two equal open frames hinged together by leaved hinge means, two mattress elements respectively mounted on the open frames, two legs respectively pivoted to the open frames, two cord members bilaterally connected between the legs to limit the outward turning angle of the legs, four folding braces bilaterally symmetrically connected between the legs and hinge leaves of the hinge means, and locking means adapted for locking the folding braces in the extended position.
    Type: Grant
    Filed: August 22, 2002
    Date of Patent: February 3, 2004
    Assignee: LifeGear, Inc.
    Inventors: Lawrence Lin, Meng-Tsung Chen
  • Publication number: 20040018450
    Abstract: A method for transferring patterns. After a patterned photoresist is formed on a substrate, the patterned photoresist is hardened, and the pattern of the hardened patterned photoresist is transferred into the substrate. Moreover, a popular method to harden is the silylation process, it is acceptable to only harder the top of the patterned photoresist or to harden both the top and the sidewall of the patterned photoresist. Besides, it is optional to change the thickness and the critical dimension of the patterned photoresist before it is hardened. Significantly, because the etch resistance of hardened patterned photoresist is higher than that of the non-hardened patterned photoresist, the method can improve any defect induced by etched photoresist during the pattern transferring process. Similarly, because a thinner non-hardened photoresist is available for the method, a smaller critical dimension of the patterned photoresist is available for the method while the photolithography technology being not improved.
    Type: Application
    Filed: July 25, 2002
    Publication date: January 29, 2004
    Applicant: UNITED MICROLECTRONICS CORP.
    Inventors: Cheng-Yu Fang, Chih-Hsien Huang, Lawrence Lin, Jui-Tsen Huang
  • Patent number: 6615431
    Abstract: An improved massage bed structure, which is foldable into a compact case to facilitate transport and storage, including a bed frame, a mattress, an inclination adjusting structure and a height adjusting structure. The inclination and height adjusting structures permit easy adjustment of the angles of inclination of a back pad and the massage bed, and the height of a waist and hip pad to comply with ergonomics. A pillow is provided to provide good support for the user's head and is capable of height and angle adjustment. A rest plate is mounted at the lower end of the pillow to provide support for the user's elbows to help the user to relax the shoulder muscles to thereby enhance massaging effects.
    Type: Grant
    Filed: November 15, 2001
    Date of Patent: September 9, 2003
    Assignee: LifeGear, Inc.
    Inventor: Lawrence Lin