Patents by Inventor Lawrence Rotter

Lawrence Rotter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9857292
    Abstract: A rotatable compensator configured to transmit non-collimated light over a broad range of wavelengths, including ultraviolet, with a high degree of retardation uniformity across the aperture is presented. In one embodiment, a rotatable compensator includes a stack of four individual plates in optical contact. The two thin plates in the middle of the stack are made from a birefringent material and are arranged to form a compound, zeroth order bi-plate. The remaining two plates are relatively thick and are made from an optically isotropic material. These plates are disposed on either end of the compound, zeroth order bi-plate. The low order plates minimize the sensitivity of retardation across the aperture to non-collimated light. Materials are selected to ensure transmission of ultraviolet light. The optically isotropic end plates minimize coherence effects induced at the optical interfaces of the thin plates.
    Type: Grant
    Filed: November 7, 2016
    Date of Patent: January 2, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Lawrence Rotter, Klaus Flock, Muzammil Arain, David Y. Wang
  • Publication number: 20170052112
    Abstract: A rotatable compensator configured to transmit non-collimated light over a broad range of wavelengths, including ultraviolet, with a high degree of retardation uniformity across the aperture is presented. In one embodiment, a rotatable compensator includes a stack of four individual plates in optical contact. The two thin plates in the middle of the stack are made from a birefringent material and are arranged to form a compound, zeroth order bi-plate. The remaining two plates are relatively thick and are made from an optically isotropic material. These plates are disposed on either end of the compound, zeroth order bi-plate. The low order plates minimize the sensitivity of retardation across the aperture to non-collimated light. Materials are selected to ensure transmission of ultraviolet light. The optically isotropic end plates minimize coherence effects induced at the optical interfaces of the thin plates.
    Type: Application
    Filed: November 7, 2016
    Publication date: February 23, 2017
    Inventors: Lawrence Rotter, Klaus Flock, Muzammil Arain, David Y. Wang
  • Patent number: 9519093
    Abstract: A rotatable compensator configured to transmit non-collimated light over a broad range of wavelengths, including ultraviolet, with a high degree of retardation uniformity across the aperture is presented. In one embodiment, a rotatable compensator includes a stack of four individual plates in optical contact. The two thin plates in the middle of the stack are made from a birefringent material and are arranged to form a compound, zeroth order bi-plate. The remaining two plates are relatively thick and are made from an optically isotropic material. These plates are disposed on either end of the compound, zeroth order bi-plate. The low order plates minimize the sensitivity of retardation across the aperture to non-collimated light. Materials are selected to ensure transmission of ultraviolet light. The optically isotropic end plates minimize coherence effects induced at the optical interfaces of the thin plates.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: December 13, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Lawrence Rotter, Klaus Flock, Muzammil Arain, David Y. Wang
  • Patent number: 9310290
    Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
    Type: Grant
    Filed: June 19, 2015
    Date of Patent: April 12, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: David Y. Wang, Klaus Flock, Lawrence Rotter, Shankar Krishnan, Johannes D. de Veer, Catalin Filip, Gregory Brady, Muzammil Arain, Andrei Shchegrov
  • Publication number: 20150285735
    Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
    Type: Application
    Filed: June 19, 2015
    Publication date: October 8, 2015
    Applicant: KLA- Tencor Corporation
    Inventors: David Y. Wang, Klaus Flock, Lawrence Rotter, Shankar Krishnan, Johannes D. de Veer, Catalin Filip, Gregory Brady, Muzammil Arain, Andrei Shchegrov
  • Patent number: 9116103
    Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
    Type: Grant
    Filed: October 1, 2013
    Date of Patent: August 25, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: David Y. Wang, Klaus Flock, Lawrence Rotter, Shankar Krishnan, Johannes D. de Veer, Catalin Filip, Gregory Brady, Muzammil Arain, Andrei Shchegrov
  • Publication number: 20150055123
    Abstract: A rotatable compensator configured to transmit non-collimated light over a broad range of wavelengths, including ultraviolet, with a high degree of retardation uniformity across the aperture is presented. In one embodiment, a rotatable compensator includes a stack of four individual plates in optical contact. The two thin plates in the middle of the stack are made from a birefringent material and are arranged to form a compound, zeroth order bi-plate. The remaining two plates are relatively thick and are made from an optically isotropic material. These plates are disposed on either end of the compound, zeroth order bi-plate. The low order plates minimize the sensitivity of retardation across the aperture to non-collimated light. Materials are selected to ensure transmission of ultraviolet light. The optically isotropic end plates minimize coherence effects induced at the optical interfaces of the thin plates.
    Type: Application
    Filed: August 22, 2014
    Publication date: February 26, 2015
    Inventors: Lawrence Rotter, Klaus Flock, Muzammil Arain, David Y. Wang
  • Publication number: 20140375981
    Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
    Type: Application
    Filed: October 1, 2013
    Publication date: December 25, 2014
    Applicant: KLA-Tencor Corporation
    Inventors: David Y. Wang, Klaus Flock, Lawrence Rotter, Shankar Krishnan, Johannes D. de Veer, Catalin Filip, Gregory Brady, Muzammil Arain, Andrei Shchegrov
  • Publication number: 20130245985
    Abstract: Methods and systems for matching critical dimension measurement applications at high precision across multiple optical metrology systems are presented. In one aspect, machine parameter values of a metrology system are calibrated based on critical dimension measurement data. In one further aspect, calibration of the machine parameter values is based on critical dimension measurement data collected by a target measurement system from a specimen with assigned critical dimension parameter values obtained from a reference measurement source. In another further aspect, the calibration of the machine parameter values of a target measurement system is based on measurement data without knowledge of critical dimension parameter values. In some examples, the measurement data includes critical dimension measurement data and thin film measurement data.
    Type: Application
    Filed: March 11, 2013
    Publication date: September 19, 2013
    Applicant: KLA-TENCOR CORPORATION
    Inventors: Klaus Flock, Lawrence Rotter, Muzammil Arain
  • Patent number: 7227637
    Abstract: The subject invention relates to a broadband optical metrology system that segregates the broadband radiation into multiple sub-bands to improve overall performance. Each sub-band includes only a fraction of the original bandwidth. The optical path—the light path that connects the illuminator, the sample and the detector—of each sub-band includes a unique sub-band optical system designed to optimize the performance over the spectral range spanned by the sub-band radiation. All of the sub-band optical systems are arranged to provide small-spot illumination at the same measurement position. Optional purging of the individual sub-band optical paths further improves performance.
    Type: Grant
    Filed: April 7, 2006
    Date of Patent: June 5, 2007
    Assignee: Therma-Wave, Inc.
    Inventors: David Y. Wang, Lawrence Rotter, Jeffrey T. Fanton, Jeffrey E. McAninch
  • Patent number: 7154607
    Abstract: A flat spectrum illumination source for use in optical metrology systems includes a first light source generating a visible light beam and a second light source generating an ultraviolet light beam. The illumination source also includes an auxiliary light source generating a light beam at wavelengths between the visible light beam and the ultraviolet light beam. The three light beams are combined to provide a broadband probe beam that has substantially even illumination levels across a broad range of wavelengths. Alternately, the illumination source may be fabricated as an array of light emitting diodes selected to cover a range of separate wavelengths. The outputs of the LED array are combined to produce the broadband probe beam.
    Type: Grant
    Filed: November 3, 2003
    Date of Patent: December 26, 2006
    Assignee: Therma-Wave, Inc.
    Inventors: James Lee Hendrix, David Y. Wang, David M. Aikens, Lawrence Rotter, Joel Ng
  • Publication number: 20060180761
    Abstract: The subject invention relates to a broadband optical metrology system that segregates the broadband radiation into multiple sub-bands to improve overall performance. Each sub-band includes only a fraction of the original bandwidth. The optical path—the light path that connects the illuminator, the sample and the detector—of each sub-band includes a unique sub-band optical system designed to optimize the performance over the spectral range spanned by the sub-band radiation. All of the sub-band optical systems are arranged to provide small-spot illumination at the same measurement position. Optional purging of the individual sub-band optical paths further improves performance.
    Type: Application
    Filed: April 7, 2006
    Publication date: August 17, 2006
    Inventors: David Wang, Lawrence Rotter, Jeffrey Fanton, Jeffrey McAninch
  • Patent number: 7061614
    Abstract: The subject invention relates to a broadband optical metrology system that segregates the broadband radiation into multiple sub-bands to improve overall performance. Each sub-band includes only a fraction of the original bandwidth. The optical path—the light path that connects the illuminator, the sample and the detector—of each sub-band includes a unique sub-band optical system designed to optimize the performance over the spectral range spanned by the sub-band radiation. All of the sub-band optical systems are arranged to provide small-spot illumination at the same measurement position. Optional purging of the individual sub-band optical paths further improves performance.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: June 13, 2006
    Assignee: Therma-Wave, Inc.
    Inventors: David Y. Wang, Lawrence Rotter, Jeffrey T. Fanton, Jeffrey E. McAninch
  • Publication number: 20040150828
    Abstract: A flat spectrum illumination source for use in optical metrology systems includes a first light source generating a visible light beam and a second light source generating an ultraviolet light beam. The illumination source also includes an auxiliary light source generating a light beam at wavelengths between the visible light beam and the ultraviolet light beam. The three light beams are combined to provide a broadband probe beam that has substantially even illumination levels across a broad range of wavelengths. Alternately, the illumination source may be fabricated as an array of light emitting diodes selected to cover a range of separate wavelengths. The outputs of the LED array are combined to produce the broadband probe beam.
    Type: Application
    Filed: November 3, 2003
    Publication date: August 5, 2004
    Inventors: James Lee Hendrix, David Y. Wang, David M. Aikens, Lawrence Rotter, Joel Ng
  • Publication number: 20030071996
    Abstract: The subject invention relates to a broadband optical metrology system that segregates the broadband radiation into multiple sub-bands to improve overall performance. Each sub-band includes only a fraction of the original bandwidth. The optical path—the light path that connects the illuminator, the sample and the detector—of each sub-band includes a unique sub-band optical system designed to optimize the performance over the spectral range spanned by the sub-band radiation. All of the sub-band optical systems are arranged to provide small-spot illumination at the same measurement position. Optional purging of the individual sub-band optical paths further improves performance.
    Type: Application
    Filed: May 8, 2002
    Publication date: April 17, 2003
    Inventors: David Y. Wang, Lawrence Rotter, Jeffrey T. Fanton, Jeffrey E. McAninch