Abstract: Provided are compounds of Formula (I) or (II) and related compositions and methods for their use as inhibitors of alpha-kinase 1 (ALPK1).

Abstract: Provided are compounds of Formula I, compositions and methods for their use as inhibitors of alpha-kinase 1 (ALPK1).

Abstract: The present invention relates to methods and compositions for treating lymphangioleiomyomatosis in a human subject in need of such treatment. The methods comprise administering to the subject via inhalation an aerosol composition comprising rapamycin or a prodrug or derivative (including analog) thereof.

Abstract: The present invention relates to methods and compositions for treating lymphangioleiomyomatosis in a human subject in need of such treatment. The methods comprise administering to the subject via inhalation an aerosol composition comprising rapamycin or a prodrug or derivative (including analog) thereof.

Abstract: The independent claims of this patent signify a concise description of embodiments. Roughly described, a design team prioritizes polygons of a circuit design layout. This information is then encoded into a layout database that is passed to the manufacturing team for correction further processing toward tape-out. The priorities may be used by an engineer to disposition errors found in the layout. For example, a failure may be waived. In another embodiment, the priorities are used during hotspot fixing, a process where failed features are corrected. In hotspot fixing, the priority can be used to make correction tradeoffs in favor of the highest priority features. Priorities are set during the correction to favor fidelity of the higher priority features over the lower priority features. Each embodiment reduces cost, and in some cases, improve final device performance. This Abstract is not intended to limit the scope of the claims.

Abstract: The present invention relates to methods and compositions for the treatment and prophylaxis of pulmonary arterial hypertension (PAH) in a human subject in need of such treatment, the methods comprising the pulmonary administration to the subject, preferably via inhalation of a composition comprising rapamycin or a prodrug or derivative thereof.

Abstract: The present invention relates to methods and compositions for anti-aging therapy and for the treatment and prophylaxis of age-related diseases and disorders in a human subject in need of such therapy or treatment, the methods comprising the pulmonary administration to the subject, preferably via inhalation, of composition comprising rapamycin, or a prodrug or derivative thereof.

Abstract: The present invention relates to methods and compositions for anti-aging therapy and for the treatment and prophylaxis of age-related diseases and disorders in a human subject in need of such therapy or treatment, the methods comprising the pulmonary administration to the subject, preferably via inhalation, of composition comprising rapamycin, or a prodrug or derivative thereof.

Abstract: A lithography process is described by a design for a lithographic mask and a description of the lithography configuration, which may include the lithography source, collection/illumination optics, projection optics, resist, and/or subsequent fabrication steps. The actual lithography process uses a lithographic mask fabricated from the mask design, which may be different than the nominal mask design. A mask fabrication model models the process for fabricating the lithographic mask from the mask design. Typically, this is an electron-beam (e-beam) process, which includes e-beam exposure of resist on a mask blank, processing of the exposed resist to form patterned resist, and etching of the mask blank with the patterned resist. The mask fabrication model, usually in conjunction with other process models, is used to estimate a result of the lithography process. Mask correction is then applied to the mask design based on the simulation result.

Abstract: The present invention relates to methods and compositions for the treatment and prophylaxis of pulmonary arterial hypertension (PAH) in a human subject in need of such treatment, the methods comprising the pulmonary administration to the subject, preferably via inhalation of a composition comprising rapamycin or a prodrug or derivative thereof.

Abstract: A method of generating a mask used in fabrication of a semiconductor device includes, in part, selecting a source candidate, generating a process simulation model that includes a stochastic variance band model in response to the selected source candidate, performing a first optical proximity correction (OPC) on the data associated with the mask in response to the process simulation model, assessing one or more lithographic evaluation metrics in response to the OPC mask data, computing a cost in response to the assessed one or more lithographic evaluation metrics, and determining whether the computed cost satisfies a threshold condition. In response to the determination that the computed cost does not satisfy the threshold condition, a different source candidate may be selected.

Abstract: A method, includes, in part, defining a continuous signal, defining a threshold value, calibrating the continuous signal and the threshold value from measurements made on edges of one or more patterns on a mask and corresponding edges of the patterns on a wafer, convolving the continuous signal with a kernel to form a corrected signal, and establishing, by a processor, a probability of forming an edge at a point along the corrected signal in accordance with a difference between the value of the corrected signal at the point and the calibrated threshold value. The kernel is calibrated using the same measurements made on the patterns' edges.

Abstract: An EUV mask absorber formed on a semiconductor structure, includes, in part a sidewall forming am angle relative to a surface of the semiconductor structure that is less than 90 degrees. The sidewall includes a layer of reflective material. The semiconductor structure may include, in part, a multitude of layers. The semiconductor structure may be disposed on a glass substrate, a silicon substrate, or the like. The EUV mask absorber is adapted to shift a phase of the EUV light passing therethrough. The EUV mask absorber may further include, in part, a layer of Ruthenium near a bottom surface of the absorber structure. The EUV mask absorber may further includes, in part, a layer of reflective material near a top surface of the absorber structure. The EUV mask absorber may further include, in part, Tantalum Oxynitride.

Abstract: Certain aspects relate to a method for improving a lithography configuration. In the lithography configuration, a source illuminates a mask to expose resist on a wafer. A processor determines a defect-based focus exposure window (FEW). The defect-based FEW is an area of depth of focus and exposure latitude for the lithography configuration with an acceptable level of defects on the wafer. The defect-based FEW is determined based on a predicted probability distribution for occurrence of defects on the wafer. A processor also determines a critical dimension (CD)-based FEW. The CD-based FEW is an area of depth of focus and exposure latitude for the lithography configuration with an acceptable level of CD variation on the wafer. It is determined based on predicted CDs on the wafer. The lithography configuration is modified based on increasing an area of overlap between the defect-based FEW and the CD-based FEW.

Abstract: The present invention relates to methods and compositions for treating lymphangioleiomyomatosis in a human subject in need of such treatment. The methods comprise administering to the subject via inhalation an aerosol composition comprising rapamycin or a prodrug or derivative (including analog) thereof.

Abstract: Techniques and systems for improving wafer contrast by manipulating reflective extreme ultraviolet (EUV) mask absorber are described. Some embodiment disclosed herein provide for EUV absorber material, which transmits some EUV illumination, to suppress the printing of sub-resolution assist features (SRAFs) while making the SRAFs closer in size to the printed feature by thinning the SRAF absorber thickness from the nominal mask absorber thickness in the bright-field mask case. In the dark-field mask case, a layer of absorber material is left in the SRAF trenches to prevent SRAF printing.

Abstract: The present invention relates to methods and compositions for treating lymphangioleiomyomatosis in a human subject in need of such treatment. The methods comprise administering to the subject via inhalation an aerosol composition comprising rapamycin or a prodrug or derivative (including analog) thereof.

Abstract: The present invention relates to methods and compositions for anti-aging therapy and for the treatment and prophylaxis of age-related diseases and disorders in a human subject in need of such therapy or treatment, the methods comprising the pulmonary administration to the subject, preferably via inhalation, of composition comprising rapamycin, or a prodrug or derivative thereof.

Abstract: A method, includes, in part, defining a continuous signal, defining a threshold value, calibrating the continuous signal and the threshold value from measurements made on edges of one or more patterns on a mask and corresponding edges of the patterns on a wafer, convolving the continuous signal with a kernel to form a corrected signal, and establishing, by a processor, a probability of forming an edge at a point along the corrected signal in accordance with a difference between the value of the corrected signal at the point and the calibrated threshold value. The kernel is calibrated using the same measurements made on the patterns' edges.

Abstract: The present invention relates to compounds of Formula (I): wherein X1, X2, X3, X4, X5, X6, X7, X8, R1, R2, R3 are defined above. The compounds have apoptosis signal-regulating kinase (“ASK1”) inhibitory activity, and are thus useful in the treatment of ASK1-mediated conditions, including autoimmune disorders, inflammatory diseases, cardiovascular diseases and neurodegenerative diseases. The invention also relates to pharmaceutical compositions comprising one or more of the compounds of Formula (I), and to methods of preparing the compounds of Formula (I).