Patents by Inventor Lawrence W. Welsh, Jr.

Lawrence W. Welsh, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light
    Patent number: 4389482
    Abstract: A photoresist that has strong resistance to reactive ion etching, high photosensitivity to mid- and deep UV-light, and high resolution capability is formed by using as the resist material a copolymer of methacrylonitrile and methacrylic acid, and by baking the resist before the exposure to light for improved photosensitivity, and after exposure to light, development, and prior to treatment with reactive ion etching.
    Type: Grant
    Filed: December 14, 1981
    Date of Patent: June 21, 1983
    Assignee: International Business Machines Corporation
    Inventors: Joachim Bargon, Hiroyuki Hiraoka, Lawrence W. Welsh, Jr.