Abstract: A package that includes a substrate comprising an interposer interconnect and a cavity, a redistribution portion coupled to the substrate, the redistribution comprising a plurality of redistribution interconnects, and a first die coupled to the redistribution portion through the cavity of the substrate. A substantial region between a side surface of the first die and the substrate is free of an encapsulation layer. In some implementations, the substrate is free of a metal ring that surrounds the first die. In some implementations, the redistribution portion comprises a barrier layer and a first interconnect coupled to the barrier layer. The barrier layer is coupled to the interposer interconnect.

Abstract: Some features pertain to a substrate that includes a first dielectric, a first interconnect, and a second interconnect. The first interconnect is at least partially embedded in the first dielectric layer. The first interconnect includes a first portion and a second portion. The first portion is configured to increase reliability as compared to a substrate having only a second portion of a first interconnect. The increase in reliability due at least in part to the first portion providing additional interconnect material to mitigate interconnect material lost through electromigration. A part of the second portion (of the first interconnect) is free of the first dielectric and may be configured to be coupled to another device.

Abstract: A device comprising a semiconductor die, a package substrate coupled to the semiconductor die, and an encapsulation layer that at least partially encapsulates the semiconductor die. The package substrate includes at least one stacked via. The at least one stacked via includes a first via and a second via coupled to the first via. The second via includes a seed layer coupled to the first via. The second via includes a different shape than the first via. The package substrate includes a prepreg layer. The package substrate includes a first pad coupled to the first via, and a second pad coupled to the second via.

Abstract: A device comprising a semiconductor die, a package substrate coupled to the semiconductor die, and an encapsulation layer that at least partially encapsulates the semiconductor die. The package substrate includes at least one stacked via. The at least one stacked via includes a first via and a second via coupled to the first via. The second via includes a seed layer coupled to the first via. The second via includes a different shape than the first via. The package substrate includes a prepreg layer. The package substrate includes a first pad coupled to the first via, and a second pad coupled to the second via.

Abstract: A package that includes a substrate comprising an interposer interconnect and a cavity, a redistribution portion coupled to the substrate, the redistribution comprising a plurality of redistribution interconnects, and a first die coupled to the redistribution portion through the cavity of the substrate. A substantial region between a side surface of the first die and the substrate is free of an encapsulation layer. In some implementations, the substrate is free of a metal ring that surrounds the first die. In some implementations, the redistribution portion comprises a barrier layer and a first interconnect coupled to the barrier layer. The barrier layer is coupled to the interposer interconnect.

Abstract: An integrated device package includes a die and a package substrate. The package substrate includes at least one dielectric layer (e.g., core layer, prepeg layer), a magnetic core in the dielectric layer, a first plurality of interconnects configured to operate as a first protective ring, and a second plurality of interconnects configured to operate as a first inductor. The second plurality of interconnects is positioned in the package substrate to at least partially surround the magnetic core. At least one interconnect from the second plurality of interconnects is also part of the first plurality of interconnects. In some implementations, the first protective ring is a non-contiguous protective ring. In some implementations, the first inductor is a solenoid inductor. In some implementations, the magnetic core includes a carrier, a first magnetic layer, and a second magnetic layer.

Abstract: An integrated device package includes a die and a package substrate. The package substrate includes at least one dielectric layer (e.g., core layer, prepeg layer), a magnetic core in the dielectric layer, a first plurality of interconnects configured to operate as a first protective ring, and a second plurality of interconnects configured to operate as a first inductor. The second plurality of interconnects is positioned in the package substrate to at least partially surround the magnetic core. At least one interconnect from the second plurality of interconnects is also part of the first plurality of interconnects. In some implementations, the first protective ring is a non-contiguous protective ring. In some implementations, the first inductor is a solenoid inductor. In some implementations, the magnetic core includes a carrier, a first magnetic layer, and a second magnetic layer.

Abstract: Methods and apparatus for controlling an equivalent-series resistance (ESR) of a capacitor are provided. An exemplary apparatus includes a substrate having a land side, the capacitor mounted on the land side of the substrate and having both the ESR and terminals, a resistive pattern coupled to the terminals, and a plurality of vias coupled to the resistive pattern. The resistive pattern is configured to control the ESR. The resistive pattern can be formed of a resistive paste. The resistive pattern can be formed in a substantially semicircular shape having an arc ranging from substantially 45 degrees to substantially 135 degrees. The capacitor can be a surface mount device. The resistive pattern can be formed in a shape of a land-side capacitor mounting pad, a via, or both.

Abstract: Some features pertain to an integrated device that includes a first substrate, a first solder resist layer coupled to the first substrate, a second solder resist layer coupled to the first solder resist layer, and an opening in the first and second solder resist layers, the opening comprising a sidewall completely covered with the second solder resist layer, where a sidewall of the second solder resist layer covers a sidewall of the first solder resist layer. In some implementations, the opening is at least partially filled with an electrically conductive material. The electrically conductive material includes one of solder and/or an interconnect. The integrated device includes a first interconnect coupled to the electrically conductive material. The first interconnect is one of at least a solder, and/or an interconnect ball. In some implementations, the integrated device includes a pad coupled to the substrate, and a first interconnect coupled to the pad.

Abstract: A semiconductor substrate according to some examples of the disclosure may include a substrate with a cavity in a top surface of the substrate, a plurality of cavity interconnections embedded below a bottom surface of the cavity and extending to a bottom surface of the substrate, and a plurality of side interconnections to either side of the cavity extending from the top surface of the substrate to the bottom surface of the substrate. Each of the plurality of side interconnections may include an electrically conductive stop etch layer in the same horizontal plane as the bottom of the cavity.

Abstract: Some features pertain to an integrated device that includes a first substrate, a first solder resist layer coupled to the first substrate, a second solder resist layer coupled to the first solder resist layer, and an opening in the first and second solder resist layers, the opening comprising a sidewall completely covered with the second solder resist layer, where a sidewall of the second solder resist layer covers a sidewall of the first solder resist layer. In some implementations, the opening is at least partially filled with an electrically conductive material. The electrically conductive material includes one of solder and/or an interconnect. The integrated device includes a first interconnect coupled to the electrically conductive material. The first interconnect is one of at least a solder, and/or an interconnect ball. In some implementations, the integrated device includes a pad coupled to the substrate, and a first interconnect coupled to the pad.