Patents by Inventor Leandro Roth

Leandro Roth has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Supertransparent high impact strength random block copolymer
    Patent number: 8138251
    Abstract: A high impact strength random block copolymer including (a) about 65-97 wt. % of a crystalline propylene/ethylene copolymer A containing from about 0.5 wt. % to about 6 wt. % derived from ethylene and from about 94 wt. % to about 99.5 wt. % derived from propylene, and (b) about 3-35 wt. % of a propylene/ethylene copolymer B containing from about 8 wt. % to about 40 wt % derived from ethylene and from about 60 wt % to about 92 wt. % derived from propylene. The crystalline to amorphous ratio Lc/La of the random block copolymer ranges from about 1.00 to about 2.25. The random block copolymer is characterized by both high toughness and low haze.
    Type: Grant
    Filed: November 2, 2011
    Date of Patent: March 20, 2012
    Assignee: Lummus Novolen Technology GmbH
    Inventors: Jose Pezzutti, Alberto Benito, Guillermo Cassano, Leandro Roth, Werner Schoene, Hartmut Siebert, Andreas Winter, Anita Dimeska, Vassilios Galiatsatos
  • SUPERTRANSPARENT HIGH IMPACT STRENGTH RANDOM BLOCK COPOLYMER
    Publication number: 20120046396
    Abstract: A high impact strength random block copolymer including (a) about 65-97 wt. % of a crystalline propylene/ethylene copolymer A containing from about 0.5 wt. % to about 6 wt. % derived from ethylene and from about 94 wt. % to about 99.5 wt. % derived from propylene, and (b) about 3-35 wt. % of a propylene/ethylene copolymer B containing from about 8 wt. % to about 40 wt % derived from ethylene and from about 60 wt % to about 92 wt. % derived from propylene. The crystalline to amorphous ratio Lc/La of the random block copolymer ranges from about 1.00 to about 2.25. The random block copolymer is characterized by both high toughness and low haze.
    Type: Application
    Filed: November 2, 2011
    Publication date: February 23, 2012
    Applicant: Lummus Novolen Technology GmbH
    Inventors: José Pezzutti, Alberto Benito, Guillermo Cassano, Leandro Roth, Werner Schoene, Hartmut Siebert, Andreas Winter, Anita Dimeska, Vassilios Galiatsatos
  • Supertransparent high impact strength random block copolymer
    Patent number: 8076429
    Abstract: A high impact strength random block copolymer including (a) about 65-97 wt. % of a crystalline propylene/ethylene copolymer A containing from about 0.5 wt. % to about 6 wt. % derived from ethylene and from about 94 wt. % to about 99.5 wt. % derived from propylene, and (b) about 3-35 wt. % of a propylene/ethylene copolymer B containing from about 8 wt. % to about 40 wt % derived from ethylene and from about 60 wt % to about 92 wt. % derived from propylene. The crystalline to amorphous ratio Lc/La of the random block copolymer ranges from about 1.00 to about 2.25. The random block copolymer is characterized by both high toughness and low haze.
    Type: Grant
    Filed: March 11, 2009
    Date of Patent: December 13, 2011
    Assignee: Lummus Novolen Technology GmbH
    Inventors: José Pezzutti, Alberto Benito, Guillermo Cassano, Leandro Roth, Werner Schoene, Hartmut Siebert, Andreas Winter, Anita Dimeska, Vassilios Galiatsatos
  • Supertransparent high impact strength random block copolymer
    Publication number: 20100234507
    Abstract: A high impact strength random block copolymer including (a) about 65-97 wt. % of a crystalline propylene/ethylene copolymer A containing from about 0.5 wt. % to about 6 wt. % derived from ethylene and from about 94 wt. % to about 99.5 wt. % derived from propylene, and (b) about 3-35 wt. % of a propylene/ethylene copolymer B containing from about 8 wt. % to about 40 wt % derived from ethylene and from about 60 wt % to about 92 wt. % derived from propylene. The crystalline to amorphous ratio Lc/La of the random block copolymer ranges from about 1.00 to about 2.25. The random block copolymer is characterized by both high toughness and low haze.
    Type: Application
    Filed: March 11, 2009
    Publication date: September 16, 2010
    Inventors: Jose Pezzutti, Alberto Benito, Guillermo Cassano, Leandro Roth, Werner Schoene, Hartmut Siebert, Andreas Winter, Anita Dimeska, Vassilios Galiatsatos