Abstract: Systems and methods for displaying annotations associated with an electronic document. One system includes an electronic computing device with an electronic processor configured to display a user interface on a display device. The user interface includes a canvas displaying a first subset of content included in the electronic document and a region scrollable independent from the canvas. The electronic processor is also configured to display a first plurality of annotations in the region. Each of the first plurality of annotations are associated with an anchor within the first subset of the content and displayed spaced within the region in at least one dimension based on spacing of the associated anchors. The electronic processor is further configured to change the region to display a second plurality of annotations in the region in response to changing the canvas to display a second subset of the content included in the electronic document.

Abstract: Systems and methods for displaying annotations associated with an electronic document. One system includes an electronic computing device with an electronic processor configured to display a user interface on a display device. The user interface includes a canvas displaying a first subset of content included in the electronic document and a region scrollable independent from the canvas. The electronic processor is also configured to display a first plurality of annotations in the region. Each of the first plurality of annotations are associated with an anchor within the first subset of the content and displayed spaced within the region in at least one dimension based on spacing of the associated anchors. The electronic processor is further configured to change the region to display a second plurality of annotations in the region in response to changing the canvas to display a second subset of the content included in the electronic document.

Abstract: A liquid crystal on silicon (LCOS) device includes a semiconductor substrate, a metal-oxide semiconductor (MOS) device layer overlying the semiconductor substrate, a planarized interlayer dielectric layer overlying the MOS device layer, a plurality of recessed regions formed within a portion of the interlayer dielectric layer, a metal layer filling each of the recessed regions to form a plurality of respective electrode plates corresponding to each of the recessed regions. The LCOS device further includes a protective layer overlying a surface of each of the plurality of electrode plates, a liquid crystal film overlying the protective layer, and a mirror finish formed on each of the surface of the electrode plates for reflecting light. The mirror finish is substantially free from dishes and scratches from a chemical mechanical polishing process.

Abstract: A method for fabricating a liquid crystal on silicon display device. The method includes providing a substrate, e.g., silicon wafer. The method includes forming a transistor layer overlying the substrate. Preferably, the transistor layer has a plurality of MOS devices therein. The method includes forming an interlayer dielectric layer (e.g., BPSG, FSG) overlying the transistor layer. The method includes planarizing the interlayer dielectric layer and forming a sacrificial layer (e.g., bottom antireflective coating, polymide, photoresist, polysilicon) overlying the planarized interlayer dielectric layer. The method includes forming a plurality of recessed regions within a portion of the interlayer dielectric layer through the sacrificial layer while other portions of the interlayer dielectric layer remain intact. Preferably, lithographic techniques are used for forming the recessed regions.

Abstract: A method for fabricating a liquid crystal on silicon display device. The method includes providing a substrate, e.g., silicon wafer. The method includes forming a transistor layer overlying the substrate. Preferably, the transistor layer has a plurality of MOS devices therein. The method includes forming an interlayer dielectric layer (e.g., BPSG, FSG) overlying the transistor layer. The method includes planarizing the interlayer dielectric layer and forming a sacrificial layer (e.g., bottom antireflective coating, polymide, photoresist, polysilicon) overlying the planarized interlayer dielectric layer. The method includes forming a plurality of recessed regions within a portion of the interlayer dielectric layer through the sacrificial layer while other portions of the interlayer dielectric layer remain intact. Preferably, lithographic techniques are used for forming the recessed regions.

Abstract: A method for fabricating a liquid crystal on silicon display device. The method includes providing a substrate, e.g., silicon wafer. The method includes forming a transistor layer overlying the substrate. Preferably, the transistor layer has a plurality of MOS devices therein. The method includes forming an interlayer dielectric layer (e.g., BPSG, FSG) overlying the transistor layer. The method includes planarizing the interlayer dielectric layer and forming a sacrificial layer (e.g., bottom antireflective coating, polymide, photoresist, polysilicon) overlying the planarized interlayer dielectric layer. The method includes forming a plurality of recessed regions within a portion of the interlayer dielectric layer through the sacrificial layer while other portions of the interlayer dielectric layer remain intact. Preferably, lithographic techniques are used for forming the recessed regions.