Abstract: A method for fabricating a semiconductor device, including forming a gate insulating layer and a gate electrode on a substrate; forming insulating layer sidewalls at sides of the gate electrode; forming source/drain regions in surface portions of the substrate that are located, respectively, at sides of the gate electrode; forming a conductive silicide layer on the entire surface of the substrate; and selectively removing the silicide layer from areas other than the gate electrode and the source/drain regions of the substrate. The conductive silicide layer may be made by forming a silicon layer on an entire surface of the substrate; forming a conductive layer on the silicon layer; and thermal-processing the substrate such that the conductive layer reacts with the silicon layer.

Abstract: This invention relates to an error concealment system of digital video signal for concealing an error in the digital video signal of block coding system such as Moving Picture Experts Group(MPEG) system which is a standard for a video signal decoder. A method for concealing an error in a digital video signal of block coding system comprising the steps of judging whether or not an error is present in mode data, judging whether or not the mode is an intra mode in case when an error is not present in the mode data, checking the number of motion vectors having no error in case that said mode is a non-intra mode, and concealing the error by interpolating the blocks of past and future intra frame and predictive frame residing at the same position as the block with an error in case an error is present in the mode data or in case of error in the data in intra mode and in case where errors are present in all the motion vectors.