Patents by Inventor Lee Coulter
Lee Coulter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230357056Abstract: According to various aspects and embodiments, a system and method for polishing ultrapure water (UPW) is disclosed. The water polishing system includes a source of ultrapure water (UPW), an ultrafiltration (UF) module having an inlet and a permeate outlet, a recirculation conduit communicating the permeate outlet with the inlet and forming a recirculation loop, a recirculation pump disposed along the recirculation conduit upstream from the inlet of the UF module and fluidly coupled to the source of UPW, a supply conduit fluidly coupled to the recirculating conduit and a demand source, the supply conduit positioned downstream from the permeate outlet, and a pressure control valve disposed along the recirculation conduit downstream from the supply conduit and configured to maintain pressure of permeate at a predetermined value.Type: ApplicationFiled: June 29, 2023Publication date: November 9, 2023Inventors: Boris Eliosov, Bruce Lee Coulter, Glen P. Sundstrom
-
Publication number: 20230312386Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.Type: ApplicationFiled: June 5, 2023Publication date: October 5, 2023Inventors: Christopher Hall, Bruce Lee Coulter
-
Patent number: 11697607Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.Type: GrantFiled: March 11, 2021Date of Patent: July 11, 2023Assignee: Evoqua Water Technologies LLCInventors: Christopher Hall, Bruce Lee Coulter
-
Patent number: 11438502Abstract: Aspects relate to an image signal processor that processes frames at changing frame rates. An example method includes receiving, by an image signal processor, a first sequence of image frames from an image sensor at a first frame rate, processing each image frame of the first sequence of image frames at the first frame rate, and receiving from the image sensor an indication of a frame rate change from the first frame rate to a second frame rate. The method also includes configuring one or more filters of the image signal processor to process image frames from the image sensor in response to receiving the indication of the frame rate change from the image sensor, receiving a second sequence of image frames from the image sensor at the second frame rate, and processing each image frame of the second sequence of image frames at the second frame rate.Type: GrantFiled: May 14, 2020Date of Patent: September 6, 2022Assignee: QUALCOMM IncorporatedInventors: Rohan Desai, Scott Cheng, Songhe Cai, Rakesh Sanam, Abhay Raut, Michael Lee Coulter
-
Publication number: 20210380451Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.Type: ApplicationFiled: March 11, 2021Publication date: December 9, 2021Applicant: Evoqua Water Technologies LLCInventors: Christopher Hall, Bruce Lee Coulter
-
Publication number: 20210360153Abstract: Aspects relate to an image signal processor that processes frames at changing frame rates. An example method includes receiving, by an image signal processor, a first sequence of image frames from an image sensor at a first frame rate, processing each image frame of the first sequence of image frames at the first frame rate, and receiving from the image sensor an indication of a frame rate change from the first frame rate to a second frame rate. The method also includes configuring one or more filters of the image signal processor to process image frames from the image sensor in response to receiving the indication of the frame rate change from the image sensor, receiving a second sequence of image frames from the image sensor at the second frame rate, and processing each image frame of the second sequence of image frames at the second frame rate.Type: ApplicationFiled: May 14, 2020Publication date: November 18, 2021Inventors: Rohan DESAI, Scott CHENG, Songhe CAI, Rakesh SANAM, Abhay RAUT, Michael Lee COULTER
-
Patent number: 10961143Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.Type: GrantFiled: May 4, 2016Date of Patent: March 30, 2021Assignee: Evoqua Water Technologies LLCInventors: Christopher Hall, Bruce Lee Coulter
-
Publication number: 20190313026Abstract: Methods, systems, and devices for image processing are described. A device may include a plurality of buffer components, each of which may receive a pixel lines that may each be associated with a respective raw image. An arbitration component of the device may combine at least some of the pixel lines into one or more data packets. The arbitration component may pass, using an arbitration scheme such as a time division multiplexing scheme, the one or more data packets from the arbitration component to a shared image signal processor (ISP) of the device. The shared ISP may generate a respective processed image based at least in part on the one or more data packets. In some examples, the device may maintain a respective set of image statistics, registers, and the like for at least some of the raw images.Type: ApplicationFiled: April 9, 2018Publication date: October 10, 2019Inventors: Scott Cheng, Chih-Chi Cheng, Pawan Kumar Baheti, Michael Lee Coulter, Maulesh Patel, John Welch, Krishnam Indukuri
-
Publication number: 20180273412Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.Type: ApplicationFiled: May 4, 2016Publication date: September 27, 2018Inventors: Christopher Hall, Bruce Lee Coulter
-
Publication number: 20180048817Abstract: Methods and apparatus improve static region detection in an imaging pipeline. An imaging pipeline may perform detection of static regions of an image at multiple stages of the pipeline. For example, as static regions may be eliminated from further processing by the imaging pipeline, static region detection performed at an early stage of the pipeline may provide for maximized power savings. As images early in the pipeline may contain artifacts inhibiting detection of some static regions, additional static region detection may be performed after further image processing. For example, static region detection may be performed for a second time after some filtering is applied to images in the pipeline. Regions previously characterized as dynamic may be characterized as static later in the pipeline due to a reduction of noise for example provided by the filters, and differences between the static region detection at different positions within the imaging pipeline.Type: ApplicationFiled: August 15, 2016Publication date: February 15, 2018Inventors: Suolong Dong, Scott Cheng, Jeffrey Chu, Neil Christanto, Joseph Cheung, Michael Lee Coulter, Chia-Yuan Teng, Haoping Xu
-
Patent number: 9764968Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: GrantFiled: March 8, 2013Date of Patent: September 19, 2017Assignee: Evoqua Water Technologies LLCInventor: Bruce Lee Coulter
-
Patent number: 9725343Abstract: A method and system of treating a liquid stream is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The water may be further treated by utilizing ion exchange media and degasification apparatus. A control system may be utilized to measure and regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: GrantFiled: June 16, 2014Date of Patent: August 8, 2017Assignee: Evoqua Water Technologies LLCInventor: Bruce Lee Coulter
-
Patent number: 9365435Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: GrantFiled: January 17, 2011Date of Patent: June 14, 2016Assignee: Evoqua Water Technologies LLCInventor: Bruce Lee Coulter
-
Patent number: 9365436Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A to control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: GrantFiled: January 17, 2011Date of Patent: June 14, 2016Assignee: Evoqua Water Technologies LLCInventor: Bruce Lee Coulter
-
Patent number: 8961798Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: GrantFiled: January 17, 2011Date of Patent: February 24, 2015Assignee: Evoqua Water Technologies LLCInventor: Bruce Lee Coulter
-
Publication number: 20140291253Abstract: A method and system of treating a liquid stream is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The water may be further treated by utilizing ion exchange media and degasification apparatus. A control system may be utilized to measure and regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: ApplicationFiled: June 16, 2014Publication date: October 2, 2014Inventor: Bruce Lee Coulter
-
Patent number: 8753522Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: GrantFiled: January 17, 2011Date of Patent: June 17, 2014Assignee: Evoqua Water Technologies LLCInventor: Bruce Lee Coulter
-
Patent number: 8741155Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: GrantFiled: January 17, 2011Date of Patent: June 3, 2014Assignee: Evoqua Water Technologies LLCInventor: Bruce Lee Coulter
-
Patent number: 8591730Abstract: An ultraviolet reactor for treating a fluid. The reactor includes a vessel having an inlet for receiving fluid and an outlet for discharging fluid. The reactor further includes an ultraviolet light source and baffle plates. The baffle plates include holes arranged in a predetermined pattern for providing plug flow in areas in the reactor near the ultraviolet light source.Type: GrantFiled: July 28, 2010Date of Patent: November 26, 2013Assignee: Siemens Pte. Ltd.Inventors: Zhee Min Jimmy Yong, David Stibitz, Bruce Lee Coulter, Michael Scott Hoosier
-
Patent number: D697094Type: GrantFiled: March 15, 2013Date of Patent: January 7, 2014Assignee: Whirlpool CorporationInventors: Tim Lee Coulter, Thomas E. Gose, Steven G. Herndon, James H. Jenkins, Bill J. Koons, Brent A. Kramer, Scott W. Leimkuehler, Dean A. Martin, Alvin V. Miller, Kevin Lee Noel, Mauro M. Oliveira, Lester J. Ott, Ron S. Paulsen, Chad J. Rotter, David Allen Stauffer, Kyle B. Van Meter, Alan M. Welch, Robert L. Wetekamp