Patents by Inventor Lee Coulter

Lee Coulter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230357056
    Abstract: According to various aspects and embodiments, a system and method for polishing ultrapure water (UPW) is disclosed. The water polishing system includes a source of ultrapure water (UPW), an ultrafiltration (UF) module having an inlet and a permeate outlet, a recirculation conduit communicating the permeate outlet with the inlet and forming a recirculation loop, a recirculation pump disposed along the recirculation conduit upstream from the inlet of the UF module and fluidly coupled to the source of UPW, a supply conduit fluidly coupled to the recirculating conduit and a demand source, the supply conduit positioned downstream from the permeate outlet, and a pressure control valve disposed along the recirculation conduit downstream from the supply conduit and configured to maintain pressure of permeate at a predetermined value.
    Type: Application
    Filed: June 29, 2023
    Publication date: November 9, 2023
    Inventors: Boris Eliosov, Bruce Lee Coulter, Glen P. Sundstrom
  • Publication number: 20230312386
    Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.
    Type: Application
    Filed: June 5, 2023
    Publication date: October 5, 2023
    Inventors: Christopher Hall, Bruce Lee Coulter
  • Patent number: 11697607
    Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.
    Type: Grant
    Filed: March 11, 2021
    Date of Patent: July 11, 2023
    Assignee: Evoqua Water Technologies LLC
    Inventors: Christopher Hall, Bruce Lee Coulter
  • Patent number: 11438502
    Abstract: Aspects relate to an image signal processor that processes frames at changing frame rates. An example method includes receiving, by an image signal processor, a first sequence of image frames from an image sensor at a first frame rate, processing each image frame of the first sequence of image frames at the first frame rate, and receiving from the image sensor an indication of a frame rate change from the first frame rate to a second frame rate. The method also includes configuring one or more filters of the image signal processor to process image frames from the image sensor in response to receiving the indication of the frame rate change from the image sensor, receiving a second sequence of image frames from the image sensor at the second frame rate, and processing each image frame of the second sequence of image frames at the second frame rate.
    Type: Grant
    Filed: May 14, 2020
    Date of Patent: September 6, 2022
    Assignee: QUALCOMM Incorporated
    Inventors: Rohan Desai, Scott Cheng, Songhe Cai, Rakesh Sanam, Abhay Raut, Michael Lee Coulter
  • Publication number: 20210380451
    Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.
    Type: Application
    Filed: March 11, 2021
    Publication date: December 9, 2021
    Applicant: Evoqua Water Technologies LLC
    Inventors: Christopher Hall, Bruce Lee Coulter
  • Publication number: 20210360153
    Abstract: Aspects relate to an image signal processor that processes frames at changing frame rates. An example method includes receiving, by an image signal processor, a first sequence of image frames from an image sensor at a first frame rate, processing each image frame of the first sequence of image frames at the first frame rate, and receiving from the image sensor an indication of a frame rate change from the first frame rate to a second frame rate. The method also includes configuring one or more filters of the image signal processor to process image frames from the image sensor in response to receiving the indication of the frame rate change from the image sensor, receiving a second sequence of image frames from the image sensor at the second frame rate, and processing each image frame of the second sequence of image frames at the second frame rate.
    Type: Application
    Filed: May 14, 2020
    Publication date: November 18, 2021
    Inventors: Rohan DESAI, Scott CHENG, Songhe CAI, Rakesh SANAM, Abhay RAUT, Michael Lee COULTER
  • Patent number: 10961143
    Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.
    Type: Grant
    Filed: May 4, 2016
    Date of Patent: March 30, 2021
    Assignee: Evoqua Water Technologies LLC
    Inventors: Christopher Hall, Bruce Lee Coulter
  • Publication number: 20190313026
    Abstract: Methods, systems, and devices for image processing are described. A device may include a plurality of buffer components, each of which may receive a pixel lines that may each be associated with a respective raw image. An arbitration component of the device may combine at least some of the pixel lines into one or more data packets. The arbitration component may pass, using an arbitration scheme such as a time division multiplexing scheme, the one or more data packets from the arbitration component to a shared image signal processor (ISP) of the device. The shared ISP may generate a respective processed image based at least in part on the one or more data packets. In some examples, the device may maintain a respective set of image statistics, registers, and the like for at least some of the raw images.
    Type: Application
    Filed: April 9, 2018
    Publication date: October 10, 2019
    Inventors: Scott Cheng, Chih-Chi Cheng, Pawan Kumar Baheti, Michael Lee Coulter, Maulesh Patel, John Welch, Krishnam Indukuri
  • Publication number: 20180273412
    Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.
    Type: Application
    Filed: May 4, 2016
    Publication date: September 27, 2018
    Inventors: Christopher Hall, Bruce Lee Coulter
  • Publication number: 20180048817
    Abstract: Methods and apparatus improve static region detection in an imaging pipeline. An imaging pipeline may perform detection of static regions of an image at multiple stages of the pipeline. For example, as static regions may be eliminated from further processing by the imaging pipeline, static region detection performed at an early stage of the pipeline may provide for maximized power savings. As images early in the pipeline may contain artifacts inhibiting detection of some static regions, additional static region detection may be performed after further image processing. For example, static region detection may be performed for a second time after some filtering is applied to images in the pipeline. Regions previously characterized as dynamic may be characterized as static later in the pipeline due to a reduction of noise for example provided by the filters, and differences between the static region detection at different positions within the imaging pipeline.
    Type: Application
    Filed: August 15, 2016
    Publication date: February 15, 2018
    Inventors: Suolong Dong, Scott Cheng, Jeffrey Chu, Neil Christanto, Joseph Cheung, Michael Lee Coulter, Chia-Yuan Teng, Haoping Xu
  • Patent number: 9764968
    Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: September 19, 2017
    Assignee: Evoqua Water Technologies LLC
    Inventor: Bruce Lee Coulter
  • Patent number: 9725343
    Abstract: A method and system of treating a liquid stream is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The water may be further treated by utilizing ion exchange media and degasification apparatus. A control system may be utilized to measure and regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.
    Type: Grant
    Filed: June 16, 2014
    Date of Patent: August 8, 2017
    Assignee: Evoqua Water Technologies LLC
    Inventor: Bruce Lee Coulter
  • Patent number: 9365435
    Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.
    Type: Grant
    Filed: January 17, 2011
    Date of Patent: June 14, 2016
    Assignee: Evoqua Water Technologies LLC
    Inventor: Bruce Lee Coulter
  • Patent number: 9365436
    Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A to control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.
    Type: Grant
    Filed: January 17, 2011
    Date of Patent: June 14, 2016
    Assignee: Evoqua Water Technologies LLC
    Inventor: Bruce Lee Coulter
  • Patent number: 8961798
    Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.
    Type: Grant
    Filed: January 17, 2011
    Date of Patent: February 24, 2015
    Assignee: Evoqua Water Technologies LLC
    Inventor: Bruce Lee Coulter
  • Publication number: 20140291253
    Abstract: A method and system of treating a liquid stream is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The water may be further treated by utilizing ion exchange media and degasification apparatus. A control system may be utilized to measure and regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.
    Type: Application
    Filed: June 16, 2014
    Publication date: October 2, 2014
    Inventor: Bruce Lee Coulter
  • Patent number: 8753522
    Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.
    Type: Grant
    Filed: January 17, 2011
    Date of Patent: June 17, 2014
    Assignee: Evoqua Water Technologies LLC
    Inventor: Bruce Lee Coulter
  • Patent number: 8741155
    Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.
    Type: Grant
    Filed: January 17, 2011
    Date of Patent: June 3, 2014
    Assignee: Evoqua Water Technologies LLC
    Inventor: Bruce Lee Coulter
  • Patent number: 8591730
    Abstract: An ultraviolet reactor for treating a fluid. The reactor includes a vessel having an inlet for receiving fluid and an outlet for discharging fluid. The reactor further includes an ultraviolet light source and baffle plates. The baffle plates include holes arranged in a predetermined pattern for providing plug flow in areas in the reactor near the ultraviolet light source.
    Type: Grant
    Filed: July 28, 2010
    Date of Patent: November 26, 2013
    Assignee: Siemens Pte. Ltd.
    Inventors: Zhee Min Jimmy Yong, David Stibitz, Bruce Lee Coulter, Michael Scott Hoosier
  • Patent number: D697094
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: January 7, 2014
    Assignee: Whirlpool Corporation
    Inventors: Tim Lee Coulter, Thomas E. Gose, Steven G. Herndon, James H. Jenkins, Bill J. Koons, Brent A. Kramer, Scott W. Leimkuehler, Dean A. Martin, Alvin V. Miller, Kevin Lee Noel, Mauro M. Oliveira, Lester J. Ott, Ron S. Paulsen, Chad J. Rotter, David Allen Stauffer, Kyle B. Van Meter, Alan M. Welch, Robert L. Wetekamp