Patents by Inventor LEE-FENG CHEN

LEE-FENG CHEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EUV LITHOGRAPHY MASKS AND METHODS
    Publication number: 20250093762
    Abstract: An EUV lithography mask including a substrate, a patterned absorber layer including a first material and a second material. In some embodiments, the first material is a second row transition metal and the second material is a first row transition metal or second row transition metal. The disclosed EUV lithography masks reduce undesirable mask 3D effects.
    Type: Application
    Filed: February 6, 2024
    Publication date: March 20, 2025
    Inventors: Lee-Feng CHEN, Yen-Liang CHEN, Chien-Min LEE, Kuo Lun TAI, Shy-Jay LIN