Abstract: A method of identifying an agent, or combination of agents, as a candidate immunological adjuvant is provided comprising contacting a cell comprising a Nod-like receptor (Nlrp3) with the agent. Methods of enhancing immune responses to vaccines are also provided.

Abstract: A system and method is disclosed for providing a CMOS compatible single poly electrically erasable programmable read only memory (EEPROM) with memory cells that comprise an NMOS program transistor. In a first embodiment the memory cells of the EEPROM comprise a PMOS control capacitor. In a second embodiment the memory cells of the EEPROM comprise an NMOS control capacitor. A well bias voltage is applied to the NMOS program transistor instead of a gate bias voltage. The well bias voltage enables the injection of (1) channel hot electrons, (2) second hot electrons initiated by the channel hot electrons, and (3) drain impact ionization hot electrons into a floating gate of the NMOS program transistor.

Abstract: A method and system for consolidating old support documents for a product that is out-of-support into a single archive file package (“archive package”) that is accessible from a single webpage. The archive package includes static and unchanging updates, fixes, redbooks, Authorized Problem Analysis Reports (APARs) and Document Control Facility (DCF) published content related to the out-of-support product. To access and use the archive package, the provider of the product and/or its support then provides access to the archive package to users, either by storing the archive package on a server, or by downloading the archive package to the user's computer as a single document. Because the product is out-of-support, no new documents/downloads/plug-ins etc. will be developed by the producer in the future, and thus the archive package will contain the latest content related to the out-of-support product.

Abstract: A single, controlled etch step can be used to form a sharp tip feature along a sidewall of an etch feature. An etch process is used that is selective to a layer of tip material relative to the substrate upon which the layer is deposited. A lag can be created in the etch, such that the etch rate is slower near the sidewall. The sharp tip feature is formed from the same layer of material used to create the etch feature. The sharp tip feature can be used to decrease the minimum critical dimension of an etch process, such as may be due to the minimum resolution of a photolithographic process. The novel tip feature also can be used for other applications, such as to create a microaperture for a photosensitive device, or to create a micromold that can be used to form objects such as microlenses.