Abstract: The present invention relates to the treatment of sarcomas that are driven by oncogenic chimeric transcription factors, such as Ewing Sarcoma and Desmoplastic Small Round Cell Tumor (DSRCT). In some embodiments, the present invention provides oligonucleotide molecules that can redirect the pre-mRNA splicing of these oncogenic products, resulting in the production of truncated and transcriptionally inactive versions of these oncogenic transcription factors. The present invention also provides compositions comprising such oligonucleotide molecules, and methods of treatment involving administration of such oligonucleotide molecules.

Abstract: A method of maintaining an article, e.g. an engine and its components in a potentially explosive environment at a surface temperature above that allowed by safety regulations, e.g. above 200° C. This is achieved by applying a composition comprising: about 9 to about 90% of one or more silicone rubber about 9 to about 90% of one or more fluorosilicone rubber about 0.05 to about 1% of one or more vulcanisation catalyst and about 0 to about 20% of one or more additive to the surface of the article and curing the composition, and maintaining the article in a potentially explosive environment such that the surface temperature of the article is above that allowed by safety regulations but the surface temperature of the coating does not exceed that allowed by safety regulations.

Abstract: A guide tube for an ion beam in an ion implanter which is located adjacent a semiconductor wafer being implanted has an outwardly tapering central bore, thereby alleviating problems of beam strike as the ion beam passes through the guide tube.

Abstract: The present invention relates to an ion beam extraction assembly for use in an ion beam generation apparatus such as those used, for example, in an ion implanter. An ion beam extraction assembly is provided for mounting within an ion beam generating apparatus comprising an ion source such that the extraction assembly is operable to extract ions from the ion source as an ion beam. The extraction assembly comprises an electrode assembly separate from the ion source, an electrode of the electrode assembly defining at least partly a path through the extraction assembly for passage of an ion beam. At least a part of the electrode assembly adjacent the path is tungsten and at least a part of the electrode assembly that is remote from the path is formed from a less expensive and/or lighter material.

Abstract: A guide tube for an ion beam in an ion implanter which is located adjacent a semiconductor wafer being implanted has an outwardly tapering central bore, thereby alleviating problems of beam strike as the ion beam passes through the guide tube.