Patents by Inventor Lee-Wee Tao

Lee-Wee Tao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming high-K metal gate device
    Patent number: 8609484
    Abstract: The present disclosure provides a method of fabricating a semiconductor device that includes providing a semiconductor substrate, forming a metal gate on the substrate, the metal gate having a first gate resistance, removing a portion of the metal gate thereby forming a trench; and forming a conductive structure within the trench such that a second gate resistance of the conductive structure and remaining portion of the metal gate is lower than the first gate resistance.
    Type: Grant
    Filed: November 12, 2009
    Date of Patent: December 17, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Lee-Wee Tao, Han-Guan Chew, Harry Hak-Lay Chuang, Syun-Ming Jang
  • METHOD FOR FORMING HIGH-K METAL GATE DEVICE
    Publication number: 20110108928
    Abstract: The present disclosure provides a method of fabricating a semiconductor device that includes providing a semiconductor substrate, forming a metal gate on the substrate, the metal gate having a first gate resistance, removing a portion of the metal gate thereby forming a trench; and forming a conductive structure within the trench such that a second gate resistance of the conductive structure and remaining portion of the metal gate is lower than the first gate resistance.
    Type: Application
    Filed: November 12, 2009
    Publication date: May 12, 2011
    Applicant: TAIWAN SEMCONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Lee-Wee Tao, Han-Guan Chew, Harry Hak-Lay Chuang, Syun-Ming Jang