Abstract: The present invention relates to high speed datapaths, sometimes including mixed digital and analog voltage signals. In particular, it relates to error checking strategies for large data volumes, in digital and/or analog domains and to analog signal patterns that accelerate charge loading of micromirrors in an SLM. Particular aspects of the present invention are described in the claims, specification and drawings.

Abstract: The present invention relates to high speed datapaths, sometimes including mixed digital and analog voltage signals. In particular, it relates to error checking strategies for large data volumes, in digital and/or analog domains and to analog signal patterns that accelerate charge loading of micromirrors in an SLM. Particular aspects of the present invention are described in the claims, specification and drawings.

Abstract: The present invention relates to high speed datapaths, sometimes including mixed digital and analog voltage signals. In particular, it relates to error checking strategies for large data volumes, in digital and/or analog domains and to analog signal patterns that accelerate charge loading of micromirrors in an SLM. Particular aspects of the present invention are described in the claims, specification and drawings.

Abstract: The present invention relates to a system and a method for microlithographic writing and inspection on photosensitive substrates, and specially printing and inspection of patterns with extremely high precision, such as photomasks for semiconductor device patterns, display panels, integrated optical, devices and electronic interconnect structures. More specifically the invention relates to compensation of substrate offset by modifying the position data or the feeding of the same of the deflector, and the use of a direct digital synthesis (DDS) unit for generation of the sweep frequency drive signal.

Abstract: A system and method are provided for microlithographic writing on photosensitive substrates, and especially high precision printing of patterns, such as photomasks, for semiconductor device patterns, display panels, integrated optical devices and electronic interconnect structures. The method includes the steps of detecting significant temporary writing error conditions and interrupting the writing process as a response to a detection of such an error condition. Thereafter a support table is reversed to the position it had when the writing was interrupted, and the writing process is restarted at the same position where the writing was interrupted when the error condition ceases to exist.

Abstract: An anesthetic apparatus for administering a gaseous anesthetic comprises a breathing mask which is connected to the inspiration pipe and the expiration pipe of the apparatus and used for connecting the apparatus to the airways of a patient. To prevent harmful gaseous anesthetic from being released to the surroundings when the mask is temporarily lifted from the patient's face during anesthesia in order to check the condition of the patient, the apparatus is provided with a gas suction device which can be connected to the mask through a controllable valve. The gas suction device may be continuously operated or may be started automatically when the valve is opened. A signal emitter for generating control signals and applying these to the valve is arranged on, or in the vicinity of the mask in a manner such that it can either be activated manually by the anesthetist, or is activated automatically when the mask is lifted from the patient's face, at which time it generates a control signal for opening the valve.