Patents by Inventor Leif Uneus

Leif Uneus has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11802832
    Abstract: The present invention relates to a method (1) for determining a content of H2S in a process gas comprising H2S. The method (1) comprises extracting (2) a sample of the process gas, performing oxidation (4) of at least a major portion of H2S of the sample, whereby oxidation products comprising elemental sulfur are formed, analysing (6) the oxidized sample by optical absorption spectroscopy at wavelengths above 310 nm, and determining (8) the content of H2S in the process gas based on the analysing. The invention further relates to a system (100) for determining a content of H2S in a process gas comprising H2S, and use of system (100).
    Type: Grant
    Filed: April 17, 2018
    Date of Patent: October 31, 2023
    Assignee: Opsis AB
    Inventors: Svante Wallin, Leif Uneus
  • Publication number: 20200173913
    Abstract: The present invention relates to a method (1) for determining a content of H2S in a process gas comprising H2S. The method (1) comprises extracting (2) a sample of the process gas, performing oxidation (4) of at least a major portion of H2S of the sample, whereby oxidation products comprising elemental sulfur are formed, analysing (6) the oxidized sample by optical absorption spectroscopy at wavelengths above 310 nm, and determining (8) the content of H2S in the process gas based on the analysing. The invention further relates to a system (100) for determining a content of H2S in a process gas comprising H2S, and use of system (100).
    Type: Application
    Filed: April 17, 2018
    Publication date: June 4, 2020
    Inventors: Svante WALLIN, Leif UNEUS
  • Patent number: 8610066
    Abstract: A device for radiation absorption measurements may include a radiation source emitting electromagnetic radiation having a wavelength in the interval 0.2 ?m-20 ?m, a detector detecting the electromagnetic radiation, when in a measurement mode at least a portion of the radiation has passed through a medium and been reflected by a surface at a distance from the radiation source, before reaching the detector. The device may further include a fluid calibration cell, which is adapted to be arranged in the path of the electromagnetic radiation between the radiation source and the detector. A method for calibrating a device for radiation absorption measurements may involve emitting electromagnetic radiation having a wavelength in the interval 0.2 to 20 ?m, directing at least a portion of the electromagnetic radiation through a fluid calibration cell, and detecting the electromagnetic radiation.
    Type: Grant
    Filed: October 28, 2009
    Date of Patent: December 17, 2013
    Assignee: Opsis AB
    Inventors: Svante Wallin, Leif Uneus
  • Publication number: 20120200844
    Abstract: A device for radiation absorption measurements may include a radiation source emitting electromagnetic radiation having a wavelength in the interval 0.2 ?m-20 ?m, a detector detecting the electromagnetic radiation, when in a measurement mode at least a portion of the radiation has passed through a medium and been reflected by a surface at a distance from the radiation source, before reaching the detector. The device may further include a fluid calibration cell, which is adapted to be arranged in the path of the electromagnetic radiation between the radiation source and the detector. A method for calibrating a device for radiation absorption measurements may involve emitting electromagnetic radiation having a wavelength in the interval 0.2 to 20 ?m, directing at least a portion of the electromagnetic radiation through a fluid calibration cell, and detecting the electromagnetic radiation.
    Type: Application
    Filed: October 28, 2009
    Publication date: August 9, 2012
    Applicant: OPSIS AB
    Inventors: Svante Wallin, Leif Uneus
  • Patent number: 5255073
    Abstract: An apparatus for emitting and receiving light comprises an emitter, which consists of a light source (5) and a concave mirror (7), and a receiver which receives light from the emitter and which is connected to analyzing equipment (3). Furthermore, the receiver comprises a concave mirror (9) which is disposed behind the mirror (7) of the emitter and whose diameter is larger than that of the mirror (7) of the emitter and whose focus is located in front of the light source (5). In the focus of the mirror (9) is positioned one end of an optical fibre (19) for transmitting the received light to the analyzing equipment (3).
    Type: Grant
    Filed: November 19, 1991
    Date of Patent: October 19, 1993
    Assignee: OPSIS AB
    Inventors: Svante Wallin, Leif Uneus
  • Patent number: 4790652
    Abstract: A method for determining parameters, especially pressure, temperature, concentration, number of particles and particle size distribution, of gaseous substances present in combustion processes and other high temperature processes, comprises transmitting spectrally broad-band light through an object (2) of measurement, spectrally dividing the light transmitted through said object, and recording the spectral distribution of the light in the studied wavelength range a large number of times. Each recording occurs sequentially in that the spectrally divided light is swept relative to a one-channel detector and for such a short time that the total light intensity of the entire wavelength range is constant during each recording.
    Type: Grant
    Filed: February 4, 1987
    Date of Patent: December 13, 1988
    Assignee: Opsis AB
    Inventors: Leif Uneus, Svante Wallin