Abstract: The present invention provides systems and methods for determining the cleanliness of a sample, the method including impinging high pressure fluid pulses on a sample disposed in a chamber to liberate particles therefrom and quantifying a number of the liberated particles to determine the cleanliness of the sample.

Abstract: The present invention provides systems and methods for determining the cleanliness of a sample, the method including impinging high pressure fluid pulses on a sample disposed in a chamber to liberate particles therefrom and quantifying a number of the liberated particles to determine the cleanliness of the sample.

Abstract: Determining cleanliness of a sample by providing a continuous flow of clean air into a chamber through a HEPA filter, taking a reference reading of particle counts while the chamber is empty, introducing the sample into the chamber and taking a first reading of a particle count received from all sides of the sample in the chamber to determine loose particles in a particle size range of 0.1 microns up to 5 microns associated with the sample.

Abstract: A method and apparatus for determining cleanliness of a sample is provided. The method includes taking a first reading of particles count of a sample placed into a chamber. The method further includes directing a stream of air over the sample, and taking a second reading of particles count of the sample. The method further includes calculating a difference between the first reading and the second reading, and determining a cleanliness of the sample based upon the difference. The method further includes option of taking an additional reading while a stream of ionized air is directed towards the sample. The method further includes trapping the impurities particles released from the sample by applying a vacuum through the filter, and analyzing the trapped particles to determine nature and chemical composition of the impurities particles.

Abstract: Determining cleanliness of a sample by providing a continuous flow of clean air into a chamber through a HEPA filter, taking a reference reading of particle counts while the chamber is empty, introducing the sample into the chamber and taking a first reading of a particle count received from all sides of the sample in the chamber to determine loose particles in a particle size range of 0.1 microns up to 5 microns associated with the sample.

Abstract: A method and apparatus for determining cleanliness of a sample is provided. The method includes taking a first reading of particles count of a sample placed into a chamber. The method further includes directing a stream of air over the sample, and taking a second reading of particles count of the sample. The method further includes calculating a difference between the first reading and the second reading, and determining a cleanliness of the sample based upon the difference. The method further includes option of taking an additional reading while a stream of ionized air is directed towards the sample. The method further includes trapping the impurities particles released from the sample by applying a vacuum through the filter, and analyzing the trapped particles to determine nature and chemical composition of the impurities particles.

Abstract: A compact torch for use in semiconductor processing which may be used both to produce steam and to perform wet or dry dichlorethylene (DCE) oxidation at varying concentrations with no reconfiguration of the torch, providing full temperature of control of the oxidation product gases, with redundancy to provide automatic backup of heating and ignition elements, and with non-mechanical flow control of the oxidation product gases.