Abstract: A sub-micron dimensional standard is embodied in a grating of equal-sized lines and spaces formed in an electron-sensitive material by means of E-beam lithography. Several gratings are generated in the material at different respective doses of electrons. For each dose, a plurality of gratings are formed with different respective energy deposition contours over the interface of a line and a space. At one dose the energy deposition contour will be the same for all of the different energy deposition contour values. The grating formed with this dose is chosen as the one having a part which forms the standard. The width of a line, as well as the width of a space, in the selected grating is known in absolute terms to the same degree of accuracy as the grating's period. With such an artifact, the systematic error inherent to a measurement system can be determined. Once this error is known, it can be employed as a compensating factor to correct measurements made via the system.