Patents by Inventor Leon Bakker

Leon Bakker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 7026629
    Abstract: A lithographic apparatus includes a first space containing a plasma source and also containing a source gas which may have a high absorption of radiation at the wavelength of the projection beam of the apparatus, this gas being restricted from entering the remainder of the lithographic system by a second space containing a buffer gas having a low absorption at the wavelength of the projection beam of the apparatus. The pressure of the buffer gas is lower than or equal to that of the source gas.
    Type: Grant
    Filed: December 26, 2002
    Date of Patent: April 11, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Leon Bakker, Jeroen Jonkers, Hugo Matthieu Visser
  • Lithographic apparatus and device manufacturing method
    Publication number: 20030142280
    Abstract: A lithographic apparatus includes a first space containing a plasma source and also containing a source gas which may have a high absorption of radiation at the wavelength of the projection beam of the apparatus, this gas being restricted from entering the remainder of the lithographic system by a second space containing a buffer gas having a low absorption at the wavelength of the projection beam of the apparatus. The pressure of the buffer gas is lower than or equal to that of the source gas.
    Type: Application
    Filed: December 26, 2002
    Publication date: July 31, 2003
    Applicant: ASML NETHERLANDS, B.V.
    Inventors: Leon Bakker, Jeroen Jonkers, Hugo Matthieu Visser