Patents by Inventor Leon Joseph Maria Van Den Schoor

Leon Joseph Maria Van Den Schoor has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150116677
    Abstract: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
    Type: Application
    Filed: December 30, 2014
    Publication date: April 30, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Johannes Sophia Maria Mertens, Christiaan Alexander Hoogendam, Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Leon Joseph Maria Van Den Schoor, Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk
  • Lithographic apparatus and device manufacturing method involving a resistivity sensor
    Patent number: 8937704
    Abstract: In an immersion lithography apparatus, the immersion liquid is supplied and removed by a liquid supply system. The immersion lithography apparatus includes a resistivity sensor configured to monitor the electrical resistivity of the immersion liquid to monitor a potential contamination within the liquid supply system and may include a cleaner supply system configured to supply a cleaning fluid to the liquid supply system to clean at least the liquid supply system.
    Type: Grant
    Filed: November 3, 2011
    Date of Patent: January 20, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Johannes Sophia Maria Mertens, Christiaan Alexander Hoogendam, Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Leon Joseph Maria Van Den Schoor, Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk
  • Lithographic apparatus and device manufacturing method
    Patent number: 8142852
    Abstract: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
    Type: Grant
    Filed: July 14, 2010
    Date of Patent: March 27, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Johannes Sophia Maria Mertens, Christiaan Alexander Hoogendam, Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Leon Joseph Maria Van Den Schoor, Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120048193
    Abstract: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
    Type: Application
    Filed: November 3, 2011
    Publication date: March 1, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Johannes Sophia Maria MERTENS, Christiaan Alexander Hoogendam, Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Leon Joseph Maria Van Den Schoor, Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100270709
    Abstract: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
    Type: Application
    Filed: July 14, 2010
    Publication date: October 28, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Johannes Sophia Maria MERTENS, Christiaan Alexander Hoogendam, Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Leon Joseph Maria Van Den Schoor, Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk
  • Lithographic apparatus and device manufacturing method
    Patent number: 7779781
    Abstract: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
    Type: Grant
    Filed: July 28, 2004
    Date of Patent: August 24, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Johannes Sophia Maria Mertens, Christiaan Alexander Hoogendam, Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Leon Joseph Maria Van Den Schoor, Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk