Patents by Inventor Leon Leonardus Franciscus MERKX

Leon Leonardus Franciscus MERKX has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Projection system
    Patent number: 10248027
    Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: April 2, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Butler, Raoul Maarten Simon Knops, Bob Streefkerk, Christiaan Louis Valentin, Jan Bernard Plechelmus Van Schoot, Wilhelmus Franciscus Johannes Simons, Leon Leonardus Franciscus Merkx, Robertus Johannes Marinus De Jongh, Roel Johannes Elisabeth Merry, Michael Frederik Ypma
  • Lithographic apparatus and device manufacturing method
    Patent number: 9857698
    Abstract: A lithographic apparatus includes a reflector to redirect a radiation beam, e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system includes a non-compensating actuator device and a compensating actuator device to compensate for parasitic forces of the non-compensating actuator device. The positioning system and controller can provide a more accurate position of the reflector, reduce deformation of the reflector and reduce the magnitude of forces transmitting through the reflector.
    Type: Grant
    Filed: March 19, 2015
    Date of Patent: January 2, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Robertus Johannes Marinus De Jongh, Leon Leonardus Franciscus Merkx, Roel Johannes Elisabeth Merry
  • PROJECTION SYSTEM
    Publication number: 20170363965
    Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element.
    Type: Application
    Filed: November 16, 2015
    Publication date: December 21, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Hans BUTLER, Raoul Maarten Simon KNOPS, Bob STREEFKERK, Christiaan Louis VALENTIN, Jan Bernard Plechelmus VAN SCHOOT, Wilhelmus Franciscus Johanne SIMONS, Leon Leonardus Franciscus MERKX, Robertus Johannes Marinus DE JONGH, Roel Johannes Elisabeth MERRY, Michael Frederik YPMA
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170038693
    Abstract: A lithographic apparatus comprising a reflector (15) to redirect a radiation beam e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system comprises a non-compensating actuator device (300) and a compensating actuator device (200) to compensate for parasitic forces of the non-compensating actuator device. The positioning system and controller can provide a more accurate position of the reflector, reduce deformation of the reflector and reduce the magnitude of forces transmitting through the reflector.
    Type: Application
    Filed: March 19, 2015
    Publication date: February 9, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Robertus Johannes Marinus DE JONGH, Leon Leonardus Franciscus MERKX, Roel Johannes Elisabeth MERRY