Patents by Inventor Leon Lin

Leon Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6908499
    Abstract: A cold trap having improved trapping efficiency for particles, particularly ammonium chloride fine powder particles. The cold trap has a dual-stage design, including an upstream stage fitted with at least one trap plate and a downstream stage fitted with a typically cup- or cone-shaped trap core in which is provided a conically-spiraled water cooling coil. A decreasing temperature gradient is provided along the length of the cold trap, such that exhaust gases flowing through the cold trap are gradually cooled and ammonium chloride or other particles which form from the gas are trapped by the trap plate or plates and collect in the trap core. The exhaust gases exiting the downstream end of the trap core are substantially or completely devoid of particles.
    Type: Grant
    Filed: October 11, 2002
    Date of Patent: June 21, 2005
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Leon Lin, Tom Fan, Steven Chen, Vito Lee, Yu-Hsiang Wu
  • Publication number: 20040069224
    Abstract: A cold trap having improved trapping efficiency for particles, particularly ammonium chloride fine powder particles. The cold trap has a dual-stage design, including an upstream stage fitted with at least one trap plate and a downstream stage fitted with a typically cup- or cone-shaped trap core in which is provided a conically-spiraled water cooling coil. A decreasing temperature gradient is provided along the length of the cold trap, such that exhaust gases flowing through the cold trap are gradually cooled and ammonium chloride or other particles which form from the gas are trapped by the trap plate or plates and collect in the trap core. The exhaust gases exiting the downstream end of the trap core are substantially or completely devoid of particles.
    Type: Application
    Filed: October 11, 2002
    Publication date: April 15, 2004
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Leon Lin, Tom Fan, Steven Chen, Vito Lee, Yu-Hsiang Wu