Patents by Inventor Leon Martin

Leon Martin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240157957
    Abstract: A method for controlling motion of a heavy-duty vehicle includes estimating a current vehicle state comprising at least velocity and acceleration, wherein the estimated current state is associated with a current state uncertainty, estimating a future vehicle state based on the current vehicle state, and on a predictive motion model of the vehicle, wherein the future vehicle state is associated with a future vehicle state uncertainty, defining a vehicle control envelope representing an operational limit of the vehicle, wherein the vehicle control envelope defines a range of vehicle states, comparing the estimated future vehicle state, and the associated future vehicle state uncertainty, to the vehicle control envelope, and, if a probability that the future vehicle state breaches the control envelope is above a configured threshold value, limiting a motion capability of the vehicle.
    Type: Application
    Filed: March 4, 2021
    Publication date: May 16, 2024
    Applicant: VOLVO TRUCK CORPORATION
    Inventors: Peter HANSSON, Leo LAINE, Ulf STENBRATT, José VILCA, Peter NILSSON, Adithya ARIKERE, Leon HENDERSON, Hans-Martin HEYN
  • Publication number: 20240043447
    Abstract: Hydromorphone hydrochloride (I·HCl) is converted into hydromorphone base (I) via hydromorphone monohydrate (I·H2O).
    Type: Application
    Filed: November 12, 2021
    Publication date: February 8, 2024
    Applicant: Ferrer Internacional, S.A.
    Inventors: Francisco De Asís MARQUILLAS OLONDRIZ, Jorge BESSA BELLMUNT, Antonio Abelino DE LEÓN MARTÍN
  • Publication number: 20230384694
    Abstract: Systems, apparatuses, and methods are provided for manufacturing a substrate table. An example method can include forming a vacuum sheet including a plurality of vacuum connections and a plurality of recesses configured to receive a plurality of burls disposed on a core body for supporting an object such as a wafer. Optionally, at least one burl can be surrounded, partially or wholly, by a trench. The example method can further include using the vacuum sheet to mount the core body to an electrostatic sheet including a plurality of apertures configured to receive the plurality of burls. Optionally, the example method can include using the vacuum sheet to mount the core body to the electrostatic sheet such that the plurality of recesses of the vacuum sheet line up with the plurality of burls of the core body and the plurality of apertures of the electrostatic sheet.
    Type: Application
    Filed: December 2, 2021
    Publication date: November 30, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Abdullah ALIKHAN, Tammo UITTERDIJK, Johannes Bernardus Charles ENGELEN, Daniel KAMIENIECKI, Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Thomas POIESZ, Leon Martin LEVASIER, Jim Vincent OVERKAMP, Johannes Adrianus Cornelis Maria PIJNENBURG, Koos VAN BERKEL, Gregory James DIGUIDO, Anthony C. SOCCI, JR., Iliya SIGAL, Bram Antonius Gerardus LOMANS, Michel Ben Isel HABETS
  • Publication number: 20230068800
    Abstract: Snowplow blades and cutting edge systems for snowplow blades are described herein. The cutting edge systems include a backing plate coupled to a bottom portion of a moldboard of the snowplow blade and a plurality of cutting edge segments each configured to be slidably mounted to the front surface of the backing plate. The backing plate has, for each of the blade segments, a central opening, a first slot positioned on a first side of the central opening and a second slot positioned on a second side of the central opening. Each cutting edge segment includes a blade segment, a compression member and a retainer plate.
    Type: Application
    Filed: August 25, 2022
    Publication date: March 2, 2023
    Inventors: Ryan Frey, Richard Grove, Marvin Martin, Leon Martin
  • Patent number: 11422476
    Abstract: A method for monitoring a lithographic process, and associated lithographic apparatus. The method includes obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.
    Type: Grant
    Filed: October 2, 2020
    Date of Patent: August 23, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Emil Peter Schmitt-Weaver, Kaustuve Bhattacharyya, Wim Tjibbo Tel, Frank Staals, Leon Martin Levasier
  • Publication number: 20220064143
    Abstract: It is provided a process for the preparation of aripiprazole lauroxil that comprises reacting 1-(hydroxymethyl) aripiprazole with lauric acid in the presence of a suitable solvent and a carboxyl activating agent in the presence of a suitable solvent and, optionally, in the presence of an appropriate base. 1-(Hydroxymethyl) aripiprazole can be prepared by reacting aripiprazol or an hydrate thereof with paraformaldehyde in the presence of a suitable organic solvent and a suitable base, wherein the reaction is carried out without the addition of water as a solvent to the reaction mixture. Additionally, (7-(4-(4-(2,3-dichlorophenyl)piperazin-1-yl)butoxy)-3,4-dihydro-2-oxoquinolin-1(2H)-yl)methyl formate is provided as a reference standard.
    Type: Application
    Filed: October 14, 2021
    Publication date: March 3, 2022
    Applicant: INTERQUIM, S.A.
    Inventors: Marta POMARES MARCO, Francisco De Asís MARQUILLAS OLONDRIZ, Jorge BESSA BELLMUNT, Antonio Abelino DE LEÓN MARTÍN
  • Patent number: 11206947
    Abstract: A grill assembly includes first and second grills between which items to be cooked can be clamped. The grill assembly can be placed above the firebox of a kamado-style ceramic charcoal barbecue cooker. While in place within the cooker, the grill assembly can be rotated at least 180 degrees to allow both side of the items to be grilled direct access to the heat from the fire box of the cooker. The grill assembly can be rotated 360 degrees in either direction.
    Type: Grant
    Filed: June 7, 2019
    Date of Patent: December 28, 2021
    Inventors: Andrew P. Barnhart, Leon Martin
  • Patent number: 10935895
    Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
    Type: Grant
    Filed: August 13, 2019
    Date of Patent: March 2, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik Koevoets, Erik Johan Arlemark, Sander Catharina Reinier Derks, Sjoerd Nicolaas Lambertus Donders, Wilfred Edward Endendijk, Franciscus Johannes Joseph Janssen, Raymond Wilhelmus Louis Lafarre, Leon Martin Levasier, Jim Vincent Overkamp, Nicolaas Ten Kate, Jacobus Cornelis Gerardus Van Der Sanden
  • Publication number: 20210018847
    Abstract: A method for monitoring a lithographic process, and associated lithographic apparatus. The method includes obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.
    Type: Application
    Filed: October 2, 2020
    Publication date: January 21, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Emil Peter SCHMITT-WEAVER, Kaustuve BHATTACHARYYA, Wim Tjibbo TEL, Frank STAALS, Leon Martin LEVASIER
  • Patent number: 10866527
    Abstract: A method for monitoring a lithographic process, and associated lithographic apparatus. The method includes obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.
    Type: Grant
    Filed: January 3, 2018
    Date of Patent: December 15, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Emil Peter Schmitt-Weaver, Kaustuve Bhattacharyya, Wim Tjibbo Tel, Frank Staals, Leon Martin Levasier
  • Patent number: 10729728
    Abstract: The present invention refers to a process for preparing an animal brain extract. It also refers to the brain extract obtainable according to said process and to the use thereof as a medicine, in particular for the prevention and/or treatment of neurodegenerative diseases and disorders of the central nervous system. It also refers to compositions comprising this extract and to its use for preparing these compositions.
    Type: Grant
    Filed: April 25, 2016
    Date of Patent: August 4, 2020
    Assignee: BIOIBERICA, S.A.
    Inventors: Josep Escaich Ferrer, Daniel Martinez Puig, Pere Dalmau Castañares, Ramon Ruhi Roura, Joaquima Guix Salichs, Josep Ribas Maynou, Artur Alfocea Egüén, Antonio Garcia Pedrosa, Purificación Morales García, Pere Leon Martín, Marta Badias Eroles
  • Publication number: 20200140410
    Abstract: It is provided a process for the preparation of aripiprazole lauroxil that comprises reacting 1-(hydroxymethyl) aripiprazole with lauric acid in the presence of a suitable solvent and a carboxyl activating agent in the presence of a suitable solvent and, optionally, in the presence of an appropriate base. -(Hydroxymethyl) aripiprazole can be prepared by reacting aripiprazole or an hydrate thereof with paraformaldehyde in the presence of a suitable organic 10 solvent and a suitable base, wherein the reaction is carried out without the addition of water as a solvent to the reaction mixture. Additionally, (7-(4-(4-(2,3-dichlorophenyl)piperazin-1-yl)butoxy)-3,4-dihydro-2-oxoquinolin-1(2H)-yl)methyl formate is provided as a reference standard.
    Type: Application
    Filed: July 27, 2018
    Publication date: May 7, 2020
    Applicant: INTERQUIM, S.A.
    Inventors: Marta POMARES MARCO, Francisco De Asís MARQUILLAS OLONDRIZ, Jorge BESSA BELLMUNT, Antonio Abelino DE LEÓN MARTÍN
  • Publication number: 20200004164
    Abstract: A method for monitoring a lithographic process, and associated lithographic apparatus. The method includes obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.
    Type: Application
    Filed: January 3, 2018
    Publication date: January 2, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Emil Peter SCHMITT-WEAVER, Kaustuve BHATTACHARYYA, Wim Tjibbo TEL, Frank STAALS, Leon Martin LEVASIER
  • Publication number: 20190369508
    Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
    Type: Application
    Filed: August 13, 2019
    Publication date: December 5, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik KOEVOETS, Erik Johan Arlemark, Sander Catharina Reinier Derks, Sjoerd Nicolaas Lambertus Donders, Wiilfred Edward Endendijk, Franciscus Johannes Joseph Janssen, Raymond Wilhelmus Louis Lafarre, Leon Martin Levasier, Jim Vincent Overkamp, Nicolaas Ten Kate, Jacobus Corlelis Gerardus Van Der Sanden
  • Publication number: 20180173116
    Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
    Type: Application
    Filed: April 4, 2016
    Publication date: June 21, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik KOEVOETS, Erik Johan ARLEMARK, Sander Catharina Reinier DERKS, Sjoerd Nicolaas Lambertus DONDERS, Wilfred Edward ENDENDIJK, Franciscus Johannes Joseph JANSSEN, Raymond Wilhelmus Louis LAFARRE, Leon Martin LEVASIER, Jim Vincent OVERKAMP, Nicolaas TEN KATE, Jacobus Cornelis Gerardus VAN DER SANDEN
  • Patent number: 9983489
    Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.
    Type: Grant
    Filed: April 24, 2015
    Date of Patent: May 29, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Christianus Wilhelmus Johannes Berendsen, Marcel Beckers, Henricus Jozef Castelijns, Hubertus Antonius Geraets, Adrianus Hendrik Koevoets, Leon Martin Levasier, Peter Schaap, Bob Streefkerk, Siegfried Alexander Tromp
  • Publication number: 20180140638
    Abstract: The present invention refers to a process for preparing an animal brain extract. It also refers to the brain extract obtainable according to said process and to the use thereof as a medicine, in particular for the prevention and/or treatment of neurodegenerative diseases and disorders of the central nervous system. It also refers to compositions comprising this extract and to its use for preparing these compositions.
    Type: Application
    Filed: April 25, 2016
    Publication date: May 24, 2018
    Applicant: BIOIBERICA, S.A.
    Inventors: Josep ESCAICH FERRER, Daniel MARTINEZ PUIG, Pere DALMAU CASTAÑARES, Ramon RUHI ROURA, Joaquima GUIX SALICHS, Josep RIBAS MAYNOU, Artur ALFOCEA EGÜÉN, Antonio GARCIA PEDROSA, Purificación MORALES GARCÍA, Pere LEON MARTÍN, Marta BADIAS EROLES
  • Publication number: 20170115578
    Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.
    Type: Application
    Filed: April 24, 2015
    Publication date: April 27, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Christianus Wilhelmus Johannes BERENDSEN, Marcel BECKERS, Henricus Jozef CASTELIJNS, Hubertus Antonius GERAETS, Adrianus Hendrik KOEVOETS, Leon Martin LEVASIER, Peter SCHAAP, Bob STREEFKERK, Siegfried Alexander TROMP
  • Patent number: 9579552
    Abstract: A system for locating a lost disc golf disc is disclosed. A disc having a Bluetooth transmitter is utilized to send a signal to a smartphone which measures the distance to the disc from the smartphone. Outfitted with a 3-axis accelerometer, the flight path of the disc golf disc can also be tracked.
    Type: Grant
    Filed: May 1, 2015
    Date of Patent: February 28, 2017
    Inventors: Christopher Leon Martin, Yong Juay Lee
  • Publication number: 20160035605
    Abstract: Disclosed are support structure apparatuses for holding a substrate or patterning device, for example in a lithographic apparatus, and apparatuses comprising such support structure apparatuses. The support structure apparatus comprises a temperature regulation system for controlling the temperature of the support structure and one or more temperature sensors located on the periphery of said support structure being operable to measure the temperature of the support structure at said periphery. The temperature regulation system may be operable to calculate an average temperature of the substrate holder from temperature values measured by said temperature sensors and position dependent correlation factors, which depend upon the position of an applied heat load on a substrate or patterning device mounted upon the support structure.
    Type: Application
    Filed: March 17, 2014
    Publication date: February 4, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Roger Wilhelmus Antonius Henricus SCHMITZ, Sander Catharina Reinier DERKS, Leon Martin LEVASIER