Abstract: A mousse composition having high gloss and good spreadability comprising: (i) carrier; (ii) one or more surface tension reducing agents that reduce the surface tension of the carrier; (iii) from greater than 5% to about 20% by weight, based on the weight of components (i)-(v), of foaming agent, wherein said foaming agent comprises at least about 30% by weight of trans-1234ze; and (iv) optionally one or more active components in addition to said surface tension reducing agents; and (v) optionally one or more adjuvants.

Abstract: Monomers and polymers useful for forming photoresists. More particularly, photoresists, as well as monomers and polymers for photoresists useful in micro-lithography, specifically monomers bearing acid-labile groups of reduced optical density. The resulting photoresists exhibit improved transparency to 157 nm light. The photoresist compositions are composed of a mixture of at least one water insoluble, acid decomposable polymer which is prepared from at least one monomer having a monomeric unit structure which comprises: where Hal=F, Cl or Br and X=H or F; and which is substantially transparent to ultraviolet radiation at a wavelength of about 157 nm, and at least one photoacid generator capable of generating an acid upon exposure to sufficient activating energy at a wavelength of about 157 nm.

Abstract: Monomers and polymers useful for forming photoresists are provided. More particularly, photoresists, as well as monomers and polymers for photoresists useful in micro-lithography, specifically monomers bearing acid-labile groups of reduced optical density. The resulting photoresists exhibit improved transparency to 157 nm light. The photoresist compositions are composed of a mixture of at least one water insoluble, acid decomposable polymer which is prepared from at least one monomeric unit which comprises an acid labile group of the formula —OC(CH3)2CF3 and which is substantially transparent to ultraviolet radiation at a wavelength of about 157 nm and at least one photoacid generator capable of generating an acid upon exposure to sufficient activating energy at a wavelength of about 157 nm.

Abstract: Present invention relates to a process for the manufacture of fluorinated alcohols as well as borates which are employed in the manufacture of the fluorinated alcohols. Fluorinated alcohols of the formulae HOCHRCF(CF3)CHFCF(CF3)2 and HOCHRCF(CF(CF3)2)CHFCF3, HOCHRCF(CF2CF3)CH(CF3)2 and HOCHRC(CF3)2CHFCF2CF3 are made by heating a mixture of a borate of the formula (RCH2O)3B, wherein R?H or a C1 to C7 alkyl group, with perfluoro-4-methyl-2-pentene or perfluoro-2-methyl-2-pentene and a free-radical initiator to form a mixture of borates, optionally separating the mixture of borates from any reactants, solvents, and by-products; hydrolyzing the mixture of borates to form a hydrolysis product mixture; and separating the alcohols from the hydrolysis product mixture.