Patents by Inventor Leonarda Hendrika Van Den Heuvel

Leonarda Hendrika Van Den Heuvel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and method of cooling a component in a lithographic apparatus
    Patent number: 9811007
    Abstract: A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway including a flow restriction upstream of the component and configured to direct a flow of gas exiting the flow restriction to cool a surface of the component.
    Type: Grant
    Filed: October 4, 2012
    Date of Patent: November 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Frank Johannes Jacobus Van Boxtel, Antonius Johannus Van Der Net, Leonarda Hendrika Van Den Heuvel
  • Pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method
    Patent number: 9575406
    Abstract: An extraction system, including a pump to pump gas along a conduit to a check valve configured to open at an upstream pressure over a certain magnitude, a pressure sensor to generate a signal indicative of a pressure of gas between the pump and the check valve, and a controller configured to generate a stop signal if a signal from the pressure sensor indicates that the pressure of gas between the pump and the check valve is below a certain magnitude.
    Type: Grant
    Filed: December 13, 2012
    Date of Patent: February 21, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Marc Léon Van Der Gaag, Leonarda Hendrika Van Den Heuvel, Arjan Hubrecht Josef Anna Martens, Frank Johannes Jacobus Van Boxtel
  • PUMP SYSTEM, A CARBON DIOXIDE SUPPLY SYSTEM, AN EXTRACTION SYSTEM, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20130155380
    Abstract: An extraction system, including a pump to pump gas along a conduit to a check valve configured to open at an upstream pressure over a certain magnitude, a pressure sensor to generate a signal indicative of a pressure of gas between the pump and the check valve, and a controller configured to generate a stop signal if a signal from the pressure sensor indicates that the pressure of gas between the pump and the check valve is below a certain magnitude.
    Type: Application
    Filed: December 13, 2012
    Publication date: June 20, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marc Léon Van Der Gaag, Leonarda Hendrika Van Den Heuvel, Arjan Hubrecht Josef Anna Martens, Frank Johannes Jacobus Van Boxtel
  • LITHOGRAPHIC APPARATUS AND METHOD OF COOLING A COMPONENT IN A LITHOGRAPHIC APPARATUS
    Publication number: 20130088694
    Abstract: A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway including a flow restriction upstream of the component and configured to direct a flow of gas exiting the flow restriction to cool a surface of the component.
    Type: Application
    Filed: October 4, 2012
    Publication date: April 11, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Frank Johannes Jacobus VAN BOXTEL, Antonius Johannus VAN DER NET, Leonarda Hendrika VAN DEN HEUVEL
  • PROJECTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120236275
    Abstract: Various configurations of a projection system, of a lithographic apparatus, and of a device manufacturing method are disclosed. According to a disclosed configuration, the projection system is configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes an optical element having a first face and a second face. The first face is configured to be exposed to an external gaseous environment connected to the outside of the lithographic apparatus. The second face is configured to be exposed to an internal gaseous environment, the internal gaseous environment being substantially isolated from the external gaseous environment. The projection system further includes a pressure compensation system configured to adjust the pressure in the internal gaseous environment in response to a change in pressure in the external gaseous environment or a pressure differential between the internal gaseous environment or the external gaseous environment.
    Type: Application
    Filed: March 13, 2012
    Publication date: September 20, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Frank Johannes Jacobus VAN BOXTEL, Roelof Frederik De Graaf, Antonius Johannus Van Der Net, Johannes Antonius Maria Martina Van Uijtregt, Leonarda Hendrika Van Den Heuvel