Patents by Inventor Leonardus Adrianus Gerardus GRIMMINCK
Leonardus Adrianus Gerardus GRIMMINCK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10580545Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.Type: GrantFiled: September 24, 2014Date of Patent: March 3, 2020Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Petrus Rutgerus Bartraij, Ramon Pascal Van Gorkom, Lucas Johannes Peter Ament, Pieter Willem Herman De Jager, Gosse Charles De Vries, Rilpho Ludovicus Donker, Wouter Joep Engelen, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Erik Roelof Loopstra, Han-Kwang Nienhuys, Andrey Alexandrovich Nikipelov, Michael Jozef Mathijs Renkens, Franciscus Johannes Joseph Janssen, Borgert Kruizinga
-
Patent number: 10103508Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.Type: GrantFiled: May 19, 2017Date of Patent: October 16, 2018Assignee: ASML Netherlands B.V.Inventors: Andrey Alexandrovich Nikipelov, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Gosse Charles De Vries, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Johannes Antonius Gerardus Akkermans, Erik Loopstra, Wouter Joep Engelen, Petrus Rutgerus Bartraij, Teis Johan Coenen, Wilhelmus Patrick Elisabeth Maria Op 'T Root
-
Patent number: 9952513Abstract: An undulator for a free electron laser includes a pipe for an electron beam and one or more periodic magnetic structures extending axially along the pipe. Each periodic magnetic structure includes a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe.Type: GrantFiled: March 30, 2015Date of Patent: April 24, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Andrey Alexandrovich Nikipelov, Johannes Antonius Gerardus Akkermans, Leonardus Adrianus Gerardus Grimminck, Erik Roelof Loopstra, Michael Jozef Mathijs Renkens, Adrian Toma, Han-Kwang Nienhuys
-
Publication number: 20180081278Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.Type: ApplicationFiled: October 20, 2017Publication date: March 22, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Andrey Alexandrovich NIKIPELOV, Olav Waldemar Vladimir FRIJNS, Gosse Charles DE VRIES, Erik Roelof LOOPSTRA, Vadim Yevgenyevich BANINE, Pieter Willem Herman DE JAGER, Rilpho Ludovicus DONKER, Han-Kwang NIENHUYS, Borgert KRUIZINGA, Wouter Joep ENGELEN, Otger Jan LUITEN, Johannes Antonius Gerardus AKKERMANS, Leonardus Adrianus Gerardus GRIMMINCK, Vladimir LITVINENKO
-
Patent number: 9823572Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.Type: GrantFiled: June 17, 2014Date of Patent: November 21, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Andrey Alexandrovich Nikipelov, Olav Waldemar Vladimir Frijns, Gosse Charles De Vries, Erik Roelof Loopstra, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Rilpho Ludovicus Donker, Han-Kwang Nienhuys, Borgert Kruizinga, Wouter Joep Engelen, Otger Jan Luiten, Johannes Antonius Gerardus Akkermans, Leonardus Adrianus Gerardus Grimminck, Vladimir Litvinenko
-
Publication number: 20170264071Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.Type: ApplicationFiled: May 19, 2017Publication date: September 14, 2017Applicant: ASML Netherlands B.V.Inventors: Andrey Alexandrovich NIKIPELOV, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Gosse Charles De Vries, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Johannes Antonius Gerardus Akkermans, Erik Loopstra, Wouter Joep Engelen, Petrus Rutgerus Bartraij, Teis Johan Coenen, Wilhelmus Patrick Elisabeth Maria Op 'T Root
-
Patent number: 9728931Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.Type: GrantFiled: November 27, 2014Date of Patent: August 8, 2017Assignee: ASML Netherlands B.V.Inventors: Andrey Alexandrovich Nikipelov, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Gosse Charles De Vries, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Johannes Antonius Gerardus Akkermans, Erik Loopstra, Wouter Joep Engelen, Petrus Rutgerus Bartraij, Teis Johan Coenen, Wilhelmus Patrick Elisabeth Maria Op'T Root
-
Publication number: 20170184975Abstract: An undulator for a free electron laser includes a pipe for an electron beam and one or more periodic magnetic structures extending axially along the pipe. Each periodic magnetic structure includes a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe.Type: ApplicationFiled: March 30, 2015Publication date: June 29, 2017Applicant: ASML Netherlands B.V.Inventors: Andrey Alexandrovich NIKIPELOV, Johannes Antonius Gerardus AKKERMANS, Leonardus Adrianus Gerardus GRIMMINCK, Erik Roelof LOOPSTRA, Michael Jozef Mathijs RENKENS, Adrian TOMA, Han-Kwang NIENHUYS
-
Publication number: 20160301180Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.Type: ApplicationFiled: November 27, 2014Publication date: October 13, 2016Applicant: ASML Netherlands B.V.Inventors: Andrey Alexandrovich NIKIPELOV, Vadim Yevgenyevich BANINE, Pieter Willem Herman DE JAGER, Gosse Charles DE VRIES, Olav Waldemar Vladimir FRIJNS, Leonardus Adrianus Gerardus GRIMMINCK, Andelko KATALENIC, Johannes Antonius Gerardus AKKERMANS, Erik LOOPSTRA, Wouter Joep ENGELEN, Petrus Rutgerus BARTRAIJ, Teis Johan COENEN, Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
-
Publication number: 20160225477Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.Type: ApplicationFiled: September 24, 2014Publication date: August 4, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Yevgenyevich BANINE, Peturs Rutgerus BARTRAIJ, Ramon Pascal VAN GORKOM, Lucas Johannes Peter AMENT, Pieter Willem Herman DE JAGER, Gosse Charles DE VRIES, Rilpho Ludovicus DONKER, Wouter Joep ENGELEN, Olav Waldemar Vladimir FRIJNS, Leonardus Adrianus Gerardus GRIMMINCK, Andelko KATALENIC, Erik Roelof LOOPSTRA, Han-Kwang NIENHUYS, Andrey Alexandrovich NIKIPELOV, Michael Jozef Mathijs RENKENS, Franciscus Johannes Joseph JANSSEN, Borgert KRUIZINGA
-
Publication number: 20160147161Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.Type: ApplicationFiled: June 17, 2014Publication date: May 26, 2016Inventors: Andrey Alexandrovich NIKIPELOV, Olav Waldemar Vladimir FRIJNS, Gosse Charles DE VRIES, Erik Roelof LOOPSTRA, Vadim Yevgenyevich BANINE, Pieter Willem Herman DE JAGER, Rilpho Ludovicus DONKER, Han-Kwang NIENHUYS, Borgert KRUIZINGA, Wouter Joep ENGELEN, Otger Jan LUITEN, Johannes Antonius Gerardus AKKERMANS, Leonardus Adrianus Gerardus GRIMMINCK, Vladimir LITVINENKO