Patents by Inventor Leonardus Kouwenhoven

Leonardus Kouwenhoven has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fabrication methods
    Patent number: 11296145
    Abstract: Various fabrication method are disclosed. In one such method, at least one structure is formed on a substrate which protrudes outwardly from a plane of the substrate. A beam is used to form a layer of material, at least part of which is in direct contact with a semiconductor structure on the substrate, the semiconductor structure comprising at least one nanowire. The beam has a non-zero angle of incidence relative to the normal of the plane of the substrate such that the beam is incident on one side of the protruding structure, thereby preventing a portion of the nanowire in a shadow region adjacent the other side of the protruding structure in the plane of the substrate from being covered with the material.
    Type: Grant
    Filed: October 26, 2018
    Date of Patent: April 5, 2022
    Assignee: Microsoft Technology Licensing, LLC
    Inventors: Kevin Van Hoogdalem, Leonardus Kouwenhoven, Pavel Aseev, Peter Krogstrup Jeppesen
  • FABRICATION METHODS
    Publication number: 20220102425
    Abstract: Various fabrication methods are disclosed. In one such method, at least one structure is formed on a substrate which protrudes outwardly from a plane of the substrate. A beam is used to form a layer of material, at least part of which is in direct contact with a semiconductor structure on the substrate, the semiconductor structure comprising at least one nanowire. The beam has a non-zero angle of incidence relative to the normal of the plane of the substrate such that the beam is incident on one side of the protruding structure, thereby preventing a portion of the nanowire in a shadow region adjacent the other side of the protruding structure in the plane of the substrate from being covered with the material.
    Type: Application
    Filed: July 21, 2021
    Publication date: March 31, 2022
    Applicant: Microsoft Technology Licensing, LLC
    Inventors: Kevin Van Hoogdalem, Leonardus Kouwenhoven, Pavel Aseev, Peter Krogstrup Jeppesen
  • FABRICATION METHODS
    Publication number: 20200027919
    Abstract: Various fabrication method are disclosed. In one such method, at least one structure is formed on a substrate which protrudes outwardly from a plane of the substrate. A beam is used to form a layer of material, at least part of which is in direct contact with a semiconductor structure on the substrate, the semiconductor structure comprising at least one nanowire. The beam has a non-zero angle of incidence relative to the normal of the plane of the substrate such that the beam is incident on one side of the protruding structure, thereby preventing a portion of the nanowire in a shadow region adjacent the other side of the protruding structure in the plane of the substrate from being covered with the material.
    Type: Application
    Filed: October 26, 2018
    Publication date: January 23, 2020
    Applicant: Microsoft Technology Licensing, LLC
    Inventors: Kevin Van Hoogdalem, Leonardus Kouwenhoven, Pavel Aseev, Peter Krogstrup Jeppesen