Patents by Inventor Leonid M. Tertitski
Leonid M. Tertitski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10948353Abstract: Examples described herein generally relate to apparatus and methods for rapid thermal processing (RTP) of a substrate. In one or more embodiments, a process chamber includes chamber body, a window disposed on a first portion of the chamber body, a chamber bottom, and a shield disposed on a second portion of the chamber body. The shield has a flat surface facing the window to reduce reflected radiant energy to a back side of a substrate disposed in the process chamber during operation. The process chamber further includes an edge support for supporting the substrate and a cooling member disposed on the chamber bottom. The cooling member is disposed in proximity of the edge support to cool the edge support during low temperature operation in order to improve the temperature uniformity of the substrate.Type: GrantFiled: January 14, 2020Date of Patent: March 16, 2021Assignee: Applied Materials, Inc.Inventors: Lara Hawrylchak, Samuel C. Howells, Wolfgang R. Aderhold, Leonid M. Tertitski, Michael Liu, Dongming Iu, Norman L. Tam, Ji-Dih Hu
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Publication number: 20200381278Abstract: A method and apparatus for measuring a temperature of a substrate located in a semiconductor processing environment is disclosed. The substrate has a top surface and an edge surface, and is positioned in a prescribed location within the semiconductor processing environment. An infrared camera oriented to view one side of the edge surface of the substrate is triggered to obtain an infrared image of the one side of the edge surface of the substrate. The infrared image is processed to obtain a temperature profile of the substrate.Type: ApplicationFiled: May 28, 2020Publication date: December 3, 2020Inventors: Kim Ramkumar VELLORE, Leonid M. TERTITSKI, Matthew D. SCOTNEY-CASTLE
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Publication number: 20200149968Abstract: Examples described herein generally relate to apparatus and methods for rapid thermal processing (RTP) of a substrate. In one or more embodiments, a process chamber includes chamber body, a window disposed on a first portion of the chamber body, a chamber bottom, and a shield disposed on a second portion of the chamber body. The shield has a flat surface facing the window to reduce reflected radiant energy to a back side of a substrate disposed in the process chamber during operation. The process chamber further includes an edge support for supporting the substrate and a cooling member disposed on the chamber bottom. The cooling member is disposed in proximity of the edge support to cool the edge support during low temperature operation in order to improve the temperature uniformity of the substrate.Type: ApplicationFiled: January 14, 2020Publication date: May 14, 2020Inventors: Lara HAWRYLCHAK, Samuel C. HOWELLS, Wolfgang R. ADERHOLD, Leonid M. TERTITSKI, Michael LIU, Dongming IU, Norman L. TAM, Ji-Dih HU
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Patent number: 10571337Abstract: Examples described herein generally relate to apparatus and methods for rapid thermal processing (RTP) of a substrate. In one example, a process chamber includes chamber body, a window disposed on a first portion of the chamber body, a chamber bottom, and a shield disposed on a second portion of the chamber body. The shield has a flat surface facing the window to reduce reflected radiant energy to a back side of a substrate disposed in the process chamber during operation. The process chamber further includes an edge support for supporting the substrate and a cooling member disposed on the chamber bottom. The cooling member is disposed in proximity of the edge support to cool the edge support during low temperature operation in order to improve the temperature uniformity of the substrate.Type: GrantFiled: July 28, 2017Date of Patent: February 25, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Lara Hawrylchak, Samuel C. Howells, Wolfgang R. Aderhold, Leonid M. Tertitski, Michael Liu, Dongming Iu, Norman L. Tam, Ji-Dih Hu
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Publication number: 20180340832Abstract: Examples described herein generally relate to apparatus and methods for rapid thermal processing (RTP) of a substrate. In one example, a process chamber includes chamber body, a window disposed on a first portion of the chamber body, a chamber bottom, and a shield disposed on a second portion of the chamber body. The shield has a flat surface facing the window to reduce reflected radiant energy to a back side of a substrate disposed in the process chamber during operation. The process chamber further includes an edge support for supporting the substrate and a cooling member disposed on the chamber bottom. The cooling member is disposed in proximity of the edge support to cool the edge support during low temperature operation in order to improve the temperature uniformity of the substrate.Type: ApplicationFiled: July 28, 2017Publication date: November 29, 2018Inventors: Lara HAWRYLCHAK, Samuel C. HOWELLS, Wolfgang R. ADERHOLD, Leonid M. TERTITSKI, Michael LIU, Dongming IU, Norman L. TAM, Ji-Dih HU
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Patent number: 10109514Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.Type: GrantFiled: August 14, 2017Date of Patent: October 23, 2018Assignee: APPLIED MATERIALS, INC.Inventors: Kim Vellore, Dinesh Kanawade, Stephen Moffatt, Aaron Miller, Leonid M. Tertitski, Norman L. Tam, Michael Liu, Colin Fox
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Patent number: 9959610Abstract: A method and apparatus for detecting substrate misalignment (i.e., position displacement error) and/or substrate support misalignment. According to certain aspects, a method for detecting a misalignment of an object in a processing system is provided. The method generally includes obtaining a first image of the object, determining first values associated with pixels in at least one region of the first image, calculating at least one of a center of gravity value of the pixels in the at least one region or an average weight of the pixels in the at least one region, and detecting a misalignment of the object based on at least one of the calculated center of gravity or average weight of the pixels in the at least one region.Type: GrantFiled: October 13, 2015Date of Patent: May 1, 2018Assignee: APPLIED MATERIALS, INC.Inventors: Leonid M. Tertitski, Schubert S. Chu, Shay Assaf, Kim R. Vellore, Zhepeng Cong
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Publication number: 20170345693Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.Type: ApplicationFiled: August 14, 2017Publication date: November 30, 2017Inventors: Kim VELLORE, Dinesh KANAWADE, Stephen MOFFATT, Aaron MILLER, Leonid M. TERTITSKI, Norman L. TAM, Michael LIU, Colin FOX
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Patent number: 9735034Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.Type: GrantFiled: August 11, 2014Date of Patent: August 15, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Kim Vellore, Dinesh Kanawade, Stephen Moffatt, Aaron Miller, Leonid M. Tertitski, Norman L. Tam, Michael Liu, Colin Fox
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Publication number: 20160125589Abstract: A method and apparatus for detecting substrate misalignment (i.e., position displacement error) and/or substrate support misalignment. According to certain aspects, a method for detecting a misalignment of an object in a processing system is provided. The method generally includes obtaining a first image of the object, determining first values associated with pixels in at least one region of the first image, calculating at least one of a center of gravity value of the pixels in the at least one region or an average weight of the pixels in the at least one region, and detecting a misalignment of the object based on at least one of the calculated center of gravity or average weight of the pixels in the at least one region.Type: ApplicationFiled: October 13, 2015Publication date: May 5, 2016Inventors: Leonid M. TERTITSKI, Schubert S. CHU, Shay ASSAF, Kim R. VELLORE, Zhepeng CONG
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Publication number: 20150131698Abstract: Embodiments of the present invention generally relate to methods and apparatus for monitoring substrate temperature uniformity in a processing chamber, such as an RTP chamber. Substrate temperature is monitored using an infrared camera coupled to a probe having a wide-angle lens. The wide-angle lens is positioned within the probe and secured using a spring, and is capable of withstanding high temperature processing. The wide angle lens facilities viewing of substantially the entire surface of the substrate in a single image. The image of the substrate can be compared to a reference image to facilitate lamp adjustments, if necessary, to effect uniform heating of the substrate.Type: ApplicationFiled: October 17, 2014Publication date: May 14, 2015Inventors: Kim VELLORE, Dinesh KANAWADE, Leonid M. TERTITSKI, Norman L. TAM, Aaron Muir HUNTER
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Publication number: 20150041453Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.Type: ApplicationFiled: August 11, 2014Publication date: February 12, 2015Inventors: Kim VELLORE, Dinesh KANAWADE, Stephen MOFFATT, Aaron MILLER, Leonid M. TERTITSKI, Norman L. TAM, Michael LIU, Colin FOX
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Patent number: 8829393Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: GrantFiled: April 9, 2012Date of Patent: September 9, 2014Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
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Patent number: 8692151Abstract: A method and apparatus for targeting a beam of radiation is provided. A beam steering mirror and a beam capture mirror are movably disposed along an optical pathway. A controller moves the beam steering mirror and the beam capture mirror in an x-y plane, and rotates the mirrors, to target the beam to a target location on a surface, while keeping the optical path length substantially constant for all target locations on the surface. The surface is rotated by a rotational actuator to bring all target locations to positions accessible by the beam targeting optics. Imprecision in targeting and optical path length may be compensated by providing an actuated aperture at the beam entry point and/or a variable focus lens with an optical range finding detector, all in communication with the controller.Type: GrantFiled: March 30, 2011Date of Patent: April 8, 2014Assignee: Applied Materials, Inc.Inventors: Leonid M. Tertitski, Krishna Kumar Kuttannair, Aaron Muir Hunter, Stephen Moffatt
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Patent number: 8503497Abstract: Embodiments provide systems, devices, and methods for controlling a laser. The system includes a controller to control a laser, a ramp generator to ramp down laser power, the ramp generator electrically coupled with the controller and coupleable with the laser, and a hardware protection system electrically coupled with the ramp generator, wherein the ramp generator monitors signals sent from the controller and the hardware protection system to the ramp generator to detect signal failure and ramps down the laser power upon signal failure detection. The method includes sending a control status signal from a controller for a laser to a ramp generator, monitoring the control status signal for missing pulses, sending a hardware interlock status signal from a hardware protection system to the ramp generator, monitoring the hardware interlock status signal for signal failure, and ramping down laser power upon detection of missing pulses or signal failure.Type: GrantFiled: December 12, 2011Date of Patent: August 6, 2013Assignee: Applied Materials, Inc.Inventors: Oleg Serebryanov, Alexander Goldin, Abhilash J. Mayur, Leonid M. Tertitski
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Patent number: 8288685Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: GrantFiled: December 29, 2010Date of Patent: October 16, 2012Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
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Publication number: 20120205347Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: ApplicationFiled: April 9, 2012Publication date: August 16, 2012Applicant: APPLIED MATERIALS, INC.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
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Publication number: 20120170603Abstract: Embodiments provide systems, devices, and methods for controlling a laser. The system includes a controller to control a laser, a ramp generator to ramp down laser power, the ramp generator electrically coupled with the controller and coupleable with the laser, and a hardware protection system electrically coupled with the ramp generator, wherein the ramp generator monitors signals sent from the controller and the hardware protection system to the ramp generator to detect signal failure and ramps down the laser power upon signal failure detection. The method includes sending a control status signal from a controller for a laser to a ramp generator, monitoring the control status signal for missing pulses, sending a hardware interlock status signal from a hardware protection system to the ramp generator, monitoring the hardware interlock status signal for signal failure, and ramping down laser power upon detection of missing pulses or signal failure.Type: ApplicationFiled: December 12, 2011Publication date: July 5, 2012Applicant: APPLIED MATERIALS, INC.Inventors: Oleg SEREBRYANOV, Alexander GOLDIN, Abhilash J. MAYUR, Leonid M. Tertitski
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Patent number: 8178819Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: GrantFiled: March 14, 2005Date of Patent: May 15, 2012Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
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Publication number: 20110239421Abstract: A method and apparatus for targeting a beam of radiation is provided. A beam steering mirror and a beam capture mirror are movably disposed along an optical pathway. A controller moves the beam steering mirror and the beam capture mirror in an x-y plane, and rotates the mirrors, to target the beam to a target location on a surface, while keeping the optical path length substantially constant for all target locations on the surface. The surface is rotated by a rotational actuator to bring all target locations to positions accessible by the beam targeting optics. Imprecision in targeting and optical path length may be compensated by providing an actuated aperture at the beam entry point and/or a variable focus lens with an optical range finding detector, all in communication with the controller.Type: ApplicationFiled: March 30, 2011Publication date: October 6, 2011Applicant: APPLIED MATERIALS, INC.Inventors: Leonid M. Tertitski, Krishna Kumar Kuttannair, Aaron Muir Hunter, Stephen Moffatt