Abstract: The corrosion of ferrous metal surfaces in gas conditioning apparatus is inhibited by using a gas conditioning solution such as aqueous alkanolamines which contain thionitrogen compounds such as metal thiocyanates or thioamides. After recycling the gas conditioning solution for a few days, the solution dissolves sufficient amounts of nickel or cobalt or other metals in the equipment to act as a synergist with the thionitrogen compounds. In the event, the equipment does not contain any soluble synergistic metals, these metals may be added to the gas conditioning solution as soluble metal salts. Examples of useful additive metals are cobalt, nickel, calcium, copper, chromium, zinc, tin, aluminum, and magnesium.

Abstract: A copper based corrosion inhibitor composition and a method for employing the same to prevent corrosion of metal in contact with acid-gases, i.e., hydrogen sulfide, carbonyl sulfide and carbon dioxide. Copper, or a copper compound and sulfur or a sulfur compound, is maintained in solution in contact with the metal under conditions of operation, particularly the thermal regeneration, which provide copper ions and sulfur atoms, particularly polysulfide moieties at the surface of the metal, e.g. copper sulfide is dissolved in an aqueous alkanolamine, monoethanolamine, solution used as an absorbent for acid-gas removal from sour-gas. The copper and sulfur moieties may be formed in situ or prepared and added in solution. The inhibitor has particular utility in protecting metal surfaces which are subject to corrosion as an incidence of the acid-gas content of either natural or synthetic gases.

Abstract: An aqueous organic amine acid gas scrubbing system, particularly an aqueous N-methyldiethanolamine or diethanolamine acid gas scrubbing system having incorporated therein (1) a compound or mixture of compounds having the formula ##STR1## wherein n is an integer from 1 to 3, m is an integer from 2 to a number sufficient to yield a molecular weight of about 800, R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are each independently selected from the group consisting of --H, --C.sub.n' H.sub.2n' OH, --C.sub.n' H.sub.2n'+1, --C.sub.n' H.sub.2n' N(R.sub.3)R.sub.4 wherein n' is an integer from 1 to 2 and wherein R.sub.1 -R.sub.3 and R.sub.2 -R.sub.4 may be joined to form cyclic amines when n is 2; said compound being present in about 10 to about 2000 parts per million parts of treating solution; (2) copper or a copper ion yielding compound in from 0 to 1000 ppm; and (3) sulfur or a sulfur atom yielding compound in from 0 to 1000 ppm.