Abstract: A pressure sensitive element is provided. In one embodiment the pressure sensitive element comprises: a diaphragm with a gage side and a back side and a rim surrounding the diaphragm; a pair of inner islands on the gage side of the diaphragm wherein the pair of inner islands are spaced to form a first gap between the pair of inner islands; a first freed gage spanning the first gap; at least one bridge to provide an electrical communication path between the rim and the first freed gage; an outer island on the gage side of the diaphragm wherein the outer island and the rim are spaced to form a second gap; and a second freed gage spanning the second gap.

Abstract: A pressure sensitive element is provided. In one embodiment the pressure sensitive element comprises: a diaphragm with a gage side and a back side and a rim surrounding the diaphragm; a pair of inner islands on the gage side of the diaphragm wherein the pair of inner islands are spaced to form a first gap between the pair of inner islands; a first freed gage spanning the first gap; at least one bridge to provide an electrical communication path between the rim and the first freed gage; an outer island on the gage side of the diaphragm wherein the outer island and the rim are spaced to form a second gap; and a second freed gage spanning the second gap.

Abstract: A new high G-range damped acceleration sensor is proposed with a proof mass optimized for maximized, bi-directional and symmetrical damping to accommodate acceleration ranges above and beyond several thousand G's. In order to achieve the maximum, bi-directional and symmetrical damping, the high G-range acceleration sensor is designed to have minimum amount of mass in the proof mass while maximizing its surface areas. Such high G-range damped acceleration sensor can be applied to any application in which damping (or suppression of ringing) is desired at quite high frequencies.

Abstract: A MEMS device is provided, which includes a silicon substrate with a face surface that has a pattern of recesses which define functional elements of the MEMS device, leaving sharp-edged, highly doped ridges, and a cover with a mating surface coupled to the face surface. The cover includes patterns of metal films that engage the ridges to form surface-to-surface electrical connections as well as hermetic surface-to-surface sealing and/or bonding between the silicon ridges of the face surface and the metal film on the mating surface, wherein the metal film on the mating surface comes into atomic contact with the silicon ridges.

Abstract: A pressure transducer is provided that has a transducer body with a rim, a diaphragm that deflects in response to pressure and a sensor bonded to the diaphragm at the rim and at a center of the diaphragm. The sensor detects deflection of the metal diaphragm. The sensor and diaphragm are made of different materials. A thermal expansion difference between the sensor and the diaphragm is accommodated by flexures in the sensor that accept relative motion in a radial direction of the metal diaphragm with little effect on a sensitivity of the silicon structure to motion in an axial direction of the diaphragm.

Abstract: An interconnection system is provided for a solid-state device. The solid-state that includes, a first layer, multiple devices and a first face. A second layer is bonded to the first face at a bonded face of the second layer that faces the first face. Electrically conductive bonds are between the first and second faces. Conductive paths are on the bonded face of the second layer and connect two or more of the conductive bonds.

Abstract: A mechanical-to-electrical sensing structure is provided with first and second movable blocks. A first hinge is coupled to the first and second movable blocks and configured to resist loads other than flexing of the first hinge. At least a first gage link is separated from the first hinge and aligned to provide that a moment tending to rotate one of the first or second blocks relative to the other about the first hinge applies a tensile or compressive force along a length of the first gage link. Electrochemistry is used to define the at least first gage.

Abstract: A pivoted acceleration sensor has a substrate that is substantially parallel to first and second surfaces. A reference frame is provided. A first unbalanced seismic mass is suspended within the reference frame and is coupled with the reference frame through first and second strain gauges. The first and second strain gauges are located along a pivot axis of the first unbalanced seismic mass. The first and second strain gauges are first and second piezoresistors on the first surface of the substrate, A second unbalanced seismic mass is flexibly coupled with the first unbalanced seismic mass. The second unbalanced seismic mass is suspended within the reference frame and is coupled with the reference frame through third and fourth strain gauges. The third and fourth strain gauges are located along a pivot axis of the second unbalanced seismic mass. The third and fourth strain gauges are third and fourth piezoresistors on the first surface of the substrate.

Abstract: A new high G-range damped acceleration sensor is proposed with a proof mass optimized for maximized, bi-directional and symmetrical damping to accommodate acceleration ranges above and beyond several thousand G's. In order to achieve the maximum, bi-directional and symmetrical damping, the high G-range acceleration sensor is designed to have minimum amount of mass in the proof mass while maximizing its surface areas. Such high G-range damped acceleration sensor can be applied to any application in which damping (or suppression of ringing) is desired at quite high frequencies.

Abstract: A mechanical-to-electrical sensing structure is provided with first and second movable blocks. A first hinge is coupled to the first and second movable blocks and configured to resist loads other than flexing of the first hinge. At least a first gage link is separated from the first hinge and aligned to provide that a moment tending to rotate one of the first or second blocks relative to the other about the first hinge applies a tensile or compressive force along a length of the first gage link. Electrochemistry is used to define the at least first gage.

Abstract: A micro-sensor is provided with a fixed reference frame and an elastic pivot. The elastic pivot has at least two co-axial segments of pivot and is coupled to the fixed reference frame. The elastic pivot has a neutral axis that is a central line of the pivot. A moveable body is coupled to the elastic pivot and the reference frame. The moveable body and the reference frame share a reference surface. The moveable body extends between the two co-axial segments to provide that for a rotation of the moveable body about the pivot the moveable body approaches the reference surface at a first side, and recedes from the reference surface from an opposite side to provide an opening gap and a closing gap. The neutral axis is below the reference surface. At least a first gauge is configured to detect tilt about the elastic pivot and measure separation of the moveable body and the reference frame at the reference surface. The gauge provides a measurement of the opening and closing of the opening and closing gaps.

Abstract: An interconnection system is provided for a solid-state device. The solid-state that includes, a first layer, multiple devices and a first face. A second layer is bonded to the first face at a bonded face of the second layer that faces the first face. Electrically conductive bonds are between the first and second faces. Conductive paths are on the bonded face of the second layer and connect two or more of the conductive bonds.

Abstract: A pivoted acceleration sensor has a substrate that is substantially parallel to first and second surfaces. A reference frame is provided. A first unbalanced seismic mass is suspended within the reference frame and is coupled with the reference frame through first and second strain gauges. The first and second strain gauges are located along a pivot axis of the first unbalanced seismic mass. The first and second strain gauges are first and second piezoresistors on the first surface of the substrate, A second unbalanced seismic mass is flexibly coupled with the first unbalanced seismic mass. The second unbalanced seismic mass is suspended within the reference frame and is coupled with the reference frame through third and fourth strain gauges. The third and fourth strain gauges are located along a pivot axis of the second unbalanced seismic mass. The third and fourth strain gauges are third and fourth piezoresistors on the first surface of the substrate.

Abstract: A mechanical-to-electrical sensing structure has first and second movable blocks formed in a handle layer. A first hinge is coupled to the first and second movable blocks and configured to resist loads other than flexing of the first hinge. The first hinge is formed in the handle layer. A first gauge is separated from the first hinge and aligned to provide that a moment tending to rotate one of the first or second blocks relative to the other about the first hinge applies a tensile or compressive force along a length of the first gauge. The first gauge is formed from a device layer with an oxide between the device and handle layers. The sensing structure is made from an SOI wafer, and the first gauge is protected during an etching away of handle material beneath the first gauge by an oxide between the device and handle layers and an etch-resistant oxide or nitride on exterior surfaces of the first gauge.

Abstract: A pressure transducer is provided that has a transducer body with a rim, a diaphragm that deflects in response to pressure and a sensor bonded to the diaphragm at the rim and at a center of the diaphragm. The sensor detects deflection of the metal diaphragm. The sensor and diaphragm are made of different materials. A thermal expansion difference between the sensor and the diaphragm is accommodated by flexures in the sensor that accept relative motion in a radial direction of the metal diaphragm with little effect on a sensitivity of the silicon structure to motion in an axial direction of the diaphragm.

Abstract: A micro-sensor is provided with a fixed reference frame and an elastic pivot. The elastic pivot has at least two co-axial segments of pivot and is coupled to the fixed reference frame. The elastic pivot has a neutral axis that is a central line of the pivot. A moveable body is coupled to the elastic pivot and the reference frame. The moveable body and the reference frame share a reference surface. The moveable body extends between the two co-axial segments to provide that for a rotation of the moveable body about the pivot the moveable body approaches the reference surface at a first side, and recedes from the reference surface from an opposite side to provide an opening gap and a closing gap. The neutral axis is below the reference surface. At least a first gauge is configured to detect tilt about the elastic pivot and measure separation of the moveable body and the reference frame at the reference surface. The gauge provides a measurement of the opening and closing of the opening and closing gaps.

Abstract: A piezoresistive device is provided for sensing mechanical input and converts mechanical movement of at least two relatively movable parts into an electrical output. A silicon substrate is provided that is oriented in the (100) plane and has an n-type impurity. A gap extends across a portion of the substrate. The gap defines the at least two relatively moveable parts. A flexible cross-section connects the at least two relatively moveable parts. The cross-section is made of the same material as the substrate. At least one strain sensitive element is provided on a surface of the silicon substrate, is aligned in a [110] direction and includes a p-type impurity. The strain sensitive element has two end portions interconnected by an intermediate neck portion. The neck portion is supported on a structure that concentrates strain. The structure extends across the gap and has vertical walls that extend to the cross-section in the gap. The structure is made of the same material as the substrate.

Abstract: A mechanical-to-electrical sensing structure has first and second movable blocks formed in a handle layer. A first hinge is coupled to the first and second movable blocks and configured to resist loads other than flexing of the first hinge. The first hinge is formed in the handle layer. A first gauge is separated from the first hinge and aligned to provide that a moment tending to rotate one of the first or second blocks relative to the other about the first hinge applies a tensile or compressive force along a length of the first gauge. The first gauge is formed from a device layer with an oxide between the device and handle layers. The sensing structure is made from an SOI wafer, and the first gauge is protected during an etching away of handle material beneath the first gauge by an oxide between the device and handle layers and an etch-resistant oxide or nitride on exterior surfaces of the first gauge.

Abstract: A piezoresistive device senses mechanical input and converts mechanical movement of at least two relatively movable parts into an electrical output. An SOI substrate is provided. A gap extends across a portion of the substrate. The gap defines the at least two relatively moveable parts and a flexible cross-section that connects the at least two relatively moveable parts. The cross-section is made of a same material as the substrate. At least one strain sensitive element is at a surface of the substrate. The at least one strain sensitive element has two end portions interconnected by an intermediate neck portion. The neck portion is supported on a structure that concentrates strain. The structure extends across the gap and has vertical walls extending to the cross-section in the gap. The structure is made of the same material as the substrate.

Abstract: A piezoresistive strain concentrator that converts mechanical movement into electrical output and a process for fabricating the concentrator are provided. The device includes a strain sensing structure composed of a piezoresistive strain sensitive element that spans a gap in a substrate. The strain sensing structure is supported on a strain concentrating structure also spanning the gap that has vertical walls extending to a cross-section at the base of the gap, both structures being etched from the substrate. The structure of the strain-concentrating support for the strain sensitive element is fabricated by deep reactive ion etch (DRIE). The strain sensing structure has an increased sensitivity, a low gage factor and an increased resistance to buckling and fracture compared to previous strain gage structures. Several of the strain sensing structures can be connected in a sequence in a bridge circuit.