Patents by Inventor Lester A. Pederson

Lester A. Pederson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patterning process for bipolar optical storage medium
    Patent number: 5432047
    Abstract: An optical data storage device having a substrate has guide ridges, or reverse grooves, in a concentric or spiral shape formed thereon, and disposed in a plane parallel to and disposed from the substrate surface. The device further has pits formed approximately midway between the guide ridges and disposed in the substrate and having bottoms below the plane of the substrate surface. A method for manufacturing the optical data storage device having both address pits and guide ridges is disclosed. A dual tone photosensitive material is applied to a substrate, exposed with a laser light source comprising two distinct wavelengths, and developed to provide a desired bipolar geometry thereon.
    Type: Grant
    Filed: June 12, 1992
    Date of Patent: July 11, 1995
    Assignee: International Business Machines Corporation
    Inventors: John C. Cheng, William D. Hinsberg, III, Robert T. Lynch, Jr., Scott A. MacDonald, Lester A. Pederson, James S. Wong
  • Process for making an imaged oxygen-reactive ion etch barrier
    Patent number: 4464460
    Abstract: A process for making an image oxygen-reactive ion etch barrier using a polysilane that is resistant to resistive ion etching and is also a positive acting resist.
    Type: Grant
    Filed: June 28, 1983
    Date of Patent: August 7, 1984
    Assignee: International Business Machines Corporation
    Inventors: Hiroyuki Hiraoka, Donald C. Hofer, Robert D. Miller, Lester A. Pederson, Carlton G. Willson
  • Terpolymer resist compositions
    Patent number: 4398001
    Abstract: A resist sensitive to electron beam (and X-ray) radiation but resistant to reactive ion etching is formulated from a novolac resin and a sensitizer which is a terpolymer of sulfur dioxide, an olefin is hydrocarbon and an unsaturated ether.
    Type: Grant
    Filed: March 22, 1982
    Date of Patent: August 9, 1983
    Assignee: International Business Machines Corporation
    Inventors: Ying Y. Cheng, Barbara D. Grant, Lester A. Pederson, Carlton G. Willson
  • Process for forming microcircuits
    Patent number: 4289573
    Abstract: The resistance of a resist of plasma etching is enhanced by first cross-linking the resist and then contacting it with an aqueous solution of NaOH or KOH. The process is useful to form microcircuits having increased density of geometry.
    Type: Grant
    Filed: March 3, 1980
    Date of Patent: September 15, 1981
    Assignee: International Business Machines Corporation
    Inventors: James Economy, James R. Lyerla, Lester A. Pederson
  • Process for preparing electron beam resists
    Patent number: 4074031
    Abstract: Positive electron beam resists are prepared by reacting a film which is a copolymer of methyl methacrylate and methacrylic acid with a tertiary amine.
    Type: Grant
    Filed: September 8, 1976
    Date of Patent: February 14, 1978
    Assignee: International Business Machines Corporation
    Inventors: Duane E. Johnson, Lester A. Pederson