Abstract: In various examples, systems and methods are disclosed relating to implementing parallel computation of Boolean logic operations between 2-D geometric polygon sets. A system can identify a plurality of first edges of a first polygon and a plurality of second edges of a second polygon. The system can generate, based at least on a Boolean operation for the first polygon and the second polygon, a set of intersection points corresponding to intersections between at least one first edge of the plurality of first edges and at least one second edge of the plurality of second edges. The system can generate a directed graph data structure for the Boolean operation using the set of intersection points, and generate an output polygon based at least on the directed graph data structure.

Abstract: Apparatuses, systems, and techniques are to convert polygon data into pixels. In at least one embodiment, a processor causes polygon input data to be converted into pixels by using one or more prefix sums to generate one or more winding numbers to indicate whether a pixel is within a polygon.

Abstract: One embodiment of the present invention determines the effect of placing an assist feature at a location in a layout. During operation, the system receives a first value which was pre-computed by convolving a model with a layout at an evaluation point, wherein the model models semiconductor manufacturing processes. Next, the system determines a second value by convolving the model with an assist feature, which is assumed to be located at a first location which is in proximity to the evaluation point. The system then determines the effect of placing an assist feature using the first value and the second value. An embodiment of the present invention can be used to determine a substantially optimal location for placing an assist feature in a layout.

Abstract: One embodiment of the present invention provides a system that determines an assist feature placement. During operation, the system receives an initial assist feature placement for a layout. Next, the system determines assist feature perturbations using the initial assist feature placement. An assist feature perturbation typically comprises a few simple polygons. The system then determines perturbation values at evaluation points in the layout using the assist feature perturbations and an analytical model. If a process-sensitivity model is used, the perturbation value at an evaluation point is associated with the change in the through-process window at that point in the layout. Next, the system determines a change in the value of an objective function using the perturbation values. The objective function can be indicative of the overall manufacturability of the layout. The system then determines an assist feature placement using the change in the value of the objective function.