Patents by Inventor Levinius Pieter Bakker

Levinius Pieter Bakker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Filter window, lithographic projection apparatus, filter window manufacturing method, device manufacturing method and device manufactured thereby
    Patent number: 7456932
    Abstract: A filter window for EUV lithography includes a pellicle, and a wire structure for supporting the pellicle. The pellicle includes a first layer that includes at least one of AlN, Ru, Ir, Au, SiN, Rh. The pellicle has a very low EUV absorption in combination with a minimal oxidation rate. The thickness of the pellicle may be between 30 nm and 100 nm. It can be easily checked that absorption of EUV radiation of such a thin pellicle is equal to known filter windows, i.e. about 50% at a wavelength of 13.5 nm wavelength, but the oxidation of the pellicle according to the invention is much smaller. The filter window can for example be used to separate a Projection Optics box and a wafer compartment of the apparatus or to shield a reticle from particle contamination.
    Type: Grant
    Filed: July 9, 2004
    Date of Patent: November 25, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Levinius Pieter Bakker, Ralph Kurt