Patents by Inventor Levinus Bakker

Levinus Bakker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110025837
    Abstract: A method of imaging a sample comprises the steps of: -providing S1 a reference array of spots 104, -illuminating the sample 106 with the reference array of spots 104 and acquiring S2 at least one sample image IMSi comprising a sample related array of spots 107 resulting from the reference array of spots interacting with the sample 106, -determining S3 a spot characterizing parameter for each of a plurality of sample related spots, and -constructing S4 an image of the sample IM, By plotting the spot characterizing parameter for each of the plurality of sample related spots at the respective sample related spot position.
    Type: Application
    Filed: August 12, 2008
    Publication date: February 3, 2011
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Dirk Vossen, Levinus Bakker, Bas Hulsken, Sjoerd Stallinga
  • Publication number: 20070245363
    Abstract: The invention relates to an information carrier (801) comprising a data layer (802) intended to store a set of elementary data, and a holographic layer (803) for generating an array of light spots in response of a reference beam, said array of light spots being intended to be applied to said data layer (802). The invention relates to an apparatus for reading the data layer of an information carrier thanks to a holographic layer generating an array of light spots in response of a reference beam, said array of light spots being intended to be applied to said data layer. Use: optical storage.
    Type: Application
    Filed: July 19, 2005
    Publication date: October 18, 2007
    Applicant: Koninklijke Philips Electronics, N.V.
    Inventors: Levinus Bakker, Robert Hendriks
  • Publication number: 20070222956
    Abstract: A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.
    Type: Application
    Filed: May 16, 2007
    Publication date: September 27, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Levinus Bakker, Marcel Marie Dierichs, Johannes Freriks, Frank Schuurmans, Jakob Vijfvinkel, Wilhelmus Box
  • Publication number: 20070182932
    Abstract: This invention relates to a system (200) for projecting an image on a display comprising: a first dichroic means(212) receiving coloured light beams (204, 206, 208) and adapted to transmit the one (204) and to reflect the others (206, 208), a second dichroic means (220) receiving the other light beams (206, 208) and adapted to reflect a second (206) and to transmit a third (208) light beam.
    Type: Application
    Filed: March 3, 2005
    Publication date: August 9, 2007
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.
    Inventors: Levinus Bakker, Adrianus Johannes De Vaan
  • Publication number: 20070177240
    Abstract: The present invention provides an optical analysis system for determining an amplitude of a principal component of an optical signal. The principal component is indicative of the concentration of a particular compound or various compounds of a substance that is subject to spectroscopic analysis. The optical signal is subject to wavelength selective weighting and wavelength selective spatial separation specified by a weighting function. The optical signal is preferably separated into two parts that corresponding to a positive and negative spectral band of the weighting function, respectively. The separation provides separate detection of the separated parts of the optical signal without significant loss of intensity, thereby providing an improved signal to noise ratio of the determined principal component. Separation and weighting of the optical signal is realized by two multivariate optical elements.
    Type: Application
    Filed: December 16, 2004
    Publication date: August 2, 2007
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Michael Van Beek, Frank Schuurmans, Levinus Bakker
  • Publication number: 20070153234
    Abstract: A display device for generating a three-dimensional volumetric image incorporates an optical path length adjuster enables electro-optical control of a physical path length between a display panel and a focusing element, to generate a virtual image within a defined imaging volume. The adjuster varies an optical path length between an input optical path and an output optical path and includes: a first polarisation switch for selecting a polarisation state for an input beam on the input optical path and an optical element having birefringent properties and thereby defining at least two possible effective optical paths of different lengths therethrough, for passing the input beam along a selected one of said at least two possible optical paths according to the selected polarisation state of the input beam and for providing an output beam of light, on said optical output path, that has travelled along the selected optical path.
    Type: Application
    Filed: January 6, 2005
    Publication date: July 5, 2007
    Applicant: KONINKLIJKE PHILIPS ELECTRONIC, N.V.
    Inventors: Bart Salters, Levinus Bakker
  • Publication number: 20070146659
    Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.
    Type: Application
    Filed: December 28, 2005
    Publication date: June 28, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Derk Jan Klunder, Levinus Bakker, Vadim Banine, Frank Jeroen Schuurmans, Dominik Vaudrevange, Maarten Marinus Wilhelmus Van Herpen
  • Publication number: 20070140910
    Abstract: A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.
    Type: Application
    Filed: December 20, 2005
    Publication date: June 21, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Banine, Levinus Bakker, Ralph Kurt, Johannes Moors, Lucas Stevens, Peter Zalm
  • Publication number: 20070105253
    Abstract: In the described method of producing a plurality of bodies bearing equal imprints of a stamp as optical structures, a stamp (13) is initially produced, by attaching particles (14) to a surface (15) of an auxiliary body (16); than, the stamp (13) is used to produce an imprint (11) on a plurality of bodies (10). Optical structures can be irradiated, producing on a screen a speckle pattern indicative of a key. It is substantially impossible to clone a given optical structure with current technological means. Optical structures represent physical One-Way Functions, easy to compute in the forward sense but unfeasible to reverse. Thus, they can be used to build an access/copy protection system of user information contained in an information carrier associated with the body 10. The reproducibility of the optical structures makes this method suitable for optical disks.
    Type: Application
    Filed: May 10, 2004
    Publication date: May 10, 2007
    Applicant: Koninklijke Philips Electronics N.V.
    Inventors: Robert Hendriks, Sjoerd Stallinga, Hendrik Goossens, Gert 'T Hooft, Alexander Van Der Lee, Frank Schuurmans, Rudolf Vullers, Ralph Kurt, Bernardus Hendrikus Hendriks, Levinus Bakker
  • Publication number: 20070023693
    Abstract: A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at least some of the particles in the beam of radiation with the first portion, and moving the filter in a direction that is transverse to the beam of radiation so that the first portion is moved outside of the beam of radiation and the second portion is moved into the beam of radiation.
    Type: Application
    Filed: July 27, 2006
    Publication date: February 1, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Levinus Bakker, Derk Klunder, Maarten Marinus Wilhelmus Van Herpen
  • Publication number: 20060281013
    Abstract: The present invention relates to a system for copy protection of an information carrier, said system comprising a diffractive layer for delivering a speckle pattern when illuminated by a light source, a spatial filter, which is aligned with respect to the diffractive layer, for delivering a filtered optical signal from the speckle pattern and a detector array for delivering, when illuminated by said filtered optical signal, an electrical signal. Said system further comprises means for computing a cryptographic key from the electrical signal, and means for decrypting encrypted data contained in the information carrier from the cryptographic key. It finds its application in copy protection of content carriers such as optical discs or in smart cards.
    Type: Application
    Filed: April 16, 2004
    Publication date: December 14, 2006
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Ralph Kurt, Robert Hendriks, Levinus Bakker
  • Publication number: 20060250599
    Abstract: A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.
    Type: Application
    Filed: July 7, 2006
    Publication date: November 9, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Levinus Bakker, Jeroen Jonkers, Frank Schuurmans, Hugo Visser
  • Publication number: 20060245058
    Abstract: A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.
    Type: Application
    Filed: January 24, 2006
    Publication date: November 2, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Van Herpen, Levinus Bakker, Vadim Banine, Derk Jan Klunder
  • Publication number: 20060245057
    Abstract: A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.
    Type: Application
    Filed: April 27, 2005
    Publication date: November 2, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Van Herpen, Levinus Bakker, Vadim Banine, Derk Jan Klunder
  • Publication number: 20060219950
    Abstract: A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.
    Type: Application
    Filed: March 31, 2005
    Publication date: October 5, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Levinus Bakker, Vadim Banine, Vladimir Ivanov, Konstantin Koshelev, Bastiaan Mertens, Johannes Moors, Frank Schuurmans, Givi Zukavishvili, Bastiaan Wolschrijn, Marc Van Der Velden
  • Publication number: 20060175558
    Abstract: A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.
    Type: Application
    Filed: February 7, 2005
    Publication date: August 10, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Levinus Bakker, Vadim Banine, Johannes Josephina Moors, Carolus Ida Maria Spee, Johannes Leonardus Franken, Arnoud Wassink, Paul Antonius Brom
  • Publication number: 20060158734
    Abstract: The optical analysis system (20) for determining an amplitude of a principal component of an optical signal comprises a multivariate optical element (10) for reflecting the optical signal and thereby weighing the optical signal by a spectral weighing function, and a detector (9, 9P, 9N) for detecting the weighed optical signal. The optical analysis system (20) may further comprise a dispersive element (2) for spectrally dispersing the optical signal, the multivariate optical element being arranged to receive the dispersed optical signal. The blood analysis system (40) comprises the optical analysis system (20) according to the invention.
    Type: Application
    Filed: December 19, 2003
    Publication date: July 20, 2006
    Inventors: Frank Schuurmans, Michael Van Beek, Levinus Bakker, Wouter Rensen, Bernardus Hendrikus Hendriks, Robert Hendriks, Thomas Steffen
  • Publication number: 20060151717
    Abstract: Particles emitted by a radiation source, and moving from the radiation source towards a processing system for processing the radiation from the radiation source, are filtered out of radiation propagating through a predetermined cross section of the radiation as emitted by the radiation source by a filter system. The filter system includes a plurality of foils and a transporter for transporting the foils along a trajectory which extends within the beam so that the foils intercept the particles within the beam. The transporter is arranged to transport the foils by a substantially translatory movement of the foils along at least a part of the trajectory.
    Type: Application
    Filed: January 10, 2005
    Publication date: July 13, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Derk Klunder, Levinus Bakker, Vadim Banine, Maarten Marinus Johannes Wilhelmus Herpen
  • Publication number: 20060145094
    Abstract: An optical element including an anti-reflection (AR) coating is configured to reflect Extreme-Ultra-Violet (EUV) radiation only.
    Type: Application
    Filed: December 30, 2004
    Publication date: July 6, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maarten Marinus Wilhelmus Van Herpen, Levinus Bakker, Derk Wilfred Klunder
  • Publication number: 20060138348
    Abstract: A method for providing an operable filter system for filtering particles out of a beam of radiation in lithography is disclosed. The method includes providing a slack foil or wire for intercepting the particles, mounting at least a first point or side of the foil or wire to a first position of a mounting assembly, and substantially stretching the slack foil or wire at least within the beam of radiation, substantially parallel to a direction in which the radiation propagates.
    Type: Application
    Filed: December 27, 2005
    Publication date: June 29, 2006
    Applicant: ASML NETHERLANDS B.V
    Inventor: Levinus Bakker