Patents by Inventor Lewis B. Palmer

Lewis B. Palmer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4329247
    Abstract: A method and formulation for removing stains from vinyl surfaces which comprises the use of a formulation containing a solvent selected from the group consisting of ethylene glycol monoalkyl ethers and ethylene glycol monoalkyl ether acetates, along with an aqueous solution of sodium hypochlorite or calcium hypochlorite in fumed silica. The formulation is highly useful for removing stains, particularly ink and other stains applied either accidentally or as an element of graffiti on vinyl surfaces.
    Type: Grant
    Filed: November 6, 1980
    Date of Patent: May 11, 1982
    Assignee: PDI, Inc.
    Inventor: Lewis B. Palmer
  • Patent number: 4213937
    Abstract: A balanced, closed cycle silicon refinery system has been developed for producing electronic grade silicon from industrial grade silicon. Impurities comprising approximately 1% of the industrial grade silicon are removed in the refinery system to produce the purified silicon, while only a relatively small percentage of make-up chemicals are added to the system. In the refinery, hydrogen chloride is reacted with the impure silicon in a halide reactor to provide trichlorosilane and silicon tetrachloride and hydrogen. The trichlorosilane and/or silicon tetrachloride are passed through purification means, and then reacted with the hydrogen from the halide reactor in a fluidized bed reactor to produce the purified silicon and an effluent comprised of unreacted trichlorosilane, silicon tetrachloride, hydrogen, and the by-product hydrogen chloride.
    Type: Grant
    Filed: September 22, 1976
    Date of Patent: July 22, 1980
    Assignee: Texas Instruments Incorporated
    Inventors: Francois A. Padovani, Michael B. Miller, James A. Moore, James H. Fowler, Malcom N. June, James D. Matthews, T. R. Morton, Norbert A. Stotko, Lewis B. Palmer
  • Patent number: 4092446
    Abstract: A balanced closed cycle silicon refinery has been developed for producing electronic silicon from industrial grade silicon. Impurities comprising approximately 1% of the industrial grade silicon are removed during the refinery process to produce the purified silicon, while only a relatively small percentage of make-up chemicals are added to the system. In the refinery, hydrogen chloride is reacted with the impure silicon in a halide reactor to provide trichlorosilane and silicon tetrachloride and hydrogen. The trichlorosilane and/or silicon tetrachloride are purified to remove the impurities, and then reacted with the hydrogen from the halide reactor in a fluidized bed reactor to produce the purified silicon and an effluent comprised of unreacted trichlorosilane, silicon tetrachloride, hydrogen, and the by-product hydrogen chloride.
    Type: Grant
    Filed: July 31, 1974
    Date of Patent: May 30, 1978
    Assignee: Texas Instruments Incorporated
    Inventors: Francois A. Padovani, Michael Brant Miller, James A. Moore, James H. Fowler, Malcolm Neville June, James D. Matthews, T. R. Morton, Norbert A. Stotko, Lewis B. Palmer