Abstract: A system and method for distributing a low vapor pressure gas to one or more points of use in which a recirculation path and a recirculation device are provided. The recirculation path includes a distribution conduit in communication with the point(s) of use to allow the low vapor pressure gas to continually circulate to and from the point(s) of use. The recirculation device is positioned within the recirculation path to circulate said low vapor pressure gas continually through said recirculation path. In such manner, the low vapor pressure gas may be circulated at low pressure to prevent condensation. Further, the low vapor pressure gas may be circulated as a saturated gas mixture with a carrier gas. This may be effectuated by sparging the carrier gas through a vessel containing a liquid phase of a substance making up the low vapor pressure gas. Further the temperature of such liquid phase may be controlled to prevent condensation of the low vapor pressure gas.

Abstract: An apparatus and method are described for delivering hygroscopic, corrosive chemicals such as hydrogen chloride from a source such as a tube trailer to a use point such as a semiconductor fabrication tool minimizing infiltration of moisture, and entrainment of particulates, while still reducing moisture contents below 100 parts per billion and achieving appropriate pressure drops without two phase flow.