Abstract: Apparatus includes a sample holder with a cavity and a plurality of devices configured to hold a curvature of a curved substrate in a fixed configuration. Apparatus includes two prisms with a viewing apparatus of the sample holder configured to translate therebetween. Methods can include disposing the curved substrate in the sample holder, transmitting a first beam, translating the sample holder, and transmitting a second beam. Alternatively, apparatus include a light scattering-polarimetry sub-system configured to emit a first beam to impinge an end surface of coupling prism and detect at least a portion of the first beam impinging the first surface of the coupling prism. The apparatus includes an evanescent prism coupling spectroscopy sub-system configured to emit a second beam to impinge a first surface of the coupling system and detect at least a portion of the second beam impinging the second surface of the coupling prism.

Abstract: Aligning pillars of a three-dimensional NAND memory assembly can include forming a first pillar and a corresponding first pillar alignment feature in at least a portion of a first substrate stack. The alignment method can include depositing a second substrate stack on the first substrate stack, covering the first pillar alignment feature and the first pillar, and depositing a first masking layer on at least a portion of the second substrate stack. Illumination light can be used to illuminate a portion of the first masking layer. A reflected portion of the illumination light can indicate a location of the first pillar alignment feature corresponding to the first pillar. Particular wavelengths of the illumination light can be blocked or filtered by the first masking layer.

Abstract: A memory device can include a substrate and a first alignment mark embedded in the substrate. The first alignment mark can be configured to a reference for a patterned second masking layer which is different from a first masking layer deposited on the substrate, and onto which the second patterned masking layer is deposited. The first masking layer can be an opaque or semi-opaque sacrificial layer and a second alignment mark can comprise at least a portion of the first masking layer. A location of the second alignment mark can correspond to a particular structure location in the substrate. The patterned second masking layer can include an additional alignment mark that is spaced laterally apart from the second alignment mark and the patterned second masking layer can define one or more locations of one or more structural features in the substrate.

Abstract: A scattered light polarimetry (LSP) sub-system of a hybrid system for characterizing stress in a chemically-strengthened (CS) substrate having a top-surface and a near-surface waveguide, includes a LSP light source system, an LSP light source actuator coupled to the LSP light source system, and an optical compensator within an optical path of a LSP laser beam emitted by the LSP light source system. The optical compensator includes a half-wave plate, a half-wave plate actuator, a diffuser, and a diffuser actuator. The LSP sub-system further includes a LSP detector system in optical communication with the optical compensator through an LSP coupling prism having a LSP coupling surface, a focusing lens and a focusing lens actuator, and a support plenum having a surface and a measurement aperture, the support plenum configured to support the CS substrate at a measurement plane at the measurement aperture, and to operably support the LSP coupling prism.

Abstract: Systems and methods of performing a stress measurement of a chemically strengthened glass using a light-scattering polarimetry system include adjusting the intensity of a light beam from a light source in an illumination system using a rotatable half-wave plate and a first polarizer operably disposed between the light source and a rotating light diffuser that has a rotation time tR. The first polarizer is aligned with a second polarizer in a downstream optical compensator to have matching polarization directions by rotating the rotatable half-wave plate to a position where the exposure time tE falls within an exposure range tR?tE. The method also includes performing an exposure using the exposure time tE to obtain the stress measurement. One or both of the half-wave plate and first polarizer can be tilted to avoid deleterious back-reflected light from entering the light source.

Abstract: The hybrid measurement system includes an evanescent prism coupling spectroscopy (EPCS) sub-system and a light-scattering polarimetry (LSP) sub-system. The EPCS sub-system includes an EPCS light source system optically coupled to an EPCS detector system through an EPCS coupling prism. The LSP sub-system includes an LSP light source optically coupled to an optical compensator, which in turn is optically coupled to a LSP detector system via a LSP coupling prism. A support structure supports the EPCS and LSP coupling prisms to define a coupling prism assembly, which supports the two prisms at a measurement location. Stress measurements made using the EPCS and LSP sub-systems are combined to fully characterize the stress properties of a transparent chemically strengthened substrate. Methods of processing the EPCS and LSP measurements and enhanced configurations of the EPCS and LPS sub-systems to improve measurement accuracy are also disclosed.

Abstract: Systems and methods of performing a stress measurement of a chemically strengthened glass using a light-scattering polarimetry system include adjusting the intensity of a light beam from a light source in an illumination system using a rotatable half-wave plate and a first polarizer operably disposed between the light source and a rotating light diffuser that has a rotation time tR. The first polarizer is aligned with a second polarizer in a downstream optical compensator to have matching polarization directions by rotating the rotatable half-wave plate to a position where the exposure time tE falls within an exposure range tR?tE. The method also includes performing an exposure using the exposure time tE to obtain the stress measurement. One or both of the half-wave plate and first polarizer can be tilted to avoid deleterious back-reflected light from entering the light source.

Abstract: The hybrid measurement system includes an evanescent prism coupling spectroscopy (EPCS) sub-system and a light-scattering polarimetry (LSP) sub-system. The EPCS sub-system includes an EPCS light source system optically coupled to an EPCS detector system through an EPCS coupling prism. The LSP sub-system includes an LSP light source optically coupled to an optical compensator, which in turn is optically coupled to a LSP detector system via a LSP coupling prism. A support structure supports the EPCS and LSP coupling prisms to define a coupling prism assembly, which supports the two prisms at a measurement location. Stress measurements made using the EPCS and LSP sub-systems are combined to fully characterize the stress properties of a transparent chemically strengthened substrate. Methods of processing the EPCS and LSP measurements and enhanced configurations of the EPCS and LPS sub-systems to improve measurement accuracy are also disclosed.

Abstract: The hybrid measurement system includes an evanescent prism coupling spectroscopy (EPCS) sub-system and a light-scattering polarimetry (LSP) sub-system. The EPCS sub-system includes an EPCS light source optically coupled to an EPCS detector system through an EPCS coupling prism. The LSP sub-system includes an LSP light source optically coupled to an optical compensator, which in turn is optically coupled to a LSP detector system via a LSP coupling prism. A support structure supports the EPCS and LSP coupling prisms to define a coupling prism assembly, which supports the two prisms at a measurement location. Stress measurements made using the EPCS and LSP sub-systems are combined to fully characterize the stress properties of a transparent chemically strengthened substrate. Methods of processing the EPCS and LSP measurements to improve measurement accuracy are also disclosed.

Abstract: The hybrid measurement system includes an evanescent prism coupling spectroscopy (EPCS) sub-system and a light-scattering polarimetry (LSP) sub-system. The EPCS sub-system includes an EPCS light source optically coupled to an EPCS detector system through an EPCS coupling prism. The LSP sub-system includes an LSP light source optically coupled to an optical compensator, which in turn is optically coupled to a LSP detector system via a LSP coupling prism. A support structure supports the EPCS and LSP coupling prisms to define a coupling prism assembly, which supports the two prisms at a measurement location. Stress measurements made using the EPCS and LSP sub-systems are combined to fully characterize the stress properties of a transparent chemically strengthened substrate. Methods of processing the EPCS and LSP measurements to improve measurement accuracy are also disclosed.

Abstract: A method for performing diagnostics on a system of a vehicle includes the steps of receiving a request form an external source, obtaining data relevant to the request, processing the request using the data, and generating a report based at least in part on the processing of the request. The report comprises a diagnostic vector and a life usage vector. The diagnostic vector comprises diagnostic information for the system based at least in part on the processing of the request. The life usage vector comprises information as to usage of the system throughout a life history of the system, based at least in part on the processing of the request.

Abstract: Methods and apparatus are provided pertaining to a design of experiments. The method comprises generating a data set from historical data; identifying and removing any fault data points in the data set so as to create a revised data set; supplying the data points from the revised data set into a nonlinear neural network model; and deriving a simulator model characterizing a relationship between the input variables and the output variables. The apparatus comprises means for generating a data set from historical data; means for identifying and removing any fault data points in the data set so as to create a revised data set; means for supplying the data points from the revised data set into a nonlinear neural network model; and means for deriving a simulator model characterizing a relationship between the input variables and the output variables.