Patents by Inventor Li-Chieh Lin

Li-Chieh Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240120388
    Abstract: Provided are structures and methods for forming structures with sloping surfaces of a desired profile. An exemplary method includes performing a first etch process to differentially etch a gate material to a recessed surface, wherein the recessed surface includes a first horn at a first edge, a second horn at a second edge, and a valley located between the first horn and the second horn; depositing an etch-retarding layer over the recessed surface, wherein the etch-retarding layer has a central region over the valley and has edge regions over the horns, and wherein the central region of the etch-retarding layer is thicker than the edge regions of the etch-retarding layer; and performing a second etch process to recess the horns to establish the gate material with a desired profile.
    Type: Application
    Filed: January 18, 2023
    Publication date: April 11, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Li-Wei Yin, Tzu-Wen Pan, Yu-Hsien Lin, Jih-Sheng Yang, Shih-Chieh Chao, Chia Ming Liang, Yih-Ann Lin, Ryan Chia-Jen Chen
  • Patent number: 11955515
    Abstract: A semiconductor device with dual side source/drain (S/D) contact structures and a method of fabricating the same are disclosed. The method includes forming a fin structure on a substrate, forming a superlattice structure on the fin structure, forming first and second S/D regions within the superlattice structure, forming a gate structure between the first and second S/D regions, forming first and second contact structures on first surfaces of the first and second S/D regions, and forming a third contact structure, on a second surface of the first S/D region, with a work function metal (WFM) silicide layer and a dual metal liner. The second surface is opposite to the first surface of the first S/D region and the WFM silicide layer has a work function value closer to a conduction band energy than a valence band energy of a material of the first S/D region.
    Type: Grant
    Filed: July 28, 2022
    Date of Patent: April 9, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shih-Chuan Chiu, Chia-Hao Chang, Cheng-Chi Chuang, Chih-Hao Wang, Huan-Chieh Su, Chun-Yuan Chen, Li-Zhen Yu, Yu-Ming Lin
  • Patent number: 11946592
    Abstract: A bracket is provided. The bracket includes a fixing seat and a holding seat. The fixing seat has a first extending direction and includes at least one first contacting end surface, and a first angle is contained between the at least one first contacting end surface and the first extending direction. The holding seat is detachably connected to the fixing seat with a bend angle to form a bend structure, and the holding seat includes at least one second contacting end surface corresponding to the at least one first contacting end surface. The at least one first contacting end surface and the at least one second contacting end surface are located near or at a bend portion of the bend structure.
    Type: Grant
    Filed: May 20, 2022
    Date of Patent: April 2, 2024
    Assignee: WISTRON NEWEB CORPORATION
    Inventors: Lan-Chun Yang, Bing-Chun Chung, Li-Hsien Peng, Yi-Chieh Lin
  • Publication number: 20240091635
    Abstract: The present invention discloses a force feedback hand training method including: providing a training game content and adjusting the training game content based on predetermined parameters; displaying the training game content on a display; determining whether an input button position of at least one input signal from a hand training device matches a predetermined input button position; and storing a determination result in a storage module.
    Type: Application
    Filed: September 20, 2023
    Publication date: March 21, 2024
    Inventors: Fong-Chin Su, Li-Chieh Kuo, Hsiao-Feng Chieh, Chien-Ju Lin, Hsiu-Yun Hsu
  • Publication number: 20240096630
    Abstract: Disclosed is a semiconductor fabrication method. The method includes forming a gate stack in an area previously occupied by a dummy gate structure; forming a first metal cap layer over the gate stack; forming a first dielectric cap layer over the first metal cap layer; selectively removing a portion of the gate stack and the first metal cap layer while leaving a sidewall portion of the first metal cap layer that extends along a sidewall of the first dielectric cap layer; forming a second metal cap layer over the gate stack and the first metal cap layer wherein a sidewall portion of the second metal cap layer extends further along a sidewall of the first dielectric cap layer; forming a second dielectric cap layer over the second metal cap layer; and flattening a top layer of the first dielectric cap layer and the second dielectric cap layer using planarization operations.
    Type: Application
    Filed: January 12, 2023
    Publication date: March 21, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Li-Wei Yin, Tzu-Wen Pan, Yu-Hsien Lin, Yu-Shih Wang, Jih-Sheng Yang, Shih-Chieh Chao, Yih-Ann Lin, Ryan Chia-Jen Chen
  • Patent number: 11935794
    Abstract: A method of forming a semiconductor transistor device. The method comprises forming a channel structure over a substrate and forming a first source/drain structure and a second source/drain structure on opposite sides of the fin structure. The method further comprises forming a gate structure surrounding the fin structure. The method further comprises flipping and partially removing the substrate to form a back-side capping trench while leaving a lower portion of the substrate along upper sidewalls of the first source/drain structure and the second source/drain structure as a protective spacer. The method further comprises forming a back-side dielectric cap in the back-side capping trench.
    Type: Grant
    Filed: December 12, 2022
    Date of Patent: March 19, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Huan-Chieh Su, Cheng-Chi Chuang, Chih-Hao Wang, Zhi-Chang Lin, Li-Zhen Yu
  • Publication number: 20110114693
    Abstract: A pair of button pliers with improved retaining seats is disclosed. When the jaw members of the pliers are brought together with retaining seats carrying a male button element and a female button element retained thereon, respectively, the retaining seats help the male button element and the female button element to firmly combine as a whole button.
    Type: Application
    Filed: November 18, 2009
    Publication date: May 19, 2011
    Inventor: Li-Chieh Lin
  • Patent number: 6775932
    Abstract: An air bladder device includes a casing having a transparent or semi-transparent wall, an air bag received in the casing, and one or more patterns disposed between the wall and the air bag. The air bag is inflatable to move the patterns toward and away from the wall. The patterns are preferably spatial patterns and are deformable, and may be deformed when the patterns are forced against the wall, such that the patterns may be seen through the wall as changing patterns. The casing may include a scale for indicating the inflation of the air bag by the deformed patterns.
    Type: Grant
    Filed: September 6, 2002
    Date of Patent: August 17, 2004
    Inventor: Li Chieh Lin
  • Publication number: 20040107549
    Abstract: A locking pliers comprising a first arm and a second arm, a main rivet joins the two arms together in cross; a tensile spring wraps around the main rivet with two legs inside the two handles respectively; a teeth bar with one end joins moveably inside the joint of the first arm, the other end stretches downward into the handle of the second arm; a control mechanism located inside the first handle with a teeth structure on one side to gear into the teeth of the teeth bar and to offer an elastic strength to pull the teeth bar toward the protuberance, the other side stretches out of the handle of the second arm for users to adjust. Users can apply the present invention to clamp an object for more convenient, less strength and more stable clamping effect.
    Type: Application
    Filed: December 4, 2002
    Publication date: June 10, 2004
    Inventor: Li-Chieh Lin
  • Patent number: 6745441
    Abstract: A locking pliers comprising a first arm and a second arm, a main rivet joins the two arms together in cross; a tensile spring wraps around the main rivet with two legs inside the two handles respectively; a teeth bar with one end joins moveably inside the joint of the first arm, the other end stretches downward into the handle of the second arm; a control mechanism located inside the first handle with a teeth structure on one side to gear into the teeth of the teeth bar and to offer an elastic strength to pull the teeth bar toward the protuberance, the other side stretches out of the handle of the second arm for users to adjust. Users can apply the present invention to clamp an object for more convenient, less strength and more stable clamping effect.
    Type: Grant
    Filed: December 4, 2002
    Date of Patent: June 8, 2004
    Inventor: Li-Chieh Lin
  • Publication number: 20040045192
    Abstract: An air bladder device includes a casing having a transparent or semi-transparent wall, an air bag received in the casing, and one or more patterns disposed between the wall and the air bag. The air bag is inflatable to move the patterns toward and away from the wall. The patterns are preferably spatial patterns and are deformable, and may be deformed when the patterns are forced against the wall, such that the patterns may be seen through the wall as changing patterns. The casing may include a scale for indicating the inflation of the air bag by the deformed patterns.
    Type: Application
    Filed: September 6, 2002
    Publication date: March 11, 2004
    Inventor: Li Chieh Lin
  • Patent number: 6217977
    Abstract: A gas blow shaped air cushion with multiple cells is disclosed. Wherein the air cushion is formed by gas blowing shaping, the gas blow shaped air cushion with multiple cells is formed by an air cushion with a plurality of independent cells. Each two cells are retained with a proper gap, by which as the air cushion is compressed due to movement, each of the cells has a proper space for elastic deformation. The gas blow shaped air cushion has a width thinner than that made by prior art mold injection and thus the weight of an air cushion is reduced and the air cushion becomes more useful.
    Type: Grant
    Filed: March 8, 1999
    Date of Patent: April 17, 2001
    Inventor: Li-Chieh Lin
  • Patent number: 6138411
    Abstract: A flowerpot device has a base seat, an outer pot disposed on the base seat, an inner pot disposed in the outer pot, an annular sponge disposed in the inner pot, a collar disposed on the annular sponge, an annular water container disposed on the collar, and a hollow decoration casing enclosing the outer pot. The base seat has an annular threaded center portion, air-permeable web holes, a threaded hole, drain apertures, and a first alarm device. The inner pot has reinforced ribs and drain holes. The annular water container has an annular interior, a water inlet hole, through apertures, and a second alarm device.
    Type: Grant
    Filed: June 25, 1999
    Date of Patent: October 31, 2000
    Inventor: Li-Chieh Lin
  • Patent number: D899884
    Type: Grant
    Filed: October 1, 2019
    Date of Patent: October 27, 2020
    Inventor: Li-Chieh Lin