Abstract: A method for processing a substrate is provided. The method includes supplying a first flow of a chemical solution into a processing chamber, configured to process the substrate, via a first dispensing nozzle. The method further includes producing a first thermal image of the first flow of the chemical solution. The method also includes performing an image analysis on the first thermal image. In addition, the method includes moving the substrate into the processing chamber when the result of the analysis of the first thermal image is within the allowable deviation from the baseline.

Abstract: A method of fabricating a photomask includes providing a mask blank; removing a portion of the resist layer to form a patterned resist layer exposing a portion of the cooling layer; patterning the cooling layer by using the patterned resist layer as an etching mask; patterning the opaque layer; and removing the patterned resist layer and the patterned cooling layer. The mask blank includes a light-transmitting substrate and an opaque layer, a cooling layer, and a resist layer sequentially stacked thereon, wherein the cooling layer has a thermal conductivity ranging between 160 and 5000 and an effective atomic number ranging between 5 and 14.

Abstract: A method of fabricating a photomask includes providing a blank mask; removing a portion of the resist layer to form a patterned resist layer exposing a portion of the cooling layer; patterning the cooling layer by using the patterned resist layer as an etching mask; patterning the opaque layer; and removing the patterned resist layer and the patterned cooling layer. The blank mask includes a light-transmitting substrate and an opaque layer, a cooling layer, and a resist layer sequentially stacked thereon, wherein the cooling layer has a thermal conductivity ranging between 160 and 5000 and an effective atomic number ranging between 5 and 14.

Abstract: A method for processing a substrate is provided. The method includes supplying a first flow of a chemical solution into a processing chamber, configured to process the substrate, via a first dispensing nozzle. The method further includes producing a first thermal image of the first flow of the chemical solution. The method also includes performing an image analysis on the first thermal image. In addition, the method includes moving the substrate into the processing chamber when the result of the analysis of the first thermal image is within the allowable deviation from the baseline.

Abstract: A data file editing device for computer systems that allows users to edit and utilize content of data files in a computer. The device has a user interface that includes one displaying region, one data utilization region and one data edition region; a data utilization controller to define classification structure of data files, to display data file structure in said data utilization region and to display content of data files in said displaying region; and a data edition controller to define classification structure of edition tables, to display edition table structure in said data edition region and to display content of edition tables in said displaying region. The data file structure and edition table structure are display separately.

Abstract: A data file editing device for computer systems allows users to edit and utilize content of data files in a computer and comprises: a user interface comprising one displaying region, one data utilization region and one data edition region; a data utilization controller to define classification structure of data files, to display data file structure in said data utilization region and to display content of data files in said displaying region; and a data edition controller to define classification structure of edition tables, to display edition table structure in said data edition region and to display content of edition tables in said displaying region. The data file structure and the edition table structure are display separately.

Abstract: The production planning system of this invention comprises: a supply quantity calculation module to calculate quantities of particular components, half products and finished products to be supplied in the current cycle; a production policy database to store useful data needed in the calculation of said supply quantity; a production policy data editing module to allow modification of data stored in said production policy database; and an output means to output supply quantity calculated by said supply quantity calculation module; wherein said supply quantity is calculated from: supply quantity=estimated consuming quantity+estimated loss quantity+predetermined stock quantity; wherein said predetermined stock quantity is calculated from: predetermined stock quantity=predetermined final stock quantity of current cycle?initial stock quantity of current cycle.