Patents by Inventor Li-Ching CHANG

Li-Ching CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240113112
    Abstract: Methods of cutting gate structures and fins, and structures formed thereby, are described. In an embodiment, a substrate includes first and second fins and an isolation region. The first and second fins extend longitudinally parallel, with the isolation region disposed therebetween. A gate structure includes a conformal gate dielectric over the first fin and a gate electrode over the conformal gate dielectric. A first insulating fill structure abuts the gate structure and extends vertically from a level of an upper surface of the gate structure to at least a surface of the isolation region. No portion of the conformal gate dielectric extends vertically between the first insulating fill structure and the gate electrode. A second insulating fill structure abuts the first insulating fill structure and an end sidewall of the second fin. The first insulating fill structure is disposed laterally between the gate structure and the second insulating fill structure.
    Type: Application
    Filed: December 1, 2023
    Publication date: April 4, 2024
    Inventors: Ryan Chia-Jen Chen, Cheng-Chung Chang, Shao-Hua Hsu, Yu-Hsien Lin, Ming-Ching Chang, Li-Wei Yin, Tzu-Wen Pan, Yi-Chun Chen
  • Patent number: 11916131
    Abstract: According to an exemplary embodiment, a method of forming a vertical device is provided. The method includes: providing a protrusion over a substrate; forming an etch stop layer over the protrusion; laterally etching a sidewall of the etch stop layer; forming an insulating layer over the etch stop layer; forming a film layer over the insulating layer and the etch stop layer; performing chemical mechanical polishing on the film layer and exposing the etch stop layer; etching a portion of the etch stop layer to expose a top surface of the protrusion; forming an oxide layer over the protrusion and the film layer; and performing chemical mechanical polishing on the oxide layer and exposing the film layer.
    Type: Grant
    Filed: November 4, 2020
    Date of Patent: February 27, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: De-Fang Chen, Teng-Chun Tsai, Cheng-Tung Lin, Li-Ting Wang, Chun-Hung Lee, Ming-Ching Chang, Huan-Just Lin
  • Patent number: 9833029
    Abstract: A method of forming a three-dimensional electronic mannequin includes the following steps. First, measured data are provided. Subsequently, mannequin central axes are calculated. Inclination angle of the central axes are also calculated. A plurality of coordinate values of each human circumference line are calculated. At least one human orientation parameter of the three-dimensional electronic mannequin is adjusted. The adjusted three-dimensional electronic mannequin is displayed. The human orientation parameter includes a central axis of the neck part, a central axis of the side neck armpit part, a central axis of the armpit waist part and a central axis of the waist gluteal fold part.
    Type: Grant
    Filed: June 14, 2016
    Date of Patent: December 5, 2017
    Inventors: Li-Ching Chang, Mei-Yeh Chang
  • Publication number: 20170224039
    Abstract: A method of forming a three-dimensional electronic mannequin includes the following steps. First, measured data are provided. Subsequently, mannequin central axes are calculated. Inclination angle of the central axes are also calculated. A plurality of coordinate values of each human circumference line are calculated. At least one human orientation parameter of the three-dimensional electronic mannequin is adjusted. The adjusted three-dimensional electronic mannequin is displayed. The human orientation parameter includes a central axis of the neck part, a central axis of the side neck armpit part, a central axis of the armpit waist part and a central axis of the waist gluteal fold part.
    Type: Application
    Filed: June 14, 2016
    Publication date: August 10, 2017
    Inventors: Li-Ching CHANG, Mei-Yeh CHANG