Patents by Inventor Li-Chueh Chen

Li-Chueh Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140354965
    Abstract: The present invention discloses an immersion liquid replenishing apparatus, a replenishing method, and a wafer scribing lines inspection machine with the immersion liquid replenishing apparatus. The immersion liquid replenishing apparatus inputs an immersion liquid from a first pipe of the cover and outputs the immersion liquid from a second pipe of the bottom of a reservoir. The replenishing method comprises the steps of providing an immersion liquid replenishing apparatus, feeding an immersion liquid, forming a film, and discharging the immersion liquid. The production and preparation of the apparatus and method of the invention is convenient and cheap. During a process of wafer scribing lines inspection, the wafer scribing lines inspection machine with the immersion liquid replenishing apparatus has enough immersion liquid to form the film and discharges excess immersion liquid.
    Type: Application
    Filed: July 23, 2013
    Publication date: December 4, 2014
    Applicant: YAYATECH CO., LTD.
    Inventors: Ying-Cheng CHEN, Sheng-Feng Lin, Li-Chueh Chen, Yi-Chien Chen
  • Publication number: 20140168635
    Abstract: An inspection method and an inspection fixture for the scribing lines of a wafer are disclosed. The inspection method includes the following steps: providing a wafer having multiple chips and a lower surface attached with a dicing tape, wherein scribing lines are formed between the chips; connecting the dicing tape with a transparent carrier supporting a first liquid medium such that the dicing tape is contacted seamlessly with the first liquid medium, wherein the difference of refractive index between the first liquid medium and the dicing tape is less than 0.3; and inspecting the scribing lines through the transparent carrier from below the lower surface of the wafer by an inspection lens of an optical inspector. The inspection method and fixture increase the image resolution of the scribing lines so as to facilitate the detection of lower-surface defects of the scribing lines.
    Type: Application
    Filed: January 25, 2013
    Publication date: June 19, 2014
    Applicant: YAYATECH CO., LTD.
    Inventors: Sheng-Feng LIN, Chien-Cheng Chen, Kuei-Jung Chen, Li-Chueh Chen, Yi-Chien Chen