Patents by Inventor Li-De Hsu

Li-De Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method to improve post wafer etch cleaning process
    Patent number: 6928748
    Abstract: A method and apparatus for performing a semiconductor process wafer drying process, the method provides a semiconductor wafer having a process surface disposed in an enclosed drying space following exposure of the process surface to water; supplying a solvent vapor to the drying space at a predetermined concentration from a solvent vapor source and at least one solvent vapor supply line; determining at least one of a solvent vapor concentration and a solvent vapor temperature in the drying space; and heating in response to the determined solvent concentration at least one of at least a portion of one of the solvent vapor source, the at least one solvent vapor supply line, and at the drying space to alter the solvent vapor concentration in the drying space.
    Type: Grant
    Filed: October 16, 2003
    Date of Patent: August 16, 2005
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Jia-Ren Chen, Li-De Hsu, Chin-Chia Kuo, Hann-Huei Tsai