Abstract: Various embodiments herein relate to methods, apparatus, and systems for baking metal-containing on a semiconductor substrate in the presence of a reactive gas species. For example, the method may include receiving the substrate in a process chamber, the substrate having a photoresist layer thereon, where the photoresist layer includes a metal-containing photoresist material; flowing a reactive gas species from a gas source, through a gas delivery line, into the process chamber, and exposing the substrate to the reactive gas species in the process chamber; and baking the photoresist layer while the substrate is exposed to the reactive gas species.

Abstract: This disclosure relates to the field of image processing, and discloses an apparatus, method and readable storage medium for image processing model training. The model includes multiple prompt modules and multiple image processing modules corresponding to multiple prompt modules. The method comprising: input N sample images into multiple prompt modules to add corresponding prompt information to the N sample images. Thus, N prompt sample images corresponding to each image processing module may be obtained. And then input the N prompt sample images into each image processing module, to obtain N prediction results corresponding to the each image processing module. Then parameters of multiple image processing modules and multiple prompt modules can be adjusted based on N prediction results and N reference results corresponding to each image processing module.

Abstract: In some aspects, the present disclosure describes stable formulations comprising pembrolizumab, methods of making stable pharmaceutical formulations thereof, and methods of using stable pharmaceutical formulations thereof.

Abstract: Dry development of resists can be useful, for example, to form a patterning mask in the context of high-resolution patterning. Dry development may be advantageously accomplished by a method of processing a semiconductor substrate including providing in a process chamber a photopatterned resist on a substrate layer on a semiconductor substrate, and dry developing the photopatterned resist by removing either an exposed portion or an unexposed portion of the resist by a dry development process comprising exposure to a chemical compound to form a resist mask. The resist may be an EUV-sensitive organo-metal oxide or organo-metal-containing thin film EUV resist.

Abstract: A battery module, including a positive electrode current collector, a negative electrode current collector, and a plurality of solid-state battery cells are disclosed. The plurality of solid-state battery cells are stacked between the positive electrode current collector and the negative electrode current collector. Adjacent ones of the solid-state battery cells are electrically connected through a current collector coating layer. The solid-state battery cells at both ends are electrically connected to the positive electrode current collector and the negative electrode current collector respectively. A method for preparing the battery module, a battery pack and an electrical apparatus are disclosed. The battery module has low production cost and a simple production process.

Abstract: The present disclosure relates to use of aqueous acid for developing or treating a radiation-sensitive film. The aqueous acid can be employed to form a pattern by a positive tone wet development process or to treat a developed pattern by further removing residual resist components.

Abstract: A composite wire is provided. The composite wire includes a single core wire, a plurality of twisted wires, and an insulation layer. In a cross section of the composite wire, the twisted wires surround the single core wire. The twisted wires are configured along the circumferential direction of the single core wire. Each twisted wire comprises a plurality of conductive wires. The insulation layer covers the twisted wires. Each conductive wire has a conductive wire diameter, and the single core wire diameter of the single core wire is greater than the conductive wire diameter.

Abstract: This disclosure provides for methods and system for meta few-shot class incremental learning. According to an aspect a method is provided. The method includes obtaining at least one weight attention map of a first network and updating weights of a second network using the at least one weight attention map, where the second network is a modulatory network. The method further includes generating at least one feature attention map of the second network based on the at least one weight attention map of the first network and a set of input images of at least one class. The method further includes generating at least one feature map of the first network based on the set of input images of the at least one class, and updating the at least one feature map of the first network based on the feature attention map of the second network.

Abstract: A magnetic member includes a bobbin, a coil and a magnetic core. The bobbin includes a first portion and a second portion. The second portion is connected to the first portion and includes a thermoplastic material. The first portion includes an insulating material that is different from the thermoplastic material. The coil is wound on the first portion of the bobbin and includes a terminal end fixed at the second portion of the bobbin. The magnetic core is disposed on the bobbin and extends through the bobbin.

Abstract: A method has the steps of obtaining a set of training samples from one or more domains, using the set of training samples to query a plurality of artificial-intelligence (AI) models, combining the outputs of the queried AI models, and adapting a target AI model via knowledge distillation using the combined outputs.

Abstract: Disclosed is a split continuous operation micro-grid dynamic membrane bioreactor. The split continuous operation micro-grid dynamic membrane bioreactor comprises a biological treatment unit and a drum dynamic membrane filtration unit, wherein the biological treatment unit comprises a microbiological treatment tank, and a water inlet pipe is arranged on the microbiological treatment tank; the drum dynamic membrane filtration unit comprises a filter tank, and a drum micro-grid dynamic membrane mechanism is arranged in the filter tank; the drum micro-grid dynamic membrane mechanism comprises a filter drum, a backwashing device is arranged above the filter drum, and a sludge collecting tank is arranged in the filter drum; a water outlet is formed in the bottom of the filter tank; a mixed liquid pipe is arranged between the microbiological treatment tank and the filter drum; and a sludge discharge header pipe is arranged on the sludge collecting tank.

Abstract: An intelligent maintenance and repair robot for small diameter and small flow oil and gas pipelines, including a frame, a speed control mechanism, a braking mechanism, an anchoring mechanism, and a sealing mechanism; the speed control mechanism is composed of a motor, rotor, etc; the braking mechanism is composed of a braking rubber cylinder and a first extrusion ring; the anchoring mechanism is composed of a rubber conical cylinder, slips, etc; and the sealing mechanism is composed of a sealing rubber cylinder and a second extrusion ring. The second extrusion ring is driven by a hydraulic rod to press the sealing rubber cylinder, causing it to expand and block the pipe wall to achieve sealing. The intelligent maintenance and repair robot inside the pipeline has the characteristics of good speed control response, wide speed range, strong ability to pass bends, stable braking process, and high sealing reliability.

Abstract: The present disclosure relates to a film formed with a metal precursor and an organic precursor, as well as methods for forming and employing such films. The film can be employed as a photopatternable film or a radiation-sensitive film. In particular embodiments, the film includes alternating layers of metal-containing layers and organic layers. In other embodiments, the film includes a matrix of deposited metal and organic constituents.

Abstract: The present disclosure relates to use of a metal chelator to treat an exposed photoresist film. In particular embodiments, the metal chelator is employed to remove an interfacial area that is disposed between exposed and unexposed areas or disposed within an exposed area, thereby enhancing patterning quality.

Abstract: Provided are a method and a device of binding security inspection information, an electronic apparatus and a storage medium, which may be applied to the field of security inspection technology. In the method of binding security inspection information of the present disclosure, the pedestrian detection frame is acquired by detecting the video stream, and each pedestrian detection frame has the coordinate information and the tracking information. According to the coordinate information and the tracking information of the pedestrian detection frame, the baggage security inspection information, the pedestrian security inspection information, and the identity information are bound to acquire all security inspection information of a detected person, so that a security inspection efficiency is improved.

Abstract: Disclosed herein are methods and apparatuses for exposing an organic metal-oxide film to a blanket UV treatment prior to a lithographic patterning operation. A blanket UV treatment may be used to shift a solubility curve of the film, such that a lower EUV dose may be used to pattern the film. Additionally, a blanket UV treatment may be used after development to further cure the film.

Abstract: This disclosure provides for methods and system for meta few-shot class incremental learning. According to an aspect a method is provided. The method includes obtaining at least one weight attention map of a first network and updating weights of a second network using the at least one weight attention map, where the second network is a modulatory network. The method further includes generating at least one feature attention map of the second network based on the at least one weight attention map of the first network and a set of input images of at least one class. The method further includes generating at least one feature map of the first network based on the set of input images of the at least one class, and updating the at least one feature map of the first network based on the feature attention map of the second network.

Abstract: A method, system, and computer program product for detecting out-of-date runbooks are disclosed. The method may include generating a defect corresponding to an alert on a running workload system. The method may further include, in response to generating the defect in the running workload system, automatically obtaining an identification of a runbook based on information of the alert, automatically accessing the runbook based on the identification of the runbook, the runbook including instructions for fixing the defect, automatically parsing the instructions to obtain executable operations, and automatically executing the executable operations on the running workload system. The method may further include, in response to detecting that the alert is not solved on the running workload system after a predefined period, automatically determining that the runbook is out-of-date, and automatically generating a runbook out-of-date signal.

Abstract: The present disclosure relates to a patterning structure having a radiation-absorbing layer and an imaging layer, as well as methods and apparatuses thereof. In particular embodiments, the radiation-absorbing layer provides an increase in radiation absorptivity and/or patterning performance of the imaging layer.

Abstract: A metal-containing photoresist film may be deposited on a semiconductor substrate using a dry deposition technique. Unintended metal-containing photoresist material may form on internal surfaces of a process chamber during deposition, bevel and backside cleaning, baking, development, or etch operations. An in situ dry chamber clean may be performed to remove the unintended metal-containing photoresist material by exposure to an etch gas. The dry chamber clean may be performed at elevated temperatures without striking a plasma. In some embodiments, the dry chamber clean may include pumping/purging and conditioning operations.