Patents by Inventor Li Hou

Li Hou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12585786
    Abstract: Validation of a firmware image on a client device is disclosed. Information corresponding to one or more addresses of an image stored on a client device is periodically requested via an application program interface (API) configured to provide access to the image on the client device. The requested information from the image on the client device is compared with the image stored on the server image with stored validation information corresponding to a valid version of the image. An indication is generated if the information from the image on the client device does not match the stored validation information.
    Type: Grant
    Filed: March 26, 2024
    Date of Patent: March 24, 2026
    Assignee: Fortinet, Inc.
    Inventor: Li Hou
  • Publication number: 20250307415
    Abstract: Validation of a firmware image on a client device is disclosed. Information corresponding to one or more addresses of an image stored on a client device is periodically requested via an application program interface (API) configured to provide access to the image on the client device. The requested information from the image on the client device is compared with the image stored on the server image with stored validation information corresponding to a valid version of the image. An indication is generated if the information from the image on the client device does not match the stored validation information.
    Type: Application
    Filed: March 26, 2024
    Publication date: October 2, 2025
    Applicant: Fortinet, Inc.
    Inventor: Li Hou
  • Patent number: 11849558
    Abstract: A server chassis includes a housing, a support frame, and a back plate. The housing includes a substrate. A fixing portion is vertically disposed on the substrate and is fixedly connected with the back plate. The support frame is fixedly connected with the substrate. A first protrusion is disposed on the support frame and is inserted into the back plate. The interior of the server chassis is rendered more compact, and the server chassis can accommodate eight hard disks. A server including the server chassis is also disclosed.
    Type: Grant
    Filed: April 22, 2022
    Date of Patent: December 19, 2023
    Assignee: Fulian Precision Electronics (Tianjin) Co., LTD.
    Inventors: Yang Li, Han-Yu Li, Ya-Ni Zhang, Li Hou
  • Patent number: 11796810
    Abstract: One or more signals are received from one or more sensors. Based at least in part on the one or more signals, a location of a person relative to one or more locations of an autonomous self-moving device is determined. Based at least in part on the one or more signals, data indicative that the autonomous self-moving device has detected a presence and location of the person is generated. Based at least in part on the one or more signals, a location of a person relative to a location of the autonomous self-moving device is determined. A planned path for the autonomous self-moving device is determined. Based at least in part on the one or more signals, data indicative of the planned path is generated.
    Type: Grant
    Filed: September 23, 2019
    Date of Patent: October 24, 2023
    Assignee: MICROSOFT TECHNOLOGY LICENSING, LLC
    Inventors: Louis Amadio, Torsten Stein, Li Hou
  • Publication number: 20230148038
    Abstract: A method for rendering GIS point data is provided, this method includes: receiving a rendering instruction that carries a geographic region range to be rendered; selecting GIS point data corresponding to the geographic region range; generating, by execution of a canvas object generation thread, a canvas object corresponding to the selected GIS point data; and displaying the generated canvas object on a screen by execution of a display thread, continuing to obtain a remaining GIS point data, and generating a canvas object corresponding to the remaining GIS point data by execution of the canvas object generation thread, when or after the canvas object is displayed.
    Type: Application
    Filed: August 28, 2020
    Publication date: May 11, 2023
    Inventors: Li HOU, Xiang LIU
  • Publication number: 20220386498
    Abstract: A server chassis includes a housing, a support frame, and a back plate. The housing includes a substrate. A fixing portion is vertically disposed on the substrate and is fixedly connected with the back plate. The support frame is fixedly connected with the substrate. A first protrusion is disposed on the support frame and is inserted into the back plate. The interior of the server chassis is rendered more compact, and the server chassis can accommodate eight hard disks. A server including the server chassis is also disclosed.
    Type: Application
    Filed: April 22, 2022
    Publication date: December 1, 2022
    Inventors: YANG LI, HAN-YU LI, YA-NI ZHANG, LI HOU
  • Publication number: 20210026136
    Abstract: One or more signals are received from one or more sensors. Based at least in part on the one or more signals, a location of a person relative to one or more locations of an autonomous self-moving device is determined. Based at least in part on the one or more signals, data indicative that the autonomous self-moving device has detected a presence and location of the person is generated. Based at least in part on the one or more signals, a location of a person relative to a location of the autonomous self-moving device is determined. A planned path for the autonomous self-moving device is determined. Based at least in part on the one or more signals, data indicative of the planned path is generated.
    Type: Application
    Filed: September 23, 2019
    Publication date: January 28, 2021
    Inventors: Louis AMADIO, Torsten STEIN, Li HOU
  • Patent number: 10901321
    Abstract: Processes for removing a mask layer (e.g., doped amorphous carbon mask layer) from a substrate with high aspect ratio structures are provided. In one example implementation, a process can include depositing a polymer layer on at least a portion of a top end of a high aspect ratio structure on a substrate. The process can further include removing at least a portion of the polymer layer and the doped amorphous carbon film form the substrate using a plasma strip process. In example embodiments, depositing a polymer layer can include plugging one or more high aspect ratio structures with the polymer layer. In example embodiments, depositing a polymer layer can include forming a polymer layer on a sidewall of one or more high aspect ratio structures.
    Type: Grant
    Filed: March 18, 2020
    Date of Patent: January 26, 2021
    Assignees: Mattson Technology, Inc., Beijing E-Town Semiconductor Technology Co., Ltd.
    Inventors: Vijay M. Vaniapura, Shawming Ma, Li Hou
  • Publication number: 20200218158
    Abstract: Processes for removing a mask layer (e.g., doped amorphous carbon mask layer) from a substrate with high aspect ratio structures are provided. In one example implementation, a process can include depositing a polymer layer on at least a portion of a top end of a high aspect ratio structure on a substrate. The process can further include removing at least a portion of the polymer layer and the doped amorphous carbon film form the substrate using a plasma strip process. In example embodiments, depositing a polymer layer can include plugging one or more high aspect ratio structures with the polymer layer. In example embodiments, depositing a polymer layer can include forming a polymer layer on a sidewall of one or more high aspect ratio structures.
    Type: Application
    Filed: March 18, 2020
    Publication date: July 9, 2020
    Inventors: Vijay M. Vaniapura, Shawming Ma, Li Hou
  • Publication number: 20200135554
    Abstract: Apparatus, systems, and methods for conducting a hardmask (e.g., boron doped amorphous carbon hardmask) removal process on a workpiece are provided. In one example implementation, a method includes supporting a workpiece on a workpiece support in a processing chamber. The method can include generating a plasma from a process gas in a plasma chamber using a plasma source. The plasma chamber can be separated from the processing chamber by a separation grid. The method can include exposing the workpiece to one or more radicals generated in the plasma to perform a plasma strip process on the workpiece to at least partially remove the hardmask layer from the workpiece. The method can include exposing the workpiece to water vapor as a passivation agent during the plasma strip process.
    Type: Application
    Filed: October 10, 2019
    Publication date: April 30, 2020
    Inventors: Li Hou, Vijay M. Vaniapura, Jeyta Anand Sahay, Hua Chung, Shuang Meng, Shawming Ma
  • Patent number: 10599039
    Abstract: Processes for removing a mask layer (e.g., doped amorphous carbon mask layer) from a substrate with high aspect ratio structures are provided. In one example implementation, a process can include depositing a polymer layer on at least a portion of a top end of a high aspect ratio structure on a substrate. The process can further include removing at least a portion of the polymer layer and the doped amorphous carbon film form the substrate using a plasma strip process. In example embodiments, depositing a polymer layer can include plugging one or more high aspect ratio structures with the polymer layer. In example embodiments, depositing a polymer layer can include forming a polymer layer on a sidewall of one or more high aspect ratio structures.
    Type: Grant
    Filed: May 17, 2017
    Date of Patent: March 24, 2020
    Assignees: MATTSON TECHNOLOGY, INC., BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
    Inventors: Vijay M. Vaniapura, Shawming Ma, Li Hou
  • Patent number: 10312058
    Abstract: Embodiments of a method of depositing a thin film on a substrate is provided that includes placing a substrate on a substrate support that is mounted in a processing region of a processing chamber, flowing a process fluid through a plurality of gas passages in a diffuser plate toward the substrate supported on the substrate support, wherein the diffuser plate has an upstream side and a downstream side and the downstream side has a substantially concave curvature, and each of the gas passages are formed between the upstream side and the downstream side, and creating a plasma between the downstream side of the diffuser plate and the substrate support.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: June 4, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Soo Young Choi, John M. White, Qunhua Wang, Li Hou, Ki Woon Kim, Shinichi Kurita, Tae Kyung Won, Suhail Anwar, Beom Soo Park, Robin L. Tiner
  • Patent number: 10262837
    Abstract: Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process.
    Type: Grant
    Filed: November 4, 2015
    Date of Patent: April 16, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Soo Young Choi, John M. White, Qunhua Wang, Li Hou, Ki Woon Kim, Shinichi Kurita, Tae Kyung Won, Suhail Anwar, Beom Soo Park, Robin L. Tiner
  • Publication number: 20180074409
    Abstract: Processes for removing a mask layer (e.g., doped amorphous carbon mask layer) from a substrate with high aspect ratio structures are provided. In one example implementation, a process can include depositing a polymer layer on at least a portion of a top end of a high aspect ratio structure on a substrate. The process can further include removing at least a portion of the polymer layer and the doped amorphous carbon film form the substrate using a plasma strip process. In example embodiments, depositing a polymer layer can include plugging one or more high aspect ratio structures with the polymer layer. In example embodiments, depositing a polymer layer can include forming a polymer layer on a sidewall of one or more high aspect ratio structures.
    Type: Application
    Filed: May 17, 2017
    Publication date: March 15, 2018
    Inventors: Vijay M. Vaniapura, Shawming Ma, Li Hou
  • Publication number: 20180025890
    Abstract: Embodiments of a method of depositing a thin film on a substrate is provided that includes placing a substrate on a substrate support that is mounted in a processing region of a processing chamber, flowing a process fluid through a plurality of gas passages in a diffuser plate toward the substrate supported on the substrate support, wherein the diffuser plate has an upstream side and a downstream side and the downstream side has a substantially concave curvature, and each of the gas passages are formed between the upstream side and the downstream side, and creating a plasma between the downstream side of the diffuser plate and the substrate support.
    Type: Application
    Filed: September 28, 2017
    Publication date: January 25, 2018
    Inventors: Soo Young CHOI, John M. WHITE, Qunhua WANG, Li HOU, Ki Woon KIM, Shinichi KURITA, Tae Kyung WON, Suhail ANWAR, Beom Soo PARK, Robin L. TINER
  • Patent number: 9613759
    Abstract: The present invention provides a method for preparing fluorine/nitrogen co-doped graphitized carbon microspheres with high volumetric specific capacitance, which is a simple process with moderate reaction conditions, high reproducibility, and low costs. The fluorine/nitrogen co-doped graphitized carbon microspheres prepared according to the present invention have a very high density, exhibit good electrochemical properties in an alkaline environment, as well as very high volumetric specific capacitance and good cyclic stability, and is of great importance in improving the properties of the electrode material for a capacitor.
    Type: Grant
    Filed: March 30, 2015
    Date of Patent: April 4, 2017
    Assignee: Yanshan University
    Inventors: Faming Gao, Junshuang Zhou, Junchuan Zhang, Zhichao Li, Li Hou
  • Publication number: 20160056019
    Abstract: Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process.
    Type: Application
    Filed: November 4, 2015
    Publication date: February 25, 2016
    Inventors: Soo Young CHOI, John M. WHITE, Qunhua WANG, Li Hou, Ki Woon KIM, Shinichi KURITA, Tae Kyung WON, Suhail ANWAR, Beom Soo Park, Robin L. TINER
  • Publication number: 20150364265
    Abstract: A method for preparing fluorine/nitrogen co-doped graphitized carbon microspheres with high volumetric specific capacitance, mainly comprises: successively adding a carbon source, a nitrogen source, a fluorine source and a surfactant to a reactor under a nitrogen atmosphere, and stirring for 10-30 minutes before sealing the reactor; placing the reactor into a crucible furnace, heating at 300-600° C., for 6-48 hours, followed by naturally codling the reactor to room temperature and removing the reaction mixture therefrom; successively washing the resulted reaction mixture with absolute ethanol, 0.1 M-5 M diluted hydrochloride acid and distilled water for 3-6 times, filtering, and placing powder thus obtained in a vacuum oven and drying in vacuum at 60-100° C. for 6-12 hours. The present invention provides a simple process with moderate reaction conditions, high reproducibility, and low costs.
    Type: Application
    Filed: March 30, 2015
    Publication date: December 17, 2015
    Applicant: Yanshan University
    Inventors: FAMING GAO, Junshuang ZHOU, Junchuan ZHANG, Zhichao LI, Li HOU
  • Patent number: 9200368
    Abstract: Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process.
    Type: Grant
    Filed: August 10, 2011
    Date of Patent: December 1, 2015
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Soo Young Choi, John M. White, Qunhua Wang, Li Hou, Ki Woon Kim, Shinichi Kurita, Tae Kyung Won, Suhail Anwar, Beom Soo Park, Robin L. Tiner
  • Patent number: 8917518
    Abstract: A housing for a hard disk drive includes an enclosure defining a window in a front side thereof for providing access to install the hard disk drive in the enclosure, a rotation arm having a front end and a back end, and a panel. The back end of the rotation arm is pivotally connected to a rear end of the enclosure, and the panel is pivotally connected to the front end of the rotation arm. The rotation arm and the panel are pivotable between a locked state in which the panel covers the window of the enclosure and the rotation arm abuts a lateral side of the enclosure, and an open state in which the panel is pulled away from the enclosure to expose the window.
    Type: Grant
    Filed: June 25, 2012
    Date of Patent: December 23, 2014
    Assignees: Hong Fu Jin Precision Industry (ShenZhen) Co., Ltd., Hon Hai Precision Industry Co., Ltd.
    Inventors: Xiu-Quan Hu, Lin-Han Wu, Li Hou, Wei Wang