Patents by Inventor Li Hou
Li Hou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12585786Abstract: Validation of a firmware image on a client device is disclosed. Information corresponding to one or more addresses of an image stored on a client device is periodically requested via an application program interface (API) configured to provide access to the image on the client device. The requested information from the image on the client device is compared with the image stored on the server image with stored validation information corresponding to a valid version of the image. An indication is generated if the information from the image on the client device does not match the stored validation information.Type: GrantFiled: March 26, 2024Date of Patent: March 24, 2026Assignee: Fortinet, Inc.Inventor: Li Hou
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Publication number: 20250307415Abstract: Validation of a firmware image on a client device is disclosed. Information corresponding to one or more addresses of an image stored on a client device is periodically requested via an application program interface (API) configured to provide access to the image on the client device. The requested information from the image on the client device is compared with the image stored on the server image with stored validation information corresponding to a valid version of the image. An indication is generated if the information from the image on the client device does not match the stored validation information.Type: ApplicationFiled: March 26, 2024Publication date: October 2, 2025Applicant: Fortinet, Inc.Inventor: Li Hou
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Patent number: 11849558Abstract: A server chassis includes a housing, a support frame, and a back plate. The housing includes a substrate. A fixing portion is vertically disposed on the substrate and is fixedly connected with the back plate. The support frame is fixedly connected with the substrate. A first protrusion is disposed on the support frame and is inserted into the back plate. The interior of the server chassis is rendered more compact, and the server chassis can accommodate eight hard disks. A server including the server chassis is also disclosed.Type: GrantFiled: April 22, 2022Date of Patent: December 19, 2023Assignee: Fulian Precision Electronics (Tianjin) Co., LTD.Inventors: Yang Li, Han-Yu Li, Ya-Ni Zhang, Li Hou
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Patent number: 11796810Abstract: One or more signals are received from one or more sensors. Based at least in part on the one or more signals, a location of a person relative to one or more locations of an autonomous self-moving device is determined. Based at least in part on the one or more signals, data indicative that the autonomous self-moving device has detected a presence and location of the person is generated. Based at least in part on the one or more signals, a location of a person relative to a location of the autonomous self-moving device is determined. A planned path for the autonomous self-moving device is determined. Based at least in part on the one or more signals, data indicative of the planned path is generated.Type: GrantFiled: September 23, 2019Date of Patent: October 24, 2023Assignee: MICROSOFT TECHNOLOGY LICENSING, LLCInventors: Louis Amadio, Torsten Stein, Li Hou
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Publication number: 20230148038Abstract: A method for rendering GIS point data is provided, this method includes: receiving a rendering instruction that carries a geographic region range to be rendered; selecting GIS point data corresponding to the geographic region range; generating, by execution of a canvas object generation thread, a canvas object corresponding to the selected GIS point data; and displaying the generated canvas object on a screen by execution of a display thread, continuing to obtain a remaining GIS point data, and generating a canvas object corresponding to the remaining GIS point data by execution of the canvas object generation thread, when or after the canvas object is displayed.Type: ApplicationFiled: August 28, 2020Publication date: May 11, 2023Inventors: Li HOU, Xiang LIU
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Publication number: 20220386498Abstract: A server chassis includes a housing, a support frame, and a back plate. The housing includes a substrate. A fixing portion is vertically disposed on the substrate and is fixedly connected with the back plate. The support frame is fixedly connected with the substrate. A first protrusion is disposed on the support frame and is inserted into the back plate. The interior of the server chassis is rendered more compact, and the server chassis can accommodate eight hard disks. A server including the server chassis is also disclosed.Type: ApplicationFiled: April 22, 2022Publication date: December 1, 2022Inventors: YANG LI, HAN-YU LI, YA-NI ZHANG, LI HOU
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Publication number: 20210026136Abstract: One or more signals are received from one or more sensors. Based at least in part on the one or more signals, a location of a person relative to one or more locations of an autonomous self-moving device is determined. Based at least in part on the one or more signals, data indicative that the autonomous self-moving device has detected a presence and location of the person is generated. Based at least in part on the one or more signals, a location of a person relative to a location of the autonomous self-moving device is determined. A planned path for the autonomous self-moving device is determined. Based at least in part on the one or more signals, data indicative of the planned path is generated.Type: ApplicationFiled: September 23, 2019Publication date: January 28, 2021Inventors: Louis AMADIO, Torsten STEIN, Li HOU
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Patent number: 10901321Abstract: Processes for removing a mask layer (e.g., doped amorphous carbon mask layer) from a substrate with high aspect ratio structures are provided. In one example implementation, a process can include depositing a polymer layer on at least a portion of a top end of a high aspect ratio structure on a substrate. The process can further include removing at least a portion of the polymer layer and the doped amorphous carbon film form the substrate using a plasma strip process. In example embodiments, depositing a polymer layer can include plugging one or more high aspect ratio structures with the polymer layer. In example embodiments, depositing a polymer layer can include forming a polymer layer on a sidewall of one or more high aspect ratio structures.Type: GrantFiled: March 18, 2020Date of Patent: January 26, 2021Assignees: Mattson Technology, Inc., Beijing E-Town Semiconductor Technology Co., Ltd.Inventors: Vijay M. Vaniapura, Shawming Ma, Li Hou
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Publication number: 20200218158Abstract: Processes for removing a mask layer (e.g., doped amorphous carbon mask layer) from a substrate with high aspect ratio structures are provided. In one example implementation, a process can include depositing a polymer layer on at least a portion of a top end of a high aspect ratio structure on a substrate. The process can further include removing at least a portion of the polymer layer and the doped amorphous carbon film form the substrate using a plasma strip process. In example embodiments, depositing a polymer layer can include plugging one or more high aspect ratio structures with the polymer layer. In example embodiments, depositing a polymer layer can include forming a polymer layer on a sidewall of one or more high aspect ratio structures.Type: ApplicationFiled: March 18, 2020Publication date: July 9, 2020Inventors: Vijay M. Vaniapura, Shawming Ma, Li Hou
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Publication number: 20200135554Abstract: Apparatus, systems, and methods for conducting a hardmask (e.g., boron doped amorphous carbon hardmask) removal process on a workpiece are provided. In one example implementation, a method includes supporting a workpiece on a workpiece support in a processing chamber. The method can include generating a plasma from a process gas in a plasma chamber using a plasma source. The plasma chamber can be separated from the processing chamber by a separation grid. The method can include exposing the workpiece to one or more radicals generated in the plasma to perform a plasma strip process on the workpiece to at least partially remove the hardmask layer from the workpiece. The method can include exposing the workpiece to water vapor as a passivation agent during the plasma strip process.Type: ApplicationFiled: October 10, 2019Publication date: April 30, 2020Inventors: Li Hou, Vijay M. Vaniapura, Jeyta Anand Sahay, Hua Chung, Shuang Meng, Shawming Ma
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Patent number: 10599039Abstract: Processes for removing a mask layer (e.g., doped amorphous carbon mask layer) from a substrate with high aspect ratio structures are provided. In one example implementation, a process can include depositing a polymer layer on at least a portion of a top end of a high aspect ratio structure on a substrate. The process can further include removing at least a portion of the polymer layer and the doped amorphous carbon film form the substrate using a plasma strip process. In example embodiments, depositing a polymer layer can include plugging one or more high aspect ratio structures with the polymer layer. In example embodiments, depositing a polymer layer can include forming a polymer layer on a sidewall of one or more high aspect ratio structures.Type: GrantFiled: May 17, 2017Date of Patent: March 24, 2020Assignees: MATTSON TECHNOLOGY, INC., BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTDInventors: Vijay M. Vaniapura, Shawming Ma, Li Hou
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Patent number: 10312058Abstract: Embodiments of a method of depositing a thin film on a substrate is provided that includes placing a substrate on a substrate support that is mounted in a processing region of a processing chamber, flowing a process fluid through a plurality of gas passages in a diffuser plate toward the substrate supported on the substrate support, wherein the diffuser plate has an upstream side and a downstream side and the downstream side has a substantially concave curvature, and each of the gas passages are formed between the upstream side and the downstream side, and creating a plasma between the downstream side of the diffuser plate and the substrate support.Type: GrantFiled: September 28, 2017Date of Patent: June 4, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Soo Young Choi, John M. White, Qunhua Wang, Li Hou, Ki Woon Kim, Shinichi Kurita, Tae Kyung Won, Suhail Anwar, Beom Soo Park, Robin L. Tiner
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Patent number: 10262837Abstract: Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process.Type: GrantFiled: November 4, 2015Date of Patent: April 16, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Soo Young Choi, John M. White, Qunhua Wang, Li Hou, Ki Woon Kim, Shinichi Kurita, Tae Kyung Won, Suhail Anwar, Beom Soo Park, Robin L. Tiner
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Publication number: 20180074409Abstract: Processes for removing a mask layer (e.g., doped amorphous carbon mask layer) from a substrate with high aspect ratio structures are provided. In one example implementation, a process can include depositing a polymer layer on at least a portion of a top end of a high aspect ratio structure on a substrate. The process can further include removing at least a portion of the polymer layer and the doped amorphous carbon film form the substrate using a plasma strip process. In example embodiments, depositing a polymer layer can include plugging one or more high aspect ratio structures with the polymer layer. In example embodiments, depositing a polymer layer can include forming a polymer layer on a sidewall of one or more high aspect ratio structures.Type: ApplicationFiled: May 17, 2017Publication date: March 15, 2018Inventors: Vijay M. Vaniapura, Shawming Ma, Li Hou
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Publication number: 20180025890Abstract: Embodiments of a method of depositing a thin film on a substrate is provided that includes placing a substrate on a substrate support that is mounted in a processing region of a processing chamber, flowing a process fluid through a plurality of gas passages in a diffuser plate toward the substrate supported on the substrate support, wherein the diffuser plate has an upstream side and a downstream side and the downstream side has a substantially concave curvature, and each of the gas passages are formed between the upstream side and the downstream side, and creating a plasma between the downstream side of the diffuser plate and the substrate support.Type: ApplicationFiled: September 28, 2017Publication date: January 25, 2018Inventors: Soo Young CHOI, John M. WHITE, Qunhua WANG, Li HOU, Ki Woon KIM, Shinichi KURITA, Tae Kyung WON, Suhail ANWAR, Beom Soo PARK, Robin L. TINER
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Patent number: 9613759Abstract: The present invention provides a method for preparing fluorine/nitrogen co-doped graphitized carbon microspheres with high volumetric specific capacitance, which is a simple process with moderate reaction conditions, high reproducibility, and low costs. The fluorine/nitrogen co-doped graphitized carbon microspheres prepared according to the present invention have a very high density, exhibit good electrochemical properties in an alkaline environment, as well as very high volumetric specific capacitance and good cyclic stability, and is of great importance in improving the properties of the electrode material for a capacitor.Type: GrantFiled: March 30, 2015Date of Patent: April 4, 2017Assignee: Yanshan UniversityInventors: Faming Gao, Junshuang Zhou, Junchuan Zhang, Zhichao Li, Li Hou
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Publication number: 20160056019Abstract: Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process.Type: ApplicationFiled: November 4, 2015Publication date: February 25, 2016Inventors: Soo Young CHOI, John M. WHITE, Qunhua WANG, Li Hou, Ki Woon KIM, Shinichi KURITA, Tae Kyung WON, Suhail ANWAR, Beom Soo Park, Robin L. TINER
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Publication number: 20150364265Abstract: A method for preparing fluorine/nitrogen co-doped graphitized carbon microspheres with high volumetric specific capacitance, mainly comprises: successively adding a carbon source, a nitrogen source, a fluorine source and a surfactant to a reactor under a nitrogen atmosphere, and stirring for 10-30 minutes before sealing the reactor; placing the reactor into a crucible furnace, heating at 300-600° C., for 6-48 hours, followed by naturally codling the reactor to room temperature and removing the reaction mixture therefrom; successively washing the resulted reaction mixture with absolute ethanol, 0.1 M-5 M diluted hydrochloride acid and distilled water for 3-6 times, filtering, and placing powder thus obtained in a vacuum oven and drying in vacuum at 60-100° C. for 6-12 hours. The present invention provides a simple process with moderate reaction conditions, high reproducibility, and low costs.Type: ApplicationFiled: March 30, 2015Publication date: December 17, 2015Applicant: Yanshan UniversityInventors: FAMING GAO, Junshuang ZHOU, Junchuan ZHANG, Zhichao LI, Li HOU
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Patent number: 9200368Abstract: Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process.Type: GrantFiled: August 10, 2011Date of Patent: December 1, 2015Assignee: APPLIED MATERIALS, INC.Inventors: Soo Young Choi, John M. White, Qunhua Wang, Li Hou, Ki Woon Kim, Shinichi Kurita, Tae Kyung Won, Suhail Anwar, Beom Soo Park, Robin L. Tiner
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Patent number: 8917518Abstract: A housing for a hard disk drive includes an enclosure defining a window in a front side thereof for providing access to install the hard disk drive in the enclosure, a rotation arm having a front end and a back end, and a panel. The back end of the rotation arm is pivotally connected to a rear end of the enclosure, and the panel is pivotally connected to the front end of the rotation arm. The rotation arm and the panel are pivotable between a locked state in which the panel covers the window of the enclosure and the rotation arm abuts a lateral side of the enclosure, and an open state in which the panel is pulled away from the enclosure to expose the window.Type: GrantFiled: June 25, 2012Date of Patent: December 23, 2014Assignees: Hong Fu Jin Precision Industry (ShenZhen) Co., Ltd., Hon Hai Precision Industry Co., Ltd.Inventors: Xiu-Quan Hu, Lin-Han Wu, Li Hou, Wei Wang