Patents by Inventor Li Hou

Li Hou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250039646
    Abstract: An internal radio wave transmission system of building includes a base layer and a transmission layer, with a radio wave transmission channel between the two layers. The radio wave transmission system in a building includes a signal transceiver device, a first reflective plate and a second reflective plate. The signal transceiver device is connected with a telecommunication room, and the signal transceiver device emits and receives radio wave signals. The first reflective plate is disposed in the channel and corresponds to positions of the base layer and the signal transceiver device to receive and guide the radio wave signals. The second reflective plate is disposed in the channel and corresponds to a position of the transmission layer to receive and guide the radio wave signals to terminal equipment located in the transmission layer. The invention ensures the effective transmission of the radio wave signals inside the building.
    Type: Application
    Filed: June 20, 2024
    Publication date: January 30, 2025
    Inventors: TZUU-YAW LU, HERMAN CHUNGHWA RAO, Chun-Chieh KUO, Hua-Pei CHIANG, CHYI-DAR JANG, TSUNG-JEN WANG, CHI-HUNG LIN, WEI-DI HWANG, FANG-CHI YEN, CHIEN-LI HOU
  • Patent number: 11849558
    Abstract: A server chassis includes a housing, a support frame, and a back plate. The housing includes a substrate. A fixing portion is vertically disposed on the substrate and is fixedly connected with the back plate. The support frame is fixedly connected with the substrate. A first protrusion is disposed on the support frame and is inserted into the back plate. The interior of the server chassis is rendered more compact, and the server chassis can accommodate eight hard disks. A server including the server chassis is also disclosed.
    Type: Grant
    Filed: April 22, 2022
    Date of Patent: December 19, 2023
    Assignee: Fulian Precision Electronics (Tianjin) Co., LTD.
    Inventors: Yang Li, Han-Yu Li, Ya-Ni Zhang, Li Hou
  • Patent number: 11796810
    Abstract: One or more signals are received from one or more sensors. Based at least in part on the one or more signals, a location of a person relative to one or more locations of an autonomous self-moving device is determined. Based at least in part on the one or more signals, data indicative that the autonomous self-moving device has detected a presence and location of the person is generated. Based at least in part on the one or more signals, a location of a person relative to a location of the autonomous self-moving device is determined. A planned path for the autonomous self-moving device is determined. Based at least in part on the one or more signals, data indicative of the planned path is generated.
    Type: Grant
    Filed: September 23, 2019
    Date of Patent: October 24, 2023
    Assignee: MICROSOFT TECHNOLOGY LICENSING, LLC
    Inventors: Louis Amadio, Torsten Stein, Li Hou
  • Patent number: 11729068
    Abstract: An approach is provided in which the approach captures a first user activity log of a first user accessing multiple systems and captures a set of second user activity logs of a set of second users accessing the multiple systems. The approach determines a set of system monitoring preferences based the first user activity log and the set of second user activity logs, and scores the multiple systems based on the set of system monitoring preferences. The approach generates a recommended system monitoring list based on the scored multiple systems, and transmits the recommended system monitoring list to the first user.
    Type: Grant
    Filed: September 9, 2021
    Date of Patent: August 15, 2023
    Assignee: International Business Machines Corporation
    Inventors: Tian Jiao Zhang, Yuan Feng, Yan Yan Han, Su Li Hou, Xue Ying Zhang, Jing Xu, Ling Zhuo
  • Publication number: 20230221847
    Abstract: An embodiment includes detecting an interface element and an element attribute of the interface element in a series of views of a user interface, and then after an update of the user interface, detecting a candidate element and a candidate element attribute in a series of views of the updated user interface. The embodiment then determines that the updated user interface lacks any errors using a decision tree that includes comparisons of all interface elements of the user interface to corresponding candidate elements of the updated user interface. The embodiment then generates an optimized decision tree based at least in part on an analysis of the comparisons of the user interface to the updated user interface resulting in a condition that allows for the determining of a lack of errors based on comparisons of a subset of the interface elements to corresponding candidate elements.
    Type: Application
    Filed: January 13, 2022
    Publication date: July 13, 2023
    Applicant: International Business Machines Corporation
    Inventors: Yuan Feng, Yan Yan Han, Ling Zhuo, Tian Jiao Zhang, Jing Xu, Xue Ying Zhang, SU LI HOU
  • Publication number: 20230148038
    Abstract: A method for rendering GIS point data is provided, this method includes: receiving a rendering instruction that carries a geographic region range to be rendered; selecting GIS point data corresponding to the geographic region range; generating, by execution of a canvas object generation thread, a canvas object corresponding to the selected GIS point data; and displaying the generated canvas object on a screen by execution of a display thread, continuing to obtain a remaining GIS point data, and generating a canvas object corresponding to the remaining GIS point data by execution of the canvas object generation thread, when or after the canvas object is displayed.
    Type: Application
    Filed: August 28, 2020
    Publication date: May 11, 2023
    Inventors: Li HOU, Xiang LIU
  • Publication number: 20230084737
    Abstract: An approach is provided in which the approach captures a first user activity log of a first user accessing multiple systems and captures a set of second user activity logs of a set of second users accessing the multiple systems. The approach determines a set of system monitoring preferences based the first user activity log and the set of second user activity logs, and scores the multiple systems based on the set of system monitoring preferences. The approach generates a recommended system monitoring list based on the scored multiple systems, and transmits the recommended system monitoring list to the first user.
    Type: Application
    Filed: September 9, 2021
    Publication date: March 16, 2023
    Inventors: Tian Jiao Zhang, Yuan Feng, Yan Yan Han, SU LI HOU, Xue Ying Zhang, Jing Xu, Ling Zhuo
  • Publication number: 20230033036
    Abstract: A method for receiving an audiovisual data set that includes audio and/or visual content, receiving a topical data set that includes an indication of, at least, the plurality of topics and the plurality of subtopics, receiving a time mapping data set that maps each topic and subtopic to an associated time point in the audio and/or visual content, creating a mind map diagram, and presenting the mind map to a user.
    Type: Application
    Filed: July 30, 2021
    Publication date: February 2, 2023
    Inventors: Yan Yan Han, SU LI HOU, Yue Yang, Jing Xu, Xue Ying Zhang, Li Zhou, Zhiyi Xiang
  • Publication number: 20220386498
    Abstract: A server chassis includes a housing, a support frame, and a back plate. The housing includes a substrate. A fixing portion is vertically disposed on the substrate and is fixedly connected with the back plate. The support frame is fixedly connected with the substrate. A first protrusion is disposed on the support frame and is inserted into the back plate. The interior of the server chassis is rendered more compact, and the server chassis can accommodate eight hard disks. A server including the server chassis is also disclosed.
    Type: Application
    Filed: April 22, 2022
    Publication date: December 1, 2022
    Inventors: YANG LI, HAN-YU LI, YA-NI ZHANG, LI HOU
  • Patent number: 11181266
    Abstract: Disclosed is a method for calculating combustion in the bed of a waste incinerator. The method is based on a model of combustion in a waste incinerator bed and comprises a water evaporation model, a volatile matter analysis model, a volatile matter combustion model, and a fixed carbon combustion model. The volatile matter of the volatile matter combustion model comprises CO, H2, CH4, NH3, and H2S. The volatile matter combustion model comprises a combustion reaction equation for said volatile matter and O2, and respective equations for CO and CH4 reacting with water vapor. Equations governing the model of combustion in the bed of a waste incinerator comprise a continuity equation, an energy equation, a momentum equation, and a component equation. Boundary conditions of said governing equations comprise: equations of heat transfer and mass transfer from an upper boundary layer of the bed to the exterior; and equations of heat transfer and mass transfer from lower boundary layer of the bed to the exterior.
    Type: Grant
    Filed: June 21, 2018
    Date of Patent: November 23, 2021
    Assignee: TIANJIN UNIVERSITY
    Inventors: Guanyi Chen, Tianbao Gu, Wenchao Ma, Chen Ma, Li'an Hou, Beibei Yan, Bin Liu
  • Publication number: 20210262658
    Abstract: Disclosed is a method for calculating combustion in the bed of a waste incinerator. The method is based on a model of combustion in a waste incinerator bed and comprises a water evaporation model, a volatile matter analysis model, a volatile matter combustion model, and a fixed carbon combustion model. The volatile matter of the volatile matter combustion model comprises CO, H2, CH4, NH3, and H2S. The volatile matter combustion model comprises a combustion reaction equation for said volatile matter and O2, and respective equations for CO and CH4 reacting with water vapor. Equations governing the model of combustion in the bed of a waste incinerator comprise a continuity equation, an energy equation, a momentum equation, and a component equation. Boundary conditions of said governing equations comprise: equations of heat transfer and mass transfer from an upper boundary layer of the bed to the exterior; and equations of heat transfer and mass transfer from lower boundary layer of the bed to the exterior.
    Type: Application
    Filed: June 21, 2018
    Publication date: August 26, 2021
    Inventors: Guanyi Chen, Tianbao Gu, Wenchao Ma, Chen Ma, Li'an Hou, Beibei Yan, Bin Liu
  • Publication number: 20210026136
    Abstract: One or more signals are received from one or more sensors. Based at least in part on the one or more signals, a location of a person relative to one or more locations of an autonomous self-moving device is determined. Based at least in part on the one or more signals, data indicative that the autonomous self-moving device has detected a presence and location of the person is generated. Based at least in part on the one or more signals, a location of a person relative to a location of the autonomous self-moving device is determined. A planned path for the autonomous self-moving device is determined. Based at least in part on the one or more signals, data indicative of the planned path is generated.
    Type: Application
    Filed: September 23, 2019
    Publication date: January 28, 2021
    Inventors: Louis AMADIO, Torsten STEIN, Li HOU
  • Patent number: 10901321
    Abstract: Processes for removing a mask layer (e.g., doped amorphous carbon mask layer) from a substrate with high aspect ratio structures are provided. In one example implementation, a process can include depositing a polymer layer on at least a portion of a top end of a high aspect ratio structure on a substrate. The process can further include removing at least a portion of the polymer layer and the doped amorphous carbon film form the substrate using a plasma strip process. In example embodiments, depositing a polymer layer can include plugging one or more high aspect ratio structures with the polymer layer. In example embodiments, depositing a polymer layer can include forming a polymer layer on a sidewall of one or more high aspect ratio structures.
    Type: Grant
    Filed: March 18, 2020
    Date of Patent: January 26, 2021
    Assignees: Mattson Technology, Inc., Beijing E-Town Semiconductor Technology Co., Ltd.
    Inventors: Vijay M. Vaniapura, Shawming Ma, Li Hou
  • Publication number: 20200218158
    Abstract: Processes for removing a mask layer (e.g., doped amorphous carbon mask layer) from a substrate with high aspect ratio structures are provided. In one example implementation, a process can include depositing a polymer layer on at least a portion of a top end of a high aspect ratio structure on a substrate. The process can further include removing at least a portion of the polymer layer and the doped amorphous carbon film form the substrate using a plasma strip process. In example embodiments, depositing a polymer layer can include plugging one or more high aspect ratio structures with the polymer layer. In example embodiments, depositing a polymer layer can include forming a polymer layer on a sidewall of one or more high aspect ratio structures.
    Type: Application
    Filed: March 18, 2020
    Publication date: July 9, 2020
    Inventors: Vijay M. Vaniapura, Shawming Ma, Li Hou
  • Publication number: 20200135554
    Abstract: Apparatus, systems, and methods for conducting a hardmask (e.g., boron doped amorphous carbon hardmask) removal process on a workpiece are provided. In one example implementation, a method includes supporting a workpiece on a workpiece support in a processing chamber. The method can include generating a plasma from a process gas in a plasma chamber using a plasma source. The plasma chamber can be separated from the processing chamber by a separation grid. The method can include exposing the workpiece to one or more radicals generated in the plasma to perform a plasma strip process on the workpiece to at least partially remove the hardmask layer from the workpiece. The method can include exposing the workpiece to water vapor as a passivation agent during the plasma strip process.
    Type: Application
    Filed: October 10, 2019
    Publication date: April 30, 2020
    Inventors: Li Hou, Vijay M. Vaniapura, Jeyta Anand Sahay, Hua Chung, Shuang Meng, Shawming Ma
  • Patent number: 10599039
    Abstract: Processes for removing a mask layer (e.g., doped amorphous carbon mask layer) from a substrate with high aspect ratio structures are provided. In one example implementation, a process can include depositing a polymer layer on at least a portion of a top end of a high aspect ratio structure on a substrate. The process can further include removing at least a portion of the polymer layer and the doped amorphous carbon film form the substrate using a plasma strip process. In example embodiments, depositing a polymer layer can include plugging one or more high aspect ratio structures with the polymer layer. In example embodiments, depositing a polymer layer can include forming a polymer layer on a sidewall of one or more high aspect ratio structures.
    Type: Grant
    Filed: May 17, 2017
    Date of Patent: March 24, 2020
    Assignees: MATTSON TECHNOLOGY, INC., BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
    Inventors: Vijay M. Vaniapura, Shawming Ma, Li Hou
  • Patent number: 10312058
    Abstract: Embodiments of a method of depositing a thin film on a substrate is provided that includes placing a substrate on a substrate support that is mounted in a processing region of a processing chamber, flowing a process fluid through a plurality of gas passages in a diffuser plate toward the substrate supported on the substrate support, wherein the diffuser plate has an upstream side and a downstream side and the downstream side has a substantially concave curvature, and each of the gas passages are formed between the upstream side and the downstream side, and creating a plasma between the downstream side of the diffuser plate and the substrate support.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: June 4, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Soo Young Choi, John M. White, Qunhua Wang, Li Hou, Ki Woon Kim, Shinichi Kurita, Tae Kyung Won, Suhail Anwar, Beom Soo Park, Robin L. Tiner
  • Patent number: 10262837
    Abstract: Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process.
    Type: Grant
    Filed: November 4, 2015
    Date of Patent: April 16, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Soo Young Choi, John M. White, Qunhua Wang, Li Hou, Ki Woon Kim, Shinichi Kurita, Tae Kyung Won, Suhail Anwar, Beom Soo Park, Robin L. Tiner
  • Publication number: 20180074409
    Abstract: Processes for removing a mask layer (e.g., doped amorphous carbon mask layer) from a substrate with high aspect ratio structures are provided. In one example implementation, a process can include depositing a polymer layer on at least a portion of a top end of a high aspect ratio structure on a substrate. The process can further include removing at least a portion of the polymer layer and the doped amorphous carbon film form the substrate using a plasma strip process. In example embodiments, depositing a polymer layer can include plugging one or more high aspect ratio structures with the polymer layer. In example embodiments, depositing a polymer layer can include forming a polymer layer on a sidewall of one or more high aspect ratio structures.
    Type: Application
    Filed: May 17, 2017
    Publication date: March 15, 2018
    Inventors: Vijay M. Vaniapura, Shawming Ma, Li Hou
  • Publication number: 20180025890
    Abstract: Embodiments of a method of depositing a thin film on a substrate is provided that includes placing a substrate on a substrate support that is mounted in a processing region of a processing chamber, flowing a process fluid through a plurality of gas passages in a diffuser plate toward the substrate supported on the substrate support, wherein the diffuser plate has an upstream side and a downstream side and the downstream side has a substantially concave curvature, and each of the gas passages are formed between the upstream side and the downstream side, and creating a plasma between the downstream side of the diffuser plate and the substrate support.
    Type: Application
    Filed: September 28, 2017
    Publication date: January 25, 2018
    Inventors: Soo Young CHOI, John M. WHITE, Qunhua WANG, Li HOU, Ki Woon KIM, Shinichi KURITA, Tae Kyung WON, Suhail ANWAR, Beom Soo PARK, Robin L. TINER